Patents by Inventor Peter L. Filosi

Peter L. Filosi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for improving focus accuracy in a lithography system
    Patent number: 7248336
    Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: July 24, 2007
    Assignee: ASML Holding N.V.
    Inventors: Michael L. Nelson, Justin L. Kreuzer, Peter L. Filosi, Christopher J. Mason
  • Method and systems for improving focus accuracy in a lithography system
    Patent number: 7053984
    Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: May 30, 2006
    Assignee: ASML Holding N.V.
    Inventors: Michael L. Nelson, Justin L. Kreuzer, Peter L. Filosi, Christopher J. Mason
  • Method and system for improving focus accuracy in a lithography system
    Patent number: 6859260
    Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: February 22, 2005
    Assignee: ASML Holding N.V.
    Inventors: Michael L. Nelson, Justin L. Kreuzer, Peter L. Filosi, Christopher J. Mason
  • Method and system for improving focus accuracy in a lithography system
    Publication number: 20020158185
    Abstract: A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
    Type: Application
    Filed: April 25, 2001
    Publication date: October 31, 2002
    Applicant: Silicon Valley Group, Inc.
    Inventors: Michael L. Nelson, Justin L. Kreuzer, Peter L. Filosi, Christopher J. Mason