Patents by Inventor Philip Ryan Barros
Philip Ryan Barros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11899477Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.Type: GrantFiled: February 14, 2022Date of Patent: February 13, 2024Inventors: Philip Ryan Barros, Greg Patrick Mulligan
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Publication number: 20230317471Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.Type: ApplicationFiled: May 9, 2023Publication date: October 5, 2023Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
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Patent number: 11682565Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.Type: GrantFiled: August 4, 2021Date of Patent: June 20, 2023Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
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Publication number: 20230029366Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. In an effort to improve packaging density, fluid delivery modules preferably incorporate both active and passive components into a single substrate block. This enables increases in packaging density as well as enabling reduced cost through greater simplification of the fluid delivery module. For instance, incorporating a filter to filter incoming fluid with a valve or other component in a single monolithic block avoids the need for separate components which add cost and complexity.Type: ApplicationFiled: July 15, 2022Publication date: January 26, 2023Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Dustin Tomhave, Christopher Bryant Davis
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Publication number: 20220283596Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.Type: ApplicationFiled: February 14, 2022Publication date: September 8, 2022Inventors: Philip Ryan Barros, Greg Patrick Mulligan
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Publication number: 20210366735Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.Type: ApplicationFiled: August 4, 2021Publication date: November 25, 2021Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
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Patent number: 11158522Abstract: A fluid delivery system may include a substrate block having an upper surface; a first substrate port in the upper surface; a second substrate port in the upper surface; a substrate fluid passageway extending between the first substrate port and the second substrate port; a substrate ring defining the second substrate port; and a substrate seal channel formed in the upper surface and surrounding the substrate ring. An outer surface of the substrate ring may form an inner surface of the substrate seal channel. An active component may be selected from a flow controller, a pressure transducer, a flow measurement sensor, a pressure regulator, a valve, and a flow meter. The active component may comprise a lower surface; a first component port in the lower surface; a component fluid passageway; a component ring; and a component seal channel formed in the lower surface and surrounding the component ring.Type: GrantFiled: March 10, 2021Date of Patent: October 26, 2021Inventors: Chris Melcer, Philip Ryan Barros, Haruyuki Kubota, Randolph Treur, Todd Cushman
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Patent number: 11094563Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.Type: GrantFiled: February 19, 2018Date of Patent: August 17, 2021Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
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Publication number: 20210193487Abstract: A fluid delivery system may include a substrate block having an upper surface; a first substrate port in the upper surface; a second substrate port in the upper surface; a substrate fluid passageway extending between the first substrate port and the second substrate port; a substrate ring defining the second substrate port; and a substrate seal channel formed in the upper surface and surrounding the substrate ring. An outer surface of the substrate ring may form an inner surface of the substrate seal channel. An active component may be selected from a flow controller, a pressure transducer, a flow measurement sensor, a pressure regulator, a valve, and a flow meter. The active component may comprise a lower surface; a first component port in the lower surface; a component fluid passageway; a component ring; and a component seal channel formed in the lower surface and surrounding the component ring.Type: ApplicationFiled: March 10, 2021Publication date: June 24, 2021Inventors: Chris MELCER, Philip Ryan BARROS, Haruyuki KUBOTA, Randolph TREUR, Todd CUSHMAN
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Publication number: 20180286705Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.Type: ApplicationFiled: February 19, 2018Publication date: October 4, 2018Inventors: Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer, Hong Peng, Chris Ellec
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Publication number: 20080302426Abstract: A system for enabling a distribution of fluids includes a backplane and at least two component bases. Each component base has a first flange segment on one side and a second flange segment on an opposite side. Each of the first flange segment and the second flange segment has through holes formed therein. Fasteners secure the two component bases to the backplane. The fasteners extending through the through holes formed in the first flange segment of a first component base and through holes formed in the second flange segment of a second component base and into the backplane. Methods of assembling a distribution system are further provided.Type: ApplicationFiled: June 6, 2007Publication date: December 11, 2008Inventors: Greg Patrick Mulligan, Philip Ryan Barros, Joshua David Anderson