Patents by Inventor Periyasamy Mookkan

Periyasamy Mookkan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymers for photoresist compositions for microlithography
    Patent number: 6951705
    Abstract: Nitrile/vinyl ether-containing polymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These photoresist compositions comprise 1) at least one ethylenically unsaturated compound comprised of a vinyl ether and 2) a nitrile-containing compound, e.g., acrylonitrile, which together impart high ultraviolet (UV) transparency and developability in basic media. In some embodiments, these photoresist compositions further comprise a fluoroalcohol group. The photoresist compositions of this invention have, high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which property makes them useful for lithography at these short wavelengths.
    Type: Grant
    Filed: May 4, 2001
    Date of Patent: October 4, 2005
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Michael Fryd, Periyasamy Mookkan, Frank Leonard Schadt, III
  • Polymers for photoresist compositions for microlithography
    Publication number: 20030211417
    Abstract: Nitrile/vinyl ether-containing polymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These photoresist compositions comprise 1) at least one ethylenically unsaturated compound comprised of a vinyl ether and 2) a nitrile-containing compound, e.g., acrylonitrile, which together impart high ultraviolet (UV) transparency and developability in basic media. In some embodiments, these photoresist compositions further comprise a fluoroalcohol group. The photoresist compositions of this invention have, high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which property makes them useful for lithography at these short wavelengths.
    Type: Application
    Filed: October 16, 2002
    Publication date: November 13, 2003
    Inventors: Michael Fryd, Periyasamy Mookkan, Frank Leonard Schadt III