Patents by Inventor Phillip Hustad

Phillip Hustad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11332583
    Abstract: A polyolefin-polydiorganosiloxane block copolymer may be prepared by hydrosilylation reaction.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: May 17, 2022
    Assignees: Dow Silicones Corporation, Dow Global Technoloaies LLC
    Inventors: Steven Swier, Phillip Hustad, David Devore, Zachary Kean, Liam Spencer, Jordan Reddel, Bethany Neilson, John Bernard Horstman, Ken Kawamoto, Jerzy Klosin
  • Publication number: 20210002431
    Abstract: A polyolefin-polydiorganosiloxane block copolymer may be prepared by hydrosilylation reaction.
    Type: Application
    Filed: February 22, 2019
    Publication date: January 7, 2021
    Inventors: Steven Swier, Phillip Hustad, David Devore, Zachary Kean, Liam Spencer, Jordan Reddel, Bethany Neilson, John Bernard Horstman, Ken Kawamoto, Jerzy Klosin
  • Publication number: 20200407512
    Abstract: A polyolefin-polydiorganosiloxane block copolymer may be prepared by Piers-Rubinsztajn reaction.
    Type: Application
    Filed: February 22, 2019
    Publication date: December 31, 2020
    Inventors: Steven Swier, Phillip Hustad, David Devore, Zachary Kean, Liam Spencer, Jordan Reddel, Bethany Neilson, John Bernard Horstman, Ken Kawamoto
  • Publication number: 20160133477
    Abstract: In a preferred aspect, methods are provided that comprise a) providing a semiconductor substrate comprising a patterned mask over a layer to be patterned; b) applying a layer of a first composition over the mask, wherein the composition comprises a polymer and the layer is coated on a sidewall of the mask; c) applying a layer of a second composition over the semiconductor substrate in a volume adjacent the coated sidewall of the mask; and d) removing the first composition from the sidewall of the mask, thereby exposing the layer to be patterned and forming a gap between the mask sidewall and the second composition layer to provide a relief image. The methods find particular applicability in semiconductor device manufacture.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 12, 2016
    Inventors: Peter Trefonas, III, Phillip Hustad, Jieqian Zhang, James C. Taylor
  • Patent number: 9012545
    Abstract: A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: April 21, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Xinyu Gu, Shih-Wei Chang, Rahul Sharma, Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Peter Trefonas
  • Patent number: 8822616
    Abstract: A block copolymer formulation is provided including a block copolymer blend including a first poly(acrylate)-b-poly(silyl acrylate) block copolymer; and, a second poly(acrylate)-b-poly(silyl acrylate) block copolymer. Also provided are substrates treated with the block copolymer formulation.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Phillip Hustad, Peter Trefonas, Xinyu Gu, Shih-Wei Chang, Valeriy Ginzburg, Erin Vogel, Daniel Murray
  • Patent number: 8822619
    Abstract: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Patent number: 8822615
    Abstract: A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Publication number: 20140227447
    Abstract: A block copolymer formulation is provided including a block copolymer blend including a first poly(acrylate)-b-poly(silyl acrylate) block copolymer; and, a second poly(acrylate)-b-poly(silyl acrylate) block copolymer. Also provided are substrates treated with the block copolymer formulation.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Phillip Hustad, Peter Trefonas, Xinyu Gu, Shih-Wei Chang, Valeriy Ginzburg, Erin Vogel, Daniel Murray
  • Publication number: 20140227445
    Abstract: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Publication number: 20140227448
    Abstract: A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Publication number: 20140061155
    Abstract: A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
    Type: Application
    Filed: August 31, 2012
    Publication date: March 6, 2014
    Applicants: DOW GLOBAL TECHNOLOGIES LLC., ROHM AND HAAS ELECTRONIC MATERIALS LLC.
    Inventors: Xinyu Gu, Shih-Wei Chang, Rahul Sharma, Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Peter Trefonas
  • Publication number: 20140014001
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; annealing the film in a gaseous atmosphere containing ?20 wt % oxygen; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
    Type: Application
    Filed: July 12, 2012
    Publication date: January 16, 2014
    Applicants: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Phillip Hustad, Xinyu Gu, Shih-Wei Chang, Jeffrey Weinhold, Peter Trefonas
  • Publication number: 20080021172
    Abstract: An olefin polymer having greater than 95 percent chain end unsaturation, where greater than 80 percent of said unsaturation comprises a 1,2-disubstituted olefinic unsaturation, especially polymers comprising in polymerized form 4-methyl-1-pentene and more especially highly isotactic polymers, a process of manufacture, methods to functionalize and articles formed therefrom.
