Patents by Inventor Philipp Dietrich

Philipp Dietrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11630394
    Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
    Type: Grant
    Filed: September 10, 2021
    Date of Patent: April 18, 2023
    Assignee: Karlsruhe Institute of Technology
    Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
  • Publication number: 20210405537
    Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
    Type: Application
    Filed: September 10, 2021
    Publication date: December 30, 2021
    Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
  • Patent number: 11143966
    Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: October 12, 2021
    Assignee: Karlsruhe Institute of Technology
    Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
  • Publication number: 20190163067
    Abstract: Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter.
    Type: Application
    Filed: January 31, 2019
    Publication date: May 30, 2019
    Inventors: Christian Koos, Tobias Hoose, Philipp Dietrich, Matthias Blaicher, Maria Laura Gödecke, Nicole Lindenmann
  • Patent number: 9413020
    Abstract: A method of operating a PEM fuel cell including an anode feed circuit and a cathode feed circuit for feeding of an anode side with a reactant gas and for feeding a cathode side with a cathode gas. A shut-down mode for shutting down an electricity generating operation of the fuel system includes decreasing the supply of reactant gas and cathode gas in response of a shut-down signal, monitoring an output voltage of at least one cell of a fuel cell stack, monitoring the reactant gas pressure and the cathode gas pressure, electrically shunting of the at least one fuel cell in response of the output voltage reaching a predefined voltage level, at least reducing the pressure of the anode side to a predefined pressure level by means of at least one pump, and filling and/or flushing of at least the anode side with an inert gas.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: August 9, 2016
    Assignee: Belenos Clean Power Holding AG
    Inventors: Akinori Tsukada, Philipp Dietrich, Marcel Hofer, Felix Buechi, Uwe Hannesen
  • Publication number: 20140212777
    Abstract: The fuel cell system includes: at least one fuel cell adapted to generate electrical energy from a fuel gas and an oxidizer gas; a fuel feed duct provided for supplying the fuel cell with fuel gas, the fuel feed duct including an upstream part and a downstream part; a Venturi effect ejector including a high pressure inlet, a low pressure inlet and an outlet, the upstream part of the fuel feed duct being connected to the high pressure inlet of the ejector and the downstream part extending between the ejector outlet and the fuel cell; an off-gas recirculation duct extending between the fuel cell and the low pressure ejector inlet so that, in the presence of a stream of fuel gas coming from the upstream part of the fuel feed duct and passing through the ejector, the ejector draws up off-gas from the recirculation duct and ejects it into the downstream part mixed with the stream of fuel gas coming from the upstream part; a control circuit and a valve arranged in the upstream part of the fuel feed duct and arra
    Type: Application
    Filed: January 31, 2012
    Publication date: July 31, 2014
    Applicant: BELENOS CLEAN POWER HOLDING AG
    Inventors: Marcel Hofer, Felix Buechi, Jérôme Bernard, Uwe Hannesen, Philipp Dietrich
  • Patent number: 8268506
    Abstract: The present invention concerns a separator plate for use in a fuel cell stack with a substantially circular or oval main surface wherein a fluid flow path is defined by a plurality of channels extending substantially in parallel to each other and leading a fluid from a fluid supply port to a fluid discharge port. Adjacent channels merge such as to decrease the number of parallel channels from the supply port to the discharge port, thereby decreasing a cross sectional area of the flow path.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: September 18, 2012
    Assignee: Belenos Clean Power Holding AG
    Inventors: Philipp Dietrich, Marcel Hofer, Felix Buechi
  • Publication number: 20110250516
    Abstract: A method of operating a PEM fuel cell including an anode feed circuit and a cathode feed circuit for feeding of an anode side with a reactant gas and for feeding a cathode side with a cathode gas. A shut-down mode for shutting down an electricity generating operation of the fuel system includes decreasing the supply of reactant gas and cathode gas in response of a shut-down signal, monitoring an output voltage of at least one cell of a fuel cell stack, monitoring the reactant gas pressure and the cathode gas pressure, electrically shunting of the at least one fuel cell in response of the output voltage reaching a predefined voltage level, at least reducing the pressure of the anode side to a predefined pressure level by means of at least one pump, and filling and/or flushing of at least the anode side with an inert gas.
    Type: Application
    Filed: April 27, 2009
    Publication date: October 13, 2011
    Applicant: BELENOS CLEAN POWER HOLDING AG
    Inventors: Akinori Tsukada, Philipp Dietrich, Marcel Hofer, Felix Buechi, Uwe Hannesen
  • Publication number: 20110111318
    Abstract: The method of operating a passive hybrid power supply in, or near, zero connected load conditions comprises the steps of: supplying a stream of substantially pure hydrogen to the anode of the fuel cell; supplying an stream of substantially pure oxygen to the cathode of the fuel cell; monitoring an electric current supplied by the storage battery; monitoring an output voltage shared by the fuel cell and the battery; evaluating a state of charge (SOC) of the battery based on the electric current and the output voltage; monitoring a hydrogen pressure in the fuel cell; monitoring an oxygen pressure in the fuel cell; limiting the stream of hydrogen and the stream of oxygen and actuating the hydrogen and oxygen recirculating pumps in such a way as to bring and maintain the hydrogen and oxygen pressures below 0.7 barabsolute while maintaining the hydrogen pressure between 70 and 130% of the oxygen pressure, in such a way as to ensure that the output voltage is maintained at a level corresponding to less than 0.
    Type: Application
    Filed: November 10, 2010
    Publication date: May 12, 2011
    Applicant: BELENOS CLEAN POWER HOLDING AG
    Inventors: Jérôme Bernard, Marcel Hofer, Felix Buechi, Philipp Dietrich
  • Publication number: 20100209821
    Abstract: The present invention concerns a separator plate for use in a fuel cell stack with a substantially circular or oval main surface wherein a fluid flow path is defined by a plurality of channels extending substantially in parallel to each other and leading a fluid from a fluid supply port to a fluid discharge port. Adjacent channels merge such as to decrease the number of parallel channels from the supply port to the discharge port, thereby decreasing a cross sectional area of the flow path.
    Type: Application
    Filed: February 12, 2010
    Publication date: August 19, 2010
    Applicant: BELENOS CLEAN POWER HOLDING AG
    Inventors: Philipp Dietrich, Marcel Hofer, Felix Buechi