Patents by Inventor Peter Schmitt
Peter Schmitt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11978046Abstract: Users of a communication system can initiate electronic payments during a communication session hosted by the communication system or via a social network identity page hosted by the communication system. The communication system detects a payment signal from a user of the communication system and the collects payment information details either by displaying a payment object interface in a communication application of the user or receiving payment information input directly from the user's communication device. The payment information includes sender and recipient payment account identifiers that are communicated to a payment processing system for processing and delivery of the designated payment amount to the recipient.Type: GrantFiled: September 13, 2021Date of Patent: May 7, 2024Assignee: GOOGLE LLCInventors: Travis Harrison Kroll Green, Michael DePasquale, Boris Mizhen, Josh Ostrow, Peter Schmitt, Kevin Michael Bierhoff, Alevtina Stolpnik, Avery Pennarun, Narelle Cozens
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Patent number: 11953567Abstract: The present disclosure provides a magnetic multi-turn sensor comprising a continuous coil of magnetoresistive elements and a method of manufacturing said sensor. The continuous coil is formed on a substrate such as a silicon wafer that has been fabricated so as to form a trench and bridge arrangement that enables the inner and outer spiral to be connected without interfering with the magnetoresistive elements of the spiral winding in between. Once the substrate has been fabricated with the trench and bridge arrangement, a film of the magnetoresistive material can be deposited to form a continuous coil on the surface of the substrate, wherein a portion of the coil is formed in the trench and a portion of the coil is formed on the bridge.Type: GrantFiled: August 25, 2021Date of Patent: April 9, 2024Assignee: Analog Devices International Unlimited CompanyInventors: Peter Meehan, Stephen O'Brien, Jochen Schmitt, Michael W. Judy, Enno Lage
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Publication number: 20240067987Abstract: The present disclosure provides a variant AAV capsid protein that confers tropism to lung cells and recombinant adeno-associated viruses comprising the variant A.AV and pharmaceutical compositions comprising same and their use in the delivery of heterologous nucleic acids to lung cells for the treatment of pulmonary disorders.Type: ApplicationFiled: September 15, 2023Publication date: February 29, 2024Applicant: 4D MOLECULAR THERAPEUTICS INC.Inventors: Melissa Kotterman, Peter Francis, Melissa Calton, Johnny Gonzales, Roxanne Croze, Christopher Schmitt
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Patent number: 11774862Abstract: Measurements are obtained from locations across a substrate before or after performing a lithographic process step. Examples of such measurements include alignment measurements made prior to applying a pattern to the substrate, and measurements of a performance parameter such as overlay, after a pattern has been applied. A set of measurement locations is selected from among all possible measurement locations. At least a subset of the selected measurement locations are selected dynamically, in response to measurements obtained using a preliminary selection of measurement locations. Preliminary measurements of height can be used to select measurement locations for alignment. In another aspect, outlier measurements are detected based on supplementary data such as height measurements or historic data.Type: GrantFiled: October 14, 2021Date of Patent: October 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Elliott Gerard McNamara, Rizvi Rahman, Michiel Kupers, Emil Peter Schmitt-Weaver, Erik Henri Adriaan Delvigne
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Patent number: 11730388Abstract: In the field of MRI, a model-based MRI image reconstruction technique is provided. The model-based reconstruction technique increases the performance of Time-of-Flight MRA. In a learning phase, a model is calculated from a sufficiently large set of data acquired at both low and high magnetic fields, using deep learning strategies. In a clinical phase, the model is applied to measured data generating high MR image quality.Type: GrantFiled: June 10, 2020Date of Patent: August 22, 2023Assignee: SIEMENS HEALTHCARE GMBHInventors: Gerhard Laub, Peter Schmitt, David Grodzki, Waqas Majeed, Wuyi Zhao
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Patent number: 11718033Abstract: A method of recycling build material powder including collecting in a keg an amount of excess build material powder during the additive manufacturing of a part cake. The part cake and keg are transferred to a de-powdering station. The part cake is de-powdered to release a mixture of reusable powder and contaminants. The mixture is sieved to remove the contaminants and deposit the reusable powder to the keg.Type: GrantFiled: November 16, 2020Date of Patent: August 8, 2023Assignee: Desktop Metal, Inc.Inventors: Jonah Myerberg, Peter Schmitt