    Type: Application
    Filed: January 21, 2005
    Publication date: January 24, 2008
    Applicant: DOW GLOBAL TECHNOLOGIES, INC.
    Inventors: John Briggs, Edmund Carnahan, Phillip Hustad, Tia Jackson
  • Publication number: 20070275219
    Abstract: The present invention relates to compositions and processes of making and using interpolymers having a controlled molecular weight distribution. Multilayer films and film layers derived from novel ethylene/?-olefin interpolymers are also disclosed.
    Type: Application
    Filed: June 13, 2007
    Publication date: November 29, 2007
    Applicant: Dow Global Technologies Inc.
    Inventors: Rajen Patel, David Fuchs, Pradeep Jain, Seema Karande, Mehmet Demirors, Mark Spencer, Kim Walton, Angela Taha, Phillip Hustad, Roger Kuhlman, Anthony Castelluccio
  • Publication number: 20070276102
    Abstract: A method for identifying a catalyst composition for use in the heterogeneous Ziegler-Natta addition polymerization of an olefin monomer, said catalyst composition comprising a procatalyst comprising a magnesium and titanium containing procatalyst and a cocatalyst said method comprising: a) providing a library comprising at least one procatalyst compound, b) forming a catalyst composition library by contacting the member of said procatalyst library with one or more cocatalysts and contacting the resulting mixture with an olefin monomer under olefin polymerization conditions thereby causing the polymerization reaction to take place, c) measuring at least one variable of interest during the polymerization, and d) selecting the catalyst composition of interest by reference to said measured variable.
    Type: Application
    Filed: May 13, 2005
    Publication date: November 29, 2007
    Inventors: Richard Campbell, Sylvie Desjardins, Phillip Hustad, Duane Romer
  • Publication number: 20070167315
    Abstract: A composition for use in forming a multi-block copolymer from a single polymerizable monomer, said copolymer containing therein two or more segments or blocks differing in branching index, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first olefin polymerization catalyst, (B) a second olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, at least one of catalyst (A) or catalyst (B) being capable of forming a branched polymer by means of chain walking or reincorporation of in situ formed olefinic polymer chains, and (C) a chain shuttling agent.
    Type: Application
    Filed: March 17, 2005
    Publication date: July 19, 2007
    Inventors: Daniel Arriola, David Devore, Edmund Carnahan, Phillip Hustad, Roger Kuhlman, Timothy Wenzel
  • Publication number: 20070167578
    Abstract: A composition for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
    Type: Application
    Filed: March 17, 2005
    Publication date: July 19, 2007
    Inventors: Daniel Arriola, Edmund Carnahan, Yunwa Cheung, David Devore, David Graf, Phillip Hustad, Roger Kuhlman, Colin Shan, Benjamin Poon, Gordon Roof, James Stevans, Pamela Stirn, Timothy Wenzel
  • Publication number: 20070135575
    Abstract: The present invention relates to compositions and processes of making polymers having a controlled molecular weight distribution. The molecular weight distribution is controlled, for example, by controlling the relative monomer concentrations during contact with a pre-catalyst and/or using a catalyst comprising a catalytic amount of a molecule having the structure: wherein M=group 2-8 metal, preferably group 4 as a neutral or charged moiety; Y=any substituent including fused rings; L=any ligating group, especially a pyridyl or pyridylamide; X=alkyl, aryl, substituted alkyl, H or hydride, halide, or other anionic moiety; y=an integer from 0 to the complete valence of M; R=alkyl, aryl, haloalkyl, haloaryl, hydrogen, etc; x=1-6, especially 2; Dashed line=optional bond, especially a weak bond; and X and (CR2)x may be tethered or part of a ring.
    Type: Application
    Filed: December 7, 2006
    Publication date: June 14, 2007
    Applicant: Dow Global Technologies Inc.
    Inventors: Phillip Hustad, Roger Kuhlman, Robert Froese, Timothy Wenzel, Joseph Coalter
  • Publication number: 20070004883
    Abstract: Bis(salicylaldiminato)titanium complex with optionally substituted phenyl or cyclohexyl on nitrogen catalyzes highly syndiospecific polymerization of propylene. Syndiotactic polypropylene with defects of the type rmr having [rrrr] content greater than 0.70 and block copolymer containing block(s) of the syndiotactic polypropylene and block(s) of poly(ethylene-co-propylene) and/or poly(alpha-olefin-co-propylene) are obtained. Certain of the catalysts provide living polymerization. Living olefin polymers and olefin terminated oligomers and polymers are also products.
    Type: Application
    Filed: August 14, 2006
    Publication date: January 4, 2007
    Applicant: Cornell Research Foundation, Inc.
    Inventors: Geoffrey Coates, Jun Tian, Phillip Hustad