Abstract: The present invention is directed towards designing integrated circuit and provides systems and methods for lithography-aware floorplanning. According to one embodiment of the invention, a method for circuit floorplanning is provided. The method comprises generating a floorplan through a floorplanner, performing a lithography-analysis within the floorplanner on at least a portion of the floorplan, and generating one or more violations that result from the lithography-analysis. Some embodiment, in addition to viewing a floorplan, further comprise of modifying the floorplan. Furthermore, some embodiments provide a method that further comprises fixing the violations that result from the lithography analysis.

Abstract: According to various embodiments of the invention, a system and method for editing process rules for circuit design through a graphical editor is provided. In some embodiments, the graphical editor is a circuit design tool that provides the user of the tool, such as a circuit designer or process engineer, the ability to visualize, modify, create, or remove process rules through a graphical user interface (“GUI”). These process rules, also known as constraints or circuit design constraints, relate to the layout of circuits and is grouped into constraint groups (also known as “circuit design constraint groups”) that can be associated to specific circuit design objects.

Abstract: The present invention is directed towards designing integrated circuit and provides systems and methods for lithography-aware floorplanning. According to one embodiment of the invention, a method for circuit floorplanning is provided. The method comprises generating a floorplan through a floorplanner, performing a lithography-analysis within the floorplanner on at least a portion of the floorplan, and generating one or more violations that result from the lithography-analysis. Some embodiment, in addition to viewing a floorplan, further comprise of modifying the floorplan. Furthermore, some embodiments provide a method that further comprises fixing the violations that result from the lithography analysis.

Abstract: A circuit design process is presented that includes a block placement operation, followed by global routing based upon the initial placement of the blocks. Congestion data is generated from the global routing and, in an automated process, the blocks are placed again based upon the congestion data to reduce the routing congestion of the design. This can be used as part of a custom layout design process, for example.

Abstract: A circuit design process for the reduction of routing congestion is described. This process includes a block placement operation, an initial pin optimization for the block placement, and global routing based upon the initial pin optimization. Congestion data is generated from the global routing and, in an automated process, the pins are re-optimized, based upon the congestion data. This process can be used as part of a custom layout design process, for example.

Abstract: The present invention is directed towards designing integrated circuit and provides systems and methods for lithography-aware floorplanning. According to one embodiment of the invention, a method for circuit floorplanning is provided. The method comprises generating a floorplan through a floorplanner, performing a lithography-analysis within the floorplanner on at least a portion of the floorplan, and generating one or more violations that result from the lithography-analysis. Some embodiment, in addition to viewing a floorplan, further comprise of modifying the floorplan. Furthermore, some embodiments provide a method that further comprises fixing the violations that result from the lithography analysis.