Patents by Inventor Petrus S. Hofman

Petrus S. Hofman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4710571
    Abstract: Novel sebum synthesis inhibiting compositions comprising a sebum inhibiting effective amount of at least one compound selected from the group consisting of compounds of the formula ##STR1## wherein R is selected from the group consisting of hydrogen and acyl of an organic carboxylic acid free of additional carboxyl group and their non-toxic, pharmaceutically acceptable acid addition salts and an inert pharmaceutical carrier and to a novel method of inhibiting sebum synthesis in warm-blooded animals and novel 1H-imidazol-1-ethanol esters.
    Type: Grant
    Filed: August 25, 1986
    Date of Patent: December 1, 1987
    Assignee: Gist-Brocades N.V.
    Inventors: Petrus S. Hofman, David W. R. Hall, Kapil D. Jaitly
  • Patent number: 4563473
    Abstract: Novel sebum synthesis inhibiting compositions comprising a sebum inhibiting effective amount of at least one compound selected from the group consisting of compounds of the formula ##STR1## wherein R is selected from the group consisting of hydrogen and acyl of an organic carboxylic acid free of additional carboxyl group and their non-toxic, pharmaceutically acceptable acid addition salts and an inert pharmaceutical carrier and to a novel method of inhibiting sebum synthesis in warm-blooded animals and novel 1H-imidazol-1-ethanol esters.
    Type: Grant
    Filed: April 26, 1984
    Date of Patent: January 7, 1986
    Assignee: Gist-Brocades N.V.
    Inventors: Petrus S. Hofman, David W. R. Hall, Kapil D. Jaitly
  • Patent number: 4152441
    Abstract: .alpha.,.alpha.-Diarylimidazole-2-methanols of the general formula ##STR1## wherein R.sub.1 -R.sub.10 are the same or different and each represents a hydrogen or halogen atom or a trifluoromethyl or tertiary butyl group, with at least one of said R.sub.1 -R.sub.10 being halogen, trifluoromethyl or tertiary butyl; R.sub.11 and R.sub.12 are the same or different and each represents a hydrogen atom, an alkyl group, a phenyl group or a halogen-or trifluoromethyl-substituted phenyl group; and R.sub.13 represents a hydrogen atom or a lower alkyl group, a lower alkoxymethyl group, a phenylalkyl group (optionally substituted in the phenyl moiety by one or more halogen atoms or alkyl or trifluoromethyl groups), an alkenyl group, a phenyl(lower)alkoxymethyl group (optionally substituted in the phenyl moiety by one or more halogen atoms or alkyl or trifluoromethyl groups) or a benzenesulfonyl group (in which the phenyl moiety is optionally substituted by one or more alkyl groups) are described.
    Type: Grant
    Filed: February 2, 1973
    Date of Patent: May 1, 1979
    Assignee: Gist-Brocades N.V.
    Inventors: Cornelis VAN DER Stelt, Petrus S. Hofman