Abstract: The aim of the invention is to allow a reliable quantification and classification of brake abrasion of a brake system of a vehicle and simultaneously reduce the complexity in a practical application. This is achieved by a measuring rim with a rim interior, in which a collecting housing is arranged that extends in the circumferential direction of the measuring rim over an extension angle (?). A collecting housing interior is formed in the collecting housing, and the collecting housing is at least partly open towards the collecting housing interior on a radially inner circumferential surface extending in the circumferential direction of the measuring rim. A discharge area is provided on the rim flange on the measuring rim, and a collecting channel which connects the collecting housing interior of the collecting housing to the discharge area is provided on the measuring rim.

Abstract: The present invention relates to novel high-value polycarbonate polyols, to processes for the production thereof, to polyisocyanate prepolymers obtainable therefrom and also polyurethane (PUR) and polyurethane urea elastomers which under particularly demanding applications show unique combinations of processing characteristics, hydrolysis and oxidation stability, mechanical and dynamic mechanical properties.

Abstract: An analysis method is for automatically determining radiological result data from radiology data sets. In an embodiment, the method includes provisioning a first radiology data set at least based on X-ray data of a first X-ray energy spectrum; provisioning at least one second radiology data set at least based on X-ray data of a second X-ray energy spectrum; provisioning an analysis unit including a neural network, to analyze radiology data sets including an input layer with a plurality of cells, a number of intermediate layers and an output layer representing a radiological result; analyzing the first radiology data set and the at least one second radiology data set, at least subsets of the first radiology data set and the at least one second radiology data set being assigned to different cells of the input layer for joint processing in the neural network; and acquiring result data on the output layer.

Abstract: Light, heat, gas exchange, and water motion are all required elements to sustain aquatic photosynthetic organisms. Rather than providing separate systems, a flux of photons appropriate for photosynthetic organisms, including algae, is dispersed throughout the surrounding water. A gas source performs water movement and circulation by acting as an airlift pump while performing a liquid-gas mass transfer. Finally, heat is added to the surrounding liquid by a heat source or the light source, which increases the rate at which microorganisms grow and improve efficiencies. By combining these necessary components for aquatic life support, efficiencies are increased, costs are saved, and photosynthetic organism growth is regulated.

Abstract: The present invention relates to novel high-value polycarbonate polyols, to processes for the production thereof, to polyisocyanate prepolymers obtainable therefrom and also polyurethane (PUR) and polyurethane urea elastomers which under particularly demanding applications show unique combinations of processing characteristics, hydrolysis and oxidation stability, mechanical and dynamic mechanical properties.

Abstract: A wastewater purification apparatus includes an elongate tank, which has an inflow for feeding wastewater, a first vertical agitator with a first hyperboloid agitator body mounted on a vertical first agitator shaft and provided in a first treatment portion downstream of the inflow on the first narrow side, a second vertical agitator with a second hyperboloid agitator body mounted on a vertical second agitator shaft and provided in a second treatment portion downstream of the first vertical agitator, an aeration device with a fan for aerating wastewater received in the tank, a first drive device for rotating the first hyperboloid agitator body in a first rotation direction, a second drive device for rotating the second hyperboloid agitator body in a second rotation direction opposite the first rotation direction, and a decanter for discharging purified wastewater in a third treatment portion on a second narrow side opposite the first narrow side.

Abstract: The invention relates to flame-retardant polyurethane foam materials or polyurethane/polyisocyanurate foam materials (also referred to individually or collectively as “PUR/PIR foam materials” below) and to methods for producing PUR/PIR foam materials by reacting a reaction mixture containing A1 an isocyanate-reactive component, A2 a propellant, A3 a catalyst, A4 optionally an additive, and A5 a flame retardant with B an isocyanate component, wherein the production is carried out using an index of 80 to 600. The invention is characterized in that the flame retardant A5 contains (hydroxymethyl)phosphonate and optionally the dimer thereof as component A5.1.

Abstract: An apparatus for preparing food having a heating device with hot plate, a filter device and a cover device, which is in operative connection with the filter device and has an upper side, an underside and side surfaces. The cover device, on the underside, has at least one entry opening of a flow channel for exhaust air, the flow channel being arranged in the interior of the cover device. The flow channel, on a first side surface, has an exit opening, wherein the exit opening can be positioned such that the exhaust air can flow via the exit opening into an entry opening of the filter device.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.

