Patents by Inventor Philipp Dietrich
Philipp Dietrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11630394Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.Type: GrantFiled: September 10, 2021Date of Patent: April 18, 2023Assignee: Karlsruhe Institute of TechnologyInventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
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Publication number: 20210405537Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.Type: ApplicationFiled: September 10, 2021Publication date: December 30, 2021Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
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Patent number: 11143966Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.Type: GrantFiled: January 31, 2019Date of Patent: October 12, 2021Assignee: Karlsruhe Institute of TechnologyInventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
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Publication number: 20190163067Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.Type: ApplicationFiled: January 31, 2019Publication date: May 30, 2019Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
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Patent number: 9413020Abstract: A method of operating a PEM fuel cell including an anode feed circuit and a cathode feed circuit for feeding of an anode side with a reactant gas and for feeding a cathode side with a cathode gas. A shut-down mode for shutting down an electricity generating operation of the fuel system includes decreasing the supply of reactant gas and cathode gas in response of a shut-down signal, monitoring an output voltage of at least one cell of a fuel cell stack, monitoring the reactant gas pressure and the cathode gas pressure, electrically shunting of the at least one fuel cell in response of the output voltage reaching a predefined voltage level, at least reducing the pressure of the anode side to a predefined pressure level by means of at least one pump, and filling and/or flushing of at least the anode side with an inert gas.Type: GrantFiled: April 27, 2009Date of Patent: August 9, 2016Assignee: Belenos Clean Power Holding AGInventors: Akinori Tsukada, Philipp Dietrich, Marcel Hofer, Felix Buechi, Uwe Hannesen
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Publication number: 20140212777Abstract: The fuel cell system includes: at least one fuel cell adapted to generate electrical energy from a fuel gas and an oxidizer gas; a fuel feed duct provided for supplying the fuel cell with fuel gas, the fuel feed duct including an upstream part and a downstream part; a Venturi effect ejector including a high pressure inlet, a low pressure inlet and an outlet, the upstream part of the fuel feed duct being connected to the high pressure inlet of the ejector and the downstream part extending between the ejector outlet and the fuel cell; an off-gas recirculation duct extending between the fuel cell and the low pressure ejector inlet so that, in the presence of a stream of fuel gas coming from the upstream part of the fuel feed duct and passing through the ejector, the ejector draws up off-gas from the recirculation duct and ejects it into the downstream part mixed with the stream of fuel gas coming from the upstream part; a control circuit and a valve arranged in the upstream part of the fuel feed duct and arraType: ApplicationFiled: January 31, 2012Publication date: July 31, 2014Applicant: BELENOS CLEAN POWER HOLDING AGInventors: Marcel Hofer, Felix Buechi, Jérôme Bernard, Uwe Hannesen, Philipp Dietrich
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Patent number: 8268506Abstract: The present invention concerns a separator plate for use in a fuel cell stack with a substantially circular or oval main surface wherein a fluid flow path is defined by a plurality of channels extending substantially in parallel to each other and leading a fluid from a fluid supply port to a fluid discharge port. Adjacent channels merge such as to decrease the number of parallel channels from the supply port to the discharge port, thereby decreasing a cross sectional area of the flow path.Type: GrantFiled: February 12, 2010Date of Patent: September 18, 2012Assignee: Belenos Clean Power Holding AGInventors: Philipp Dietrich, Marcel Hofer, Felix Buechi
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Publication number: 20110250516Abstract: A method of operating a PEM fuel cell including an anode feed circuit and a cathode feed circuit for feeding of an anode side with a reactant gas and for feeding a cathode side with a cathode gas. A shut-down mode for shutting down an electricity generating operation of the fuel system includes decreasing the supply of reactant gas and cathode gas in response of a shut-down signal, monitoring an output voltage of at least one cell of a fuel cell stack, monitoring the reactant gas pressure and the cathode gas pressure, electrically shunting of the at least one fuel cell in response of the output voltage reaching a predefined voltage level, at least reducing the pressure of the anode side to a predefined pressure level by means of at least one pump, and filling and/or flushing of at least the anode side with an inert gas.Type: ApplicationFiled: April 27, 2009Publication date: October 13, 2011Applicant: BELENOS CLEAN POWER HOLDING AGInventors: Akinori Tsukada, Philipp Dietrich, Marcel Hofer, Felix Buechi, Uwe Hannesen
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Publication number: 20110111318Abstract: The method of operating a passive hybrid power supply in, or near, zero connected load conditions comprises the steps of: supplying a stream of substantially pure hydrogen to the anode of the fuel cell; supplying an stream of substantially pure oxygen to the cathode of the fuel cell; monitoring an electric current supplied by the storage battery; monitoring an output voltage shared by the fuel cell and the battery; evaluating a state of charge (SOC) of the battery based on the electric current and the output voltage; monitoring a hydrogen pressure in the fuel cell; monitoring an oxygen pressure in the fuel cell; limiting the stream of hydrogen and the stream of oxygen and actuating the hydrogen and oxygen recirculating pumps in such a way as to bring and maintain the hydrogen and oxygen pressures below 0.7 barabsolute while maintaining the hydrogen pressure between 70 and 130% of the oxygen pressure, in such a way as to ensure that the output voltage is maintained at a level corresponding to less than 0.Type: ApplicationFiled: November 10, 2010Publication date: May 12, 2011Applicant: BELENOS CLEAN POWER HOLDING AGInventors: Jérôme Bernard, Marcel Hofer, Felix Buechi, Philipp Dietrich
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Publication number: 20100209821Abstract: The present invention concerns a separator plate for use in a fuel cell stack with a substantially circular or oval main surface wherein a fluid flow path is defined by a plurality of channels extending substantially in parallel to each other and leading a fluid from a fluid supply port to a fluid discharge port. Adjacent channels merge such as to decrease the number of parallel channels from the supply port to the discharge port, thereby decreasing a cross sectional area of the flow path.Type: ApplicationFiled: February 12, 2010Publication date: August 19, 2010Applicant: BELENOS CLEAN POWER HOLDING AGInventors: Philipp Dietrich, Marcel Hofer, Felix Buechi