Patents by Inventor Petrus Anton Willem Van Eijck

Petrus Anton Willem Van Eijck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate placement in immersion lithography
    Publication number: 20060126038
    Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
    Type: Application
    Filed: December 10, 2004
    Publication date: June 15, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Hoogendam, Gerrit Nijmeijer, Minne Cuperus, Petrus Anton Willem Van Eijck