Patents by Inventor Pierre Vanden Brande
Pierre Vanden Brande has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10323319Abstract: A method and a device for the coating of running substrates moving along a run direction through a treatment zone, in which the vapor of a coating material is generated in a chamber, this vapor passing through g a treatment aperture towards the treatment zone where the coating material condenses on the surface of the substrates. The vapor flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter, between an open position, in which the vapor flows through the treatment aperture towards the treatment zone, and a closed position, in which the vapor is prevented from flowing towards the treatment zone through the treatment aperture.Type: GrantFiled: October 3, 2016Date of Patent: June 18, 2019Assignee: ADVANCED GALVANISATION AGInventor: Pierre Vanden Brande
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Publication number: 20170088936Abstract: A method and a device for the coating of running substrates moving along a run direction through a treatment zone, in which the vapour of a coating material is generated in a chamber, this vapour passing through g a treatment aperture towards the treatment zone where the coating material condenses on the surface of the substrates. The vapour flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter, between an open position, in which the vapour flows through the treatment aperture towards the treatment zone, and a closed position, in which the vapour is prevented from flowing towards the treatment zone through the treatment aperture.Type: ApplicationFiled: October 3, 2016Publication date: March 30, 2017Inventor: Pierre VANDEN BRANDE
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Patent number: 9458533Abstract: The invention relates to a method and a device for the coating of running substrates (25) moving along a run direction through a treatment zone (6), in which the vapor of a coating material is generated in a chamber (5), this vapor passing through a treatment aperture towards the treatment zone (6) where the coating material condenses on the surface of the substrates (25). The vapor flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter (13), between an open position, in which said vapor flows through the treatment aperture towards the treatment zone (6), and a closed position, in which the vapor is prevented from flowing towards the treatment zone (6) through the treatment aperture.Type: GrantFiled: December 22, 2008Date of Patent: October 4, 2016Assignee: ADVANCED GALVANISATION AGInventor: Pierre Vanden Brande
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Patent number: 9222162Abstract: The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.Type: GrantFiled: November 7, 2008Date of Patent: December 29, 2015Assignee: ADVANCED GALVANISATION AGInventor: Pierre Vanden Brande
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Publication number: 20100272921Abstract: The invention relates to a method and a device for the coating of running substrates (25) moving along a run direction through a treatment zone (6), in which the vapour of a coating material is generated in a chamber (5), this vapour passing through a treatment aperture towards the treatment zone (6) where the coating material condenses on the surface of the substrates (25). The vapour flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter (13), between an open position, in which said vapour flows through the treatment aperture towards the treatment zone (6), and a closed position, in which the vapour is prevented from flowing towards the treatment zone (6) through the treatment aperture.Type: ApplicationFiled: December 22, 2008Publication date: October 28, 2010Inventor: Pierre Vanden Brande
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Patent number: 7156960Abstract: A method for the deposition of a metal layer on a substrate (1) uses a cold plasma inside an enclosure (7) heated to avoid the formation of a metal deposit at its surface. The enclosure has an inlet (21) and an outlet (22) for the substrate with a source of metal vapor between them, made up of an electrode to form a plasma (6) with the substrate or a separate electrically conducting element as a counter-electrode. The deposition metal is introduced in the liquid state in a retention tank (8) and is maintained as a liquid at an essentially constant level during the formation of the metal layer on the substrate. An Independent claim is included for the device used to put this method of coating a substrate into service.Type: GrantFiled: August 23, 2001Date of Patent: January 2, 2007Assignee: Cold Plasma Applications, CPA, SPRLInventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6933460Abstract: The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate (1) fed in a substantially continuous manner through a vacuum chamber (3), having a treatment zone in which an electric discharge (10), i.e. a plasma, and a magnetic field are produced in a gas maintained at a pressure below atmospheric pressure between at least the substrate (1), acting as an electrode, and at least one counter-electrode (9) to enable the substrate (1) to be bombarded by the ions produced in the electric discharge (10). This method is characterised in that a confining magnetic induction field is produced entirely around the substrate (1) in the treatment zone so that the electric discharge (10) is also confined entirely around the substrate (1) inside this treatment zone by the confinement of electrons released in the electric discharge (10).Type: GrantFiled: August 6, 2001Date of Patent: August 23, 2005Inventors: Pierre Vanden Brande, Alain Weymeersch
