Patents by Inventor Peter Schaeffler

Peter Schaeffler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8532364
    Abstract: Apparatus for inspecting a semiconductor wafer (8) has a plurality of light sensors (2) arranged relative to a light source (1) and wafer inspection platform (4), so that images of different angle views of a surface of the wafer can be received and compared with corresponding images taken of a reference wafer to automatically detect defects based on image comparison. The light sensors (2) may receive superposed images of light (7) reflected directly from the light source (1) off the wafer surface and light (6) indirectly reflected off the wafer surface after first reflecting off a dome (3) with a diffusely reflecting inner surface (5) positioned over the platform (4).
    Type: Grant
    Filed: February 11, 2010
    Date of Patent: September 10, 2013
    Assignee: Texas Instruments Deutschland GmbH
    Inventors: Alexander Urban, Peter Schaeffler, Andreas Pfeiffer, Holger Schwekendiek
  • Publication number: 20100293842
    Abstract: The invention relates to a method for producing additive mixtures for fuel oils by mixing at least two additive components in a dynamic mixer or a lamination mixer. The invention further relates to additive mixtures obtained by said method and fuel oil compositions containing said additive mixtures.
    Type: Application
    Filed: January 21, 2009
    Publication date: November 25, 2010
    Applicant: BASF SE
    Inventors: Wolfgang Kasel, Irene Troetsch-Schaller, Peter Spang, Frank-Olaf Maehling, Andreas Daiss, Andreas Bauder, Anja Vinckier, Stefan Hirsch, Matthias Frohberger, Siegfried Willert, Peter Schaeffler, Stephan Hoffmann
  • Publication number: 20100208980
    Abstract: Apparatus for inspecting a semiconductor wafer (8) has a plurality of light sensors (2) arranged relative to a light source (1) and wafer inspection platform (4), so that images of different angle views of a surface of the wafer can be received and compared with corresponding images taken of a reference wafer to automatically detect defects based on image comparison. The light sensors (2) may receive superposed images of light (7) reflected directly from the light source (1) off the wafer surface and light (6) indirectly reflected off the wafer surface after first reflecting off a dome (3) with a diffusely reflecting inner surface (5) positioned over the platform (4).
    Type: Application
    Filed: February 11, 2010
    Publication date: August 19, 2010
    Applicant: TEXAS INSTRUMENTS DEUTSCHLAND GMBH
    Inventors: Alexander Urban, Peter Schaeffler, Andreas Pfeiffer, Holger Schwekendiek
  • Publication number: 20090202812
    Abstract: A method for producing composite bodies having at least one outer layer of a non-foaming powder and a metal foam layer. In one embodiment, the powder layers are rolled separately from one another, then the rolled parts are put one over the other in a predetermined number of rolled powder layers; optionally, they are rolled together again, and thereafter, the metal foam layer is foamed by heating to produce a layer arrangement. Alternatively, the powder layers are formed one on top of the other to form a layer arrangement that is then rolled prior to foaming.
    Type: Application
    Filed: April 4, 2007
    Publication date: August 13, 2009
    Applicant: ALULIGHT INTERNATIONAL GMBH
    Inventors: Peter Schaeffler, Eric Wolfsgruber
  • Patent number: 7160650
    Abstract: The invention relates to a method of inspecting a mask comprising the steps: patterning a semiconductor material with a reference mask, patterning the semiconductor material with the mask as the inspection item, inspecting both patterns on the semiconductor material by means of an apparatus suitable for inspecting the semiconductor material, and comparing the pattern generated by the inspection item mask to the pattern generated by the reference mask to detect deviations in the inspection item mask from the reference mask. The invention is particularly suitable for reticule inspection. When a semiconductor wafer is multiply patterned by the reference mask and the inspection item mask alternatingly side-by-side, deviations in the reticules are evident as recurrent discrepancies between the patterns on the wafer.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: January 9, 2007
    Assignee: Texas Instruments Incorporated
    Inventors: Christoph Hechtl, Jens Lohse, Peter Schäffler