Patents by Inventor Pei-Yuan WU

Pei-Yuan WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9811000
    Abstract: A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: November 7, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Feng Liao, Chun-Hsien Lin, Pei-Yi Su, Yi-Ming Dai, Chung-Hsing Lee, Chien-Ko Liao, Chun-Yung Chang, Nan-Jung Chen, Pei-Yuan Wu, Hsien-Mao Huang
  • Publication number: 20170123328
    Abstract: A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 4, 2017
    Inventors: Chia-Feng LIAO, Chun-Hsien LIN, Pei-Yi SU, Yi-Ming DAI, Chung-Hsing LEE, Chien-Ko LIAO, Chun-Yung CHANG, Nan-Jung CHEN, Pei-Yuan WU, Hsien-Mao HUANG