Abstract: This document provides methods and materials for treating multiple system atrophy. For example, methods and materials for using autologous mesenchymal stem cells (e.g., adipose derived mesenchymal stem cells) to treat multiple system atrophy are provided.

Abstract: An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.

Abstract: This disclosure relates to interpreting user inputs, including user touch gestures inputs, to generate explicit instructions for an application program running on a computing platform. A user may make an input on a touch-enabled display of the computing platform. The input may trace a path on the application presented on the touch-enabled display. The path includes one or more features, and/or may intersect with virtual objects of the application. The features of the path may be used to generate explicit instructions for the application or the virtual objects of the application. The instructions may facilitate control of the functionality of the virtual objects. The application can be a game and/or other application.

Abstract: An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.

Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.

Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.

Abstract: This invention provides a recombinant herpesvirus of turkeys comprising a herpesvirus of turkeys viral genome which contains a foreign DNA sequence inserted within the EcoR1 #9 fragment of the herpesvirus of turkeys viral genome, and the foreign DNA sequence is capable of being expressed in a host cell infected with the herpesvirus of turkeys.This invention provides a recombinant herpesvirus of turkeys-Marek's disease virus chimera comprising a herpesvirus of turkeys unique long viral genome region and a Marek's disease virus unique short region.Lastly, this invention provides homology vectors for producing a recombinant herpesvirus of turkeys, host cells, and vaccines and methods for immunization.