Patents by Inventor Philipp Niedermann

Philipp Niedermann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10324417
    Abstract: The invention relates to a method for fabrication of a balance spring of a predetermined stiffness comprising the steps of fabricating a balance spring in dimensions of increased thickness, determining the stiffness of the balance spring formed in step a) in order to remove a volume of material to obtain the balance spring having the dimensions necessary for said predetermined stiffness.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: June 18, 2019
    Assignee: CSeM Centre Suisse d'Electronique et de Microtechnique SA-Recherche et développement
    Inventors: Philipp Niedermann, Olivier Dubochet
  • Publication number: 20170176940
    Abstract: The invention relates to a method for fabrication of a balance spring of a predetermined stiffness comprising the steps of fabricating a balance spring in dimensions of increased thickness, determining the stiffness of the balance spring formed in step a) in order to remove a volume of material to obtain the balance spring having the dimensions necessary for said predetermined stiffness.
    Type: Application
    Filed: November 17, 2016
    Publication date: June 22, 2017
    Applicant: CSEM Centre Suisse d'Electronique et de Microtechnique SA-Recherche et developpement
    Inventors: Philipp NIEDERMANN, Olivier DUBOCHET
  • Publication number: 20010015018
    Abstract: The invention concerns a stylus intended for nanotechnology, including a monocrystalline silicon membrane (15), a beam (14) secured to the membrane by one end and a diamond tip (16), in the shape of a pyramid with three faces, arranged at the other end of the beam. The base of the pyramid forms an isosceles triangle having the axis of the beam as its axis of symmetry. Two of its faces are identical and arranged symmetrically with respect to said axis, the third face, which has the base of the isosceles triangle as its base, having said axis as its axis of symmetry.
    Type: Application
    Filed: December 8, 2000
    Publication date: August 23, 2001
    Inventors: Philipp Niedermann, Urs Staufer
  • Patent number: 6056887
    Abstract: A process for fabricating a feeler member for a micromechanical probe, in particular for an atomic force microscope, consists in creating a "positive" first mold by isotropically or anisotropically undercutting a silicon substrate. The resulting tip is precursor of the hard material (preferably diamond) tip to be obtained. The precursor has a small angle at the apex, for example in the order of 10.degree. to 20.degree., or less. The positive mold is then used to fabricate a "negative" mold having an imprint whose shape is that of the tip precursor. The negative mold is filled with a layer of hard material and the tip is then uncovered. The hard material tip therefore also has a small angle at the apex, equal to that of the precursor. The resolution that can be achieved with the probe is therefore higher than that assured by prior art probes.
    Type: Grant
    Filed: June 4, 1998
    Date of Patent: May 2, 2000
    Assignee: C.S.E.M. - Centre Suisse d'Electronique et de Microtechniques S.A.
    Inventors: Philipp Niedermann, Cynthia Beuret, Sylvain Jeanneret
  • Patent number: 5994160
    Abstract: Process for manufacturing micromechanical components having a part made of diamond, consisting of at least one tip (3a), in which a substrate (8a) is prepared, in order to form an impression (13a) of the shape desired for the part made of diamond; the part made of diamond is produced by chemical vapor deposition of diamond in the impression and is then separated from the substrate. In order to produce the part made of diamond, a primary film of fine diamond particles, of diameter less than 10 nm, suitable to act as seeds for growth of the diamond are deposited on the substrate, on the surface of the impression (13a), before chemical vapor deposition; the diamond film is then grown by vapor deposition; and the substrate (8a) is then at least partly removed.
    Type: Grant
    Filed: September 27, 1996
    Date of Patent: November 30, 1999
    Assignee: CSEM-Centre Suisse'd Electronique et de Microtechnique S.A.
    Inventors: Philipp Niedermann, Rainer F. Christoph
  • Patent number: 5932876
    Abstract: A tunnel effect sensor, suitable for determining the topography of a surface, arm for exploring the profile of a surface of the sample by scanning it along two axes. The arm includes a tactile point that can be moved in a direction normal to the surface to be explored and a tunnel point near a tunnel electrode attached to the substrate. A control loop controls the distance between the tunnel point and its electrode. The position of the feeler arm is adjusted by means of the control loop and two actuators operating on the feeler arm in opposite directions. The feeler arm can therefore effect a virtual pivoting movement about the tunnel point. As a result, the sample-holder does not need to be moved along the measurement axis during measurements. Applications include atomic force microscopes.
    Type: Grant
    Filed: October 24, 1997
    Date of Patent: August 3, 1999
    Assignee: Centre Suisse E'Electronique et de Microtechnique S.A.
    Inventor: Philipp Niedermann