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Publication number: 20220395712Abstract: A firestop assembly configured for sealing about a pipe extending through a passage in a building structure division with a sealing element sealing the passage about the pipe. The firestop assembly includes a tube configured to be positioned about the pipe and secured relative to the building structure division. An intumescent material is positioned within the tube. A heat reduction insulation is supported by the tube such that the heat reduction insulation extends about the sealing element and minimizes heating of the sealing element.Type: ApplicationFiled: July 30, 2021Publication date: December 15, 2022Inventors: Julio Lopes, Peter Schmitt, DJ Cianfaglione
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Publication number: 20220291590Abstract: A method for determining a model to predict overlay data associated with a current substrate being patterned. The method involves obtaining (i) a first data set associated with one or more prior layers and/or current layer of the current substrate, (ii) a second data set including overlay metrology data associated with one or more prior substrates, and (iii) de-corrected measured overlay data associated with the current layer of the current substrate; and determining, based on (i) the first data set, (ii) the second data set, and (iii) the de-corrected measured overlay data, values of a set of model parameters associated with the model such that the model predicts overlay data for the current substrate, wherein the values are determined such that a cost function is minimized, the cost function comprising a difference between the predicted data and the de-corrected measured overlay data.Type: ApplicationFiled: July 9, 2020Publication date: September 15, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Jing SU, Yana CHENG, Zchenxi LIN, Yi ZOU, Ddavit HARUTYUNYAN, Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Cornelis Johannes Henricus LAMBREGTS, Hadi YAGUBIZADE
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Patent number: 11422476Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.Type: GrantFiled: October 2, 2020Date of Patent: August 23, 2022Assignee: ASML Netherlands B.V.Inventors: Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Wim Tjibbo Tel, Frank Staals, Leon Martin Levasier
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Publication number: 20220260925Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.Type: ApplicationFiled: May 6, 2022Publication date: August 18, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo TEL, Bart Peter Bert SEGERS, Everhardus Cornelis MOS, Emil Peter SCHMITT-WEAVER, Yichen ZHANG, Petrus Gerardus VAN RHEE, Xing Lan LIU, Maria KILITZIRAKI, Reiner Maria JUNGBLUT, Hyunwoo YU
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Patent number: 11347150Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.Type: GrantFiled: March 10, 2021Date of Patent: May 31, 2022Assignee: ASML Netherlands B.V.Inventors: Wim Tjibbo Tel, Bart Peter Bert Segers, Everhardus Cornelis Mos, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee, Xing Lan Liu, Maria Kilitziraki, Reiner Maria Jungblut, Hyunwoo Yu
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Publication number: 20220062983Abstract: A system and method of creating molten metal droplets is disclosed. The system may be used for 3D printing. The system relies on a change in momentum of the droplet relative to the tip of the metal microwire to cause the droplet to separate from the tip of the metal microwire. The change in momentum can be created by using an oscillating printhead. In other embodiments, a mass strikes the printhead to cause the droplet to separate from the metal microwire. The metal microwire may be heated using a heat source, such as a laser, an induction coil or a plasma arc.Type: ApplicationFiled: August 31, 2021Publication date: March 3, 2022Inventors: Peter Schmitt, Tom Davidson, Matthew McCambridge
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Patent number: 11249404Abstract: A system comprises a topography measurement system configured to determine a respective height for each of a plurality of locations on a substrate; and a processor configured to: determine a height map for the substrate based on the determined heights for the plurality of locations; and determine at least one alignment parameter for the substrate by comparing the height map and a reference height map, wherein the reference height map comprises or represents heights for a plurality of locations on a reference substrate portion.Type: GrantFiled: May 18, 2018Date of Patent: February 15, 2022Assignee: ASML Netherlands B.V.Inventors: Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Rene Marinus Gerardus Johan Queens, Wolfgang Helmut Henke, Wim Tjibbo Tel, Theodorus Franciscus Adrianus Maria Linschoten