Abstract: A wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection exposure apparatus, includes a substrate (220, 230), an arrangement of electrically conductive conductor tracks (222, 232) provided on the substrate, wherein a wavefront of electromagnetic radiation incident on the wavefront correction element is manipulatable by electrical driving of the conductor tracks, and an insulating layer (221, 231), which electrically insulates the conductor tracks from one another, wherein the insulating layer has first regions and second regions, wherein the electrical breakdown strength of the insulating layer to withstand a breakdown of electrical charge through the insulating layer as far as the arrangement of conductor tracks is lower in the second regions than in the first regions by at least a factor of two.

Abstract: A wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection exposure apparatus, includes a substrate (220, 230), an arrangement of electrically conductive conductor tracks (222, 232) provided on the substrate, wherein a wavefront of electromagnetic radiation incident on the wavefront correction element is manipulatable by electrical driving of the conductor tracks, and an insulating layer (221, 231), which electrically insulates the conductor tracks from one another, wherein the insulating layer has first regions and second regions, wherein the electrical breakdown strength of the insulating layer to withstand a breakdown of electrical charge through the insulating layer as far as the arrangement of conductor tracks is lower in the second regions than in the first regions by at least a factor of two.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.

Abstract: An analysis method is for automatically determining radiological result data from radiology data sets. In an embodiment, the method includes provisioning a first radiology data set at least based on X-ray data of a first X-ray energy spectrum; provisioning at least one second radiology data set at least based on X-ray data of a second X-ray energy spectrum; provisioning an analysis unit including a neural network, to analyze radiology data sets including an input layer with a plurality of cells, a number of intermediate layers and an output layer representing a radiological result; analyzing the first radiology data set and the at least one second radiology data set, at least subsets of the first radiology data set and the at least one second radiology data set being assigned to different cells of the input layer for joint processing in the neural network; and acquiring result data on the output layer.

Abstract: A method for producing a mirror element, in particular for a microlithographic projection exposure apparatus includes: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961); and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein the layer stack is formed so that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has a curvature deviating from the setpoint curvature of the mirror element prior to the formation of the layer stack, and wherein the bending force exerted by the layer stack is at least partly generated by virtue of a post-treatment for changing the layer tension of the layer stack.

Abstract: A laminating body for laminating a foil onto a substrate includes a pressure area on which there is imprinted a structure which forms an embossing in the foil upon lamination of the foil onto the substrate.

Abstract: A reflective optical element, in particular for a microlithographic projection exposure apparatus or a mask inspection apparatus. According to one aspect, the reflective optical element has an optically effective surface, a substrate (405, 505), a reflection layer system (410, 510) and at least one porous outgassing layer (450, 550), which at least intermittently releases particles adsorbed in the outgassing layer (450, 550) when the optically effective surface (400a, 500a) is irradiated by electromagnetic radiation.

Abstract: A mask (M) for EUV lithography includes: a substrate (7), a first surface region (A1) formed by a surface (8a) of a multilayer coating (8) embodied to reflect EUV radiation (27), said surface (8a) facing away from the substrate (7), and a second surface region (A2) formed by a surface (18a) of a further coating (18) embodied to reflect DUV radiation (28) and to suppress the reflection of EUV radiation (27), said surface (18a) facing away from the substrate (7). The further coating is a multilayer coating (18). Also disclosed are an EUV lithography apparatus that includes such a mask (M) and a method for determining a contrast proportion caused by DUV radiation when imaging a mask (M) onto a light-sensitive layer.

Abstract: A reflective optical element, in particular for a microlithographic projection exposure apparatus or a mask inspection apparatus. According to one aspect, the reflective optical element has an optically effective surface, a substrate (405, 505), a reflection layer system (410, 510) and at least one porous outgassing layer (450, 550), which at least intermittently releases particles adsorbed in the outgassing layer (450, 550) when the optically effective surface (400a, 500a) is irradiated by electromagnetic radiation.

Abstract: An apparatus for preparing food having a heating device with hot plate, a filter device and a cover device, which is in operative connection with the filter device and has an upper side, an underside and side surfaces. The cover device, on the underside, has at least one entry opening of a flow channel for exhaust air, the flow channel being arranged in the interior of the cover device. The flow channel, on a first side surface, has an exit opening, wherein the exit opening can be positioned such that the exhaust air can flow via the exit opening into an entry opening of the filter device.

Abstract: In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.