Abstract: A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation; a projection system that projects the patterned beam onto a target portion of the substrate; and a selection system that selects one out of at least two different operational modes of the lithographic apparatus. The first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy. The first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy.

Abstract: A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.

Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system configured to provide a beam of radiation, a first support structure configured to support a patterning device that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure that includes a substrate holder for holding a substrate, a projection system configured to project the patterned beam of radiation onto a target portion on a surface of the substrate, and a servo unit configured to position the substrate holder.

Abstract: A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.