Abstract: A ?-radiation detection system that includes at least one semiconductor detector such as HPGe-Detector, a position-sensitive ?-Detector, a TOF Controller, and a Digitizer/Integrator. The Digitizer/Integrator starts to process the energy signals of a ?-radiation sent from the HPGe-Detector instantly when the HPGe-Detector detects the ?-radiation. Subsequently, it is determined whether a coincidence exists between the ?-particles and ?-radiation signal, based on a determination of the time-of-flight of neutrons obtained from the ?-Detector and the HPGe-Detector. If it is determined that the time-of-flight falls within a predetermined coincidence window, the Digitizer/Integrator is allowed to continue and complete the energy signal processing. If, however, there is no coincidence, the Digitizer/Integrator is instructed to be clear and reset its operation instantly.

Abstract: A ?-radiation detection system that includes at least one semiconductor detector such as HPGe-Detector, a position-sensitive ?-Detector, a TOF Controller, and a Digitizer/Integrator. The Digitizer/Integrator starts to process the energy signals of a ?-radiation sent from the HPGe-Detector instantly when the HPGe-Detector detects the ?-radiation. Subsequently, it is determined whether a coincidence exists between the ?-particles and ?-radiation signal, based on a determination of the time-of-flight of neutrons obtained from the ?-Detector and the HPGe-Detector. If it is determined that the time-of-flight falls within a predetermined coincidence window, the Digitizer/Integrator is allowed to continue and complete the energy signal processing. If, however, there is no coincidence, the Digitizer/Integrator is instructed to be clear and reset its operation instantly.

Abstract: Method and apparatus for depositing durable coatings onto the surface of a substrate without heating the entire substrate to high temperatures by using lasers to heat the substrate and dissociate a deposition gas. The apparatus comprises a deposition chamber for enclosing the substrate upon which a coating is to be deposited, gas delivery means for directing a flow of deposition gas on the substrate, a first laser for heating the substrate, and a second laser for irradiating the deposition gas to dissociate the gas. The method includes placing a substrate within a vacuum deposition chamber and directing a flow of deposition gas on the substrate. Then the substrate is heated with a first laser while the deposition gas is irradiated with a second laser to dissociate the deposition gas.