Patents by Inventor Peter T. Muraoka

Peter T. Muraoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RF impedance model based fault detection
    Patent number: 10748748
    Abstract: A method to detect a potential fault in a plasma system is described. The method includes accessing a model of one or more parts of the plasma system. The method further includes receiving data regarding a supply of RF power to a plasma chamber. The RF power is supplied using a configuration that includes one or more states. The method also includes using the data to produce model data at an output of the model. The method includes examining the model data. The examination is of one or more variables that characterize performance of a plasma process of the plasma system. The method includes identifying the fault for the one or more variables. The method further includes determining that the fault has occurred for a pre-determined period of time such that the fault is identified as an event. The method includes classifying the event.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: August 18, 2020
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., James Hugh Rogers, Nicholas Edward Webb, Peter T. Muraoka
  • RF IMPEDANCE MODEL BASED FAULT DETECTION
    Publication number: 20190057847
    Abstract: A method to detect a potential fault in a plasma system is described. The method includes accessing a model of one or more parts of the plasma system. The method further includes receiving data regarding a supply of RF power to a plasma chamber. The RF power is supplied using a configuration that includes one or more states. The method also includes using the data to produce model data at an output of the model. The method includes examining the model data. The examination is of one or more variables that characterize performance of a plasma process of the plasma system. The method includes identifying the fault for the one or more variables. The method further includes determining that the fault has occurred for a pre-determined period of time such that the fault is identified as an event. The method includes classifying the event.
    Type: Application
    Filed: October 22, 2018
    Publication date: February 21, 2019
    Inventors: John C. Valcore, JR., James Hugh Rogers, Nicholas Edward Webb, Peter T. Muraoka
  • RF impedance model based fault detection
    Patent number: 10128090
    Abstract: A method to detect a potential fault in a plasma system is described. The method includes accessing a model of one or more parts of the plasma system. The method further includes receiving data regarding a supply of RF power to a plasma chamber. The RF power is supplied using a configuration that includes one or more states. The method also includes using the data to produce model data at an output of the model. The method includes examining the model data. The examination is of one or more variables that characterize performance of a plasma process of the plasma system. The method includes identifying the fault for the one or more variables. The method further includes determining that the fault has occurred for a pre-determined period of time such that the fault is identified as an event. The method includes classifying the event.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: November 13, 2018
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., James Hugh Rogers, Nicholas Edward Webb, Peter T. Muraoka
  • RF Impedance Model Based Fault Detection
    Publication number: 20150069912
    Abstract: A method to detect a potential fault in a plasma system is described. The method includes accessing a model of one or more parts of the plasma system. The method further includes receiving data regarding a supply of RF power to a plasma chamber. The RF power is supplied using a configuration that includes one or more states. The method also includes using the data to produce model data at an output of the model. The method includes examining the model data. The examination is of one or more variables that characterize performance of a plasma process of the plasma system. The method includes identifying the fault for the one or more variables. The method further includes determining that the fault has occurred for a pre-determined period of time such that the fault is identified as an event. The method includes classifying the event.
    Type: Application
    Filed: November 13, 2014
    Publication date: March 12, 2015
    Inventors: John C. Valcore, JR., James Hugh Rogers, Nicholas Edward Webb, Peter T. Muraoka