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Publication number: 20220035259Abstract: Measurements are obtained from locations across a substrate before or after performing a lithographic process step. Examples of such measurements include alignment measurements made prior to applying a pattern to the substrate, and measurements of a performance parameter such as overlay, after a pattern has been applied. A set of measurement locations is selected from among all possible measurement locations. At least a subset of the selected measurement locations are selected dynamically, in response to measurements obtained using a preliminary selection of measurement locations. Preliminary measurements of height can be used to select measurement locations for alignment. In another aspect, outlier measurements are detected based on supplementary data such as height measurements or historic data.Type: ApplicationFiled: October 14, 2021Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Hakki Ergün CEKLI, Masashi ISHIBASHI, Wendy Johanna Martina VAN DE VEN, Willem Seine Christian ROELOFS, Elliott Gerard MC NAMARA, Rizvi RAHMAN, Michiel KUPERS, Emil Peter SCHMITT-WEAVER, Erik Henri Adriaan DELVIGNE
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Publication number: 20220026809Abstract: A method of determining a parameter of a lithographic apparatus, wherein the method includes providing first height variation data of a first substrate, providing first performance data of a first substrate, and determining a model based on the first height variation data and the first performance data. The method further includes obtaining second height variation data of a second substrate, inputting the second height variation data to the model, and determining second performance data of the second substrate by running the model. Based on the second performance data, the method determines a parameter of the apparatus.Type: ApplicationFiled: October 15, 2019Publication date: January 27, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Emil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Martin KERS
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Publication number: 20210406874Abstract: Users of a communication system can initiate electronic payments during a communication session hosted by the communication system or via a social network identity page hosted by the communication system. The communication system detects a payment signal from a user of the communication system and the collects payment information details either by displaying a payment object interface in a communication application of the user or receiving payment information input directly from the user's communication device. The payment information includes sender and recipient payment account identifiers that are communicated to a payment processing system for processing and delivery of the designated payment amount to the recipient.Type: ApplicationFiled: September 13, 2021Publication date: December 30, 2021Inventors: Travis Harrison Kroll Green, Michael DePasquale, Boris Mizhen, Josh Ostrow, Peter Schmitt, Kevin Michael Bierhoff, Alevtina Stolpnik, Avery Pennarun, Narelle Cozens
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Patent number: 11175591Abstract: Measurements are obtained from locations across a substrate before or after performing a lithographic process step. Examples of such measurements include alignment measurements made prior to applying a pattern to the substrate, and measurements of a performance parameter such as overlay, after a pattern has been applied. A set of measurement locations is selected from among all possible measurement locations. At least a subset of the selected measurement locations are selected dynamically, in response to measurements obtained using a preliminary selection of measurement locations. Preliminary measurements of height can be used to select measurement locations for alignment. In another aspect, outlier measurements are detected based on supplementary data such as height measurements or historic data.Type: GrantFiled: April 21, 2017Date of Patent: November 16, 2021Assignee: ASML Netherlands B.V.Inventors: Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Elliott Gerard McNamara, Rizvi Rahman, Michiel Kupers, Emil Peter Schmitt-Weaver, Erik Henri Adriaan Delvigne
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Patent number: D944472Type: GrantFiled: October 10, 2019Date of Patent: February 22, 2022Assignee: Desktop Metal, Inc.Inventors: Peter Schmitt, Justin Cumming
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Patent number: D952008Type: GrantFiled: May 21, 2019Date of Patent: May 17, 2022Assignee: Desktop Metal, Inc.Inventors: Peter Schmitt, Justin Cumming, Alex Fishman, Ric Fulop, Rick Chin, Jonah Samuel Myerberg, Yves Behar, Brandon Heiman
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Patent number: D955449Type: GrantFiled: May 18, 2021Date of Patent: June 21, 2022Assignee: Desktop Metal, Inc.Inventors: Peter Schmitt, Justin Cumming, Matthew Kramer