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Publication number: 20040026234Abstract: A method for the deposition of a metal layer on a substrate (1) uses a cold plasma inside an enclosure (7) heated to avoid the formation of a metal deposit at its surface. The enclosure has an inlet (21) and an outlet (22) for the substrate with a source of metal vapor between them, made up of an electrode to form a plasma (6) with the substrate or a separate electrically conducting element as a counter-electrode. The deposition metal is introduced in the liquid state in a retention tank (8) and is maintained as a liquid at an essentially constant level during the formation of the metal layer on the substrate. An Independent claim is included for the device used to put this method of coating a substrate into service.Type: ApplicationFiled: August 18, 2003Publication date: February 12, 2004Inventors: Pierre Vanden Brande, Alain Weymeersch
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Publication number: 20040026412Abstract: The invention relates to a method of treatment, in particular cleaning and/or heating, for a metal substrate (1) fed in a substantially continuous manner through a vacuum chamber (3), having a treatment zone in which an electric discharge (10), i.e. a plasma, and a magnetic field are produced in a gas maintained at a pressure below atmospheric pressure between at least the substrate (1), acting as an electrode, and at least one counter-electrode (9) to enable the substrate (1) to be bombarded by the ions produced in the electric discharge (10). This method is characterised in that a confining magnetic induction field is produced entirely around the substrate (1) in the treatment zone so that the electric discharge (10) is also confined entirely around the substrate (1) inside this treatment zone by the confinement of electrons released in the electric discharge (10).Type: ApplicationFiled: February 4, 2003Publication date: February 12, 2004Inventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6638032Abstract: Vacuum pump with a chamber (1) having, on one side, an intake (2) for pumping gas and, on the opposite side, an outlet (3) for the gas, displacement elements (4) being provided to drive the gas from the intake (2) towards the outlet (3), the displacement elements (4) including at least a vibrating element (4) for generating sound waves moving in the chamber (1), elements for closing (6) the outlet (3) being provided synchronously co-operating with the displacement elements (4) so as to clear the outlet opening (3) when the gas pressure in the proximity of the outlet (3) is higher than that in the proximity of the intake (2).Type: GrantFiled: October 29, 2001Date of Patent: October 28, 2003Inventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6612816Abstract: The invention concerns a molecular pump for evacuating a gas from a chamber, comprising a substantially sealed box (1) having on one of its sides an intake orifice (2) to be connected to said chamber and, on the opposite side, an outlet orifice (3), to be preferably connected to a discharge pump, whereby elements (4) are mounted between those two orifices (2) and (3) at some distance from one another in substantially fixed sites inside said box (1) for the gas to pass through, said elements (4) being of such a nature as to impart to said gas molecules, coming from said chamber and coming into contact with said elements (4), a speed whereof the resultant is oriented towards the outlet orifice (3).Type: GrantFiled: November 15, 2001Date of Patent: September 2, 2003Inventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6485615Abstract: A process of depositing a coating (5) onto a substrate (3) by reactive sputtering in a closed chamber (1) in the presence of a plasma of a non-reactive gas, and a reactive gas containing the element or elements said coating has to be made of, according to which process use is made of a target (2) having a surface layer (4) directed towards the substrate and containing at least one of the elements to be sputter deposited onto this substrate, according to which process the thickness of said surface layer (4) during the cathode sputtering is controlled by adjusting the concentration of the gases in said closed chamber (1). The single figure.Type: GrantFiled: April 11, 1994Date of Patent: November 26, 2002Assignee: Recherche et Development du Groupe Cockerill SambreInventors: René Winand, Stéphane Lucas, Pierre Vanden Brande, Alain Weymeersch, Lucien Renard
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Patent number: 6432281Abstract: A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the coating material takes place. With the inventive process, deposits with controlled structure and adhesion can be made on moving substrate or support even at very high speeds, so that the process can advantageously be carried out continuously or at variable speed.Type: GrantFiled: January 31, 2001Date of Patent: August 13, 2002Assignee: Recherche et Developpement Due Groupe Cockerill SambreInventors: Pierre Vanden Brande, Stephane Lucas, Alain Weymeersch
