Patents by Inventor Pejman Ahmadiannamini

Pejman Ahmadiannamini has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11786841
    Abstract: The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: October 17, 2023
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Pejman Ahmadiannamini, Bryan Hinzie
  • Publication number: 20230042919
    Abstract: A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond.
    Type: Application
    Filed: October 7, 2022
    Publication date: February 9, 2023
    Applicant: FUJIFILM Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Yuan Chen, Jack W. Helzer, Pejman Ahmadiannamini
  • Patent number: 11541358
    Abstract: A method for process a chemical liquid is provided. The method includes at least providing a system having at least one filtration medium, treatment the system with a treatment liquid having a content of iron (Fe) and calcium (Ca) of about 10 ppb or less, and processing a chemical liquid using an apparatus having the system configured therein after the treatment process.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: January 3, 2023
    Assignee: FUJIFILM Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Michael Barker, Jack Helzer, Shen-Ping Huang, Pejman Ahmadiannamini, Yuan Chen
  • Patent number: 11498033
    Abstract: A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond. A manufacturing method of a chemical liquid using the apparatus is also provided.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: November 15, 2022
    Assignee: FUJIFILM Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Yuan Chen, Jack W. Helzer, Pejman Ahmadiannamini
  • Publication number: 20210220754
    Abstract: The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.
    Type: Application
    Filed: January 15, 2021
    Publication date: July 22, 2021
    Inventors: Pejman Ahmadiannamini, Bryan Hinzie
  • Patent number: 10773210
    Abstract: The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: September 15, 2020
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Jack Helzer, Yuan Chen, Pejman Ahmadiannamini
  • Publication number: 20200156005
    Abstract: The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.
    Type: Application
    Filed: November 15, 2019
    Publication date: May 21, 2020
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Jack Helzer, Yuan Chen, Pejman Ahmadiannamini
  • Publication number: 20200156013
    Abstract: A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond. A manufacturing method of a chemical liquid using the apparatus is also provided.
    Type: Application
    Filed: November 21, 2019
    Publication date: May 21, 2020
    Applicant: FUJIFILM Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Yuan Chen, Jack W. Helzer, Pejman Ahmadiannamini
  • Publication number: 20200061544
    Abstract: A method for process a chemical liquid is provided. The method includes at least providing a system having at least one filtration medium, treatment the system with a treatment liquid having a content of iron (Fe) and calcium (Ca) of about 10 ppb or less, and processing a chemical liquid using an apparatus having the system configured therein after the treatment process.
    Type: Application
    Filed: August 21, 2019
    Publication date: February 27, 2020
    Applicant: FUJIFILM Electronic Materials U.S.A., Inc.
    Inventors: Marcia Cole-Yocom, Bryan Hinzie, Michael Barker, Jack Helzer, Shen-Ping Huang, Pejman Ahmadiannamini, Yuan Chen