Patents by Inventor Petrus Rutgerus Bartray
Petrus Rutgerus Bartray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8289498Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.Type: GrantFiled: June 12, 2009Date of Patent: October 16, 2012Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etiënne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
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Patent number: 7804584Abstract: Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.Type: GrantFiled: October 31, 2008Date of Patent: September 28, 2010Assignee: ASML Netherland B.V.Inventors: Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Dominicus Jacobus Petrus Adrianus Franken, Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Franciscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Marc Johannes Martinus Engels
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Publication number: 20100002207Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.Type: ApplicationFiled: June 12, 2009Publication date: January 7, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etienne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
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Patent number: 7522258Abstract: A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.Type: GrantFiled: June 29, 2005Date of Patent: April 21, 2009Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Marco Koert Stavenga, Thijs Harink
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Publication number: 20090061361Abstract: Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.Type: ApplicationFiled: October 31, 2008Publication date: March 5, 2009Applicant: ASML Netherlands B.V.Inventors: Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Dominicus Jacobus Petrus Adrianus Franken, Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Franciscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Marc Johannes Martinus Engels
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Patent number: 7471373Abstract: A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.Type: GrantFiled: June 25, 2004Date of Patent: December 30, 2008Assignee: ASML Netherlands B.V.Inventors: Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Dominicus Jacobus Petrus Adrianus Franken, Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Franciscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Marc Johannes Martinus Engels
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Patent number: 7408615Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: June 21, 2004Date of Patent: August 5, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7349067Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: July 16, 2004Date of Patent: March 25, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7345736Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: August 27, 2004Date of Patent: March 18, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7253880Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.Type: GrantFiled: November 24, 2004Date of Patent: August 7, 2007Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Petrus Rutgerus Bartray, Antonius Johannes Josephus Van Dijsseldonk, Paulus Martinus Maria Liebregts
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Patent number: 7130019Abstract: A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10?6/K.Type: GrantFiled: November 12, 2004Date of Patent: October 31, 2006Assignee: ASML Netherlands B.V.Inventors: Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Carlo Cornelis Maria Luijten, Bernardus Antonius Johannes Luttikhuis, Michael Ten Bhomer, Ferdy Migchelbrink, Jan Jaap Kuit
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Patent number: 7126664Abstract: A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.Type: GrantFiled: July 12, 2004Date of Patent: October 24, 2006Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Petrus Rutgerus Bartray, Johannes Henricus Wilhelmus Jacobs, Thijs Harink, Paulus Martinus Maria Liebregts