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Patent number: 6337005Abstract: Process for the depositing, onto a substrate, of a coating essentially constituted of an electronic conductor compound, in which the said coating is formed by producing alternatively, on the one hand, in at least one depositing zone, one or several deposits of a determined thickness of an electronic conductor element on the substrate, and, on the other hand, in at least one reaction zone, one or several reactions of the element thus deposited with ions of a reactive gas which are implanted into the deposit of the above-mentioned element over approximately this entire thickness determined in a way as to form, preferably with the totality of this element, the said compound, the above-mentioned ions being submitted to a kinetic energy below 2000 V, while the aforesaid thickness of the deposit of the element is determined as a function of the kinetic energy applied in such a way as to allow the implantation of these ions over approximately this entire thickness.Type: GrantFiled: January 5, 2001Date of Patent: January 8, 2002Assignee: Recherche et Développement du Groupe Cockerill Sambre en abrégé RD-CSInventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6334751Abstract: Air lock for introducing and continuously passing a strip of a substrate into and through a vacuum chamber, including an enclosure containing at least three successive rollers in the direction of travel of the strip and between which a passage is made for the strip, the first and third rollers being located on one side of this passage, the second roller being located on the opposite side of this passage, an essentially airtight region being formed between the strip and the first and third rollers and connected to a vacuum pump, a component being provided for adjusting the pressure with which the strip rests on the rollers.Type: GrantFiled: November 26, 1999Date of Patent: January 1, 2002Assignee: Recherche et Developpment du Groupe Cockerill Sambre, en abrégé RD-CSInventors: Pierre Vanden Brande, Alain Weymeersch
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Publication number: 20010032782Abstract: A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the coating material takes place.Type: ApplicationFiled: January 31, 2001Publication date: October 25, 2001Applicant: Recherche et Developpement du Groupe Cockerill SambreInventors: Pierre Vanden Brande, Stephane Lucas, Alain Weymeersch
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Patent number: 6231727Abstract: Process for continuously stripping the surface of a substrate moving in a defined direction through a vacuum chamber past at least one counterelectrode, according to which process a plasma is created in a gas, between this counterelectrode and this surface, so as to generate radicals and/or ions which can act on the surface to be stripped, characterized in that at least one pair of successive counterelectrodes, past which the abovementioned chamber and in that an alternating potential is applied to these counterelectrodes so as to impose on the latter an alternately positive and negative potential with respect to the substrate.Type: GrantFiled: October 2, 1998Date of Patent: May 15, 2001Assignee: Recherche et Developpement du Groupe Cockerill Sambre, en Abrege RD-CSInventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6171659Abstract: Process for the depositing, onto a substrate, of a coating essentially constituted of an electronic conductor compound, in which the said coating is formed by producing alternatively, on the one hand, in at least one depositing zone, one or several deposits of a determined thickness of an electronic conductor element on the substrate, and, on the other hand, in at least one reaction zone, one or several reactions of the element thus deposited with ions of a reactive gas which are implanted into the deposit of the above-mentioned element over approximately this entire thickness determined in a way as to form, preferably with the totality of this element, the said compound, the above-mentioned ions being submitted to a kinetic energy below 2000 V, while the aforesaid thickness of the deposit of the element is determined as a function of the kinetic energy applied in such a way as to allow the implantation of these ions over approximately this entire thickness.Type: GrantFiled: July 11, 1997Date of Patent: January 9, 2001Assignee: Recherche et d{acute over (e)}veloppement du groupe Cockerill Sambre, en abr{acute over (e)}g{acute over (e)}Inventors: Pierre Vanden Brande, Alain Weymeersch
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Patent number: 6099667Abstract: A process for annealing a moving metal substrate, especially a steel sheet.Type: GrantFiled: February 10, 1998Date of Patent: August 8, 2000Assignee: Recherche et Developpement du Groupe Cockerill SambreInventors: Pierre Vanden Brande, Alain Weymeersch, Philippe Harlet
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Patent number: 6083359Abstract: Disclosed is a process for forming a coating on a substrate (2,2') by cate sputtering, comprising the coating of substrate surfaces (2,2') which have been transferred to a cathode sputtering chamber (1). The substrates vary in width and have a predetermined maximum width. The process involves the use of a target (3) whose surface (4) has an invariable length corresponding approximately to said maximum substrate width. A shift takes place, in accordance with the width of the substrate being coated, between the surface (4) of the target and the substrate surface to be coated, so that the entire surface of the target remains more or less constantly in front of the surface to be coated during the cathode sputtering process.Type: GrantFiled: June 8, 1999Date of Patent: July 4, 2000Assignee: Recherches Et Developpement Du Groupe Cockerill Sambre, en abrege: RDCSInventors: Pierre Vanden Brande, Alain Weymeersch