Patents by Inventor Pieter Van Pelt

Pieter Van Pelt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6153254
    Abstract: A method and a device for manufacturing an electroluminescent display, by means of which a first pattern of electrodes (2) is provided on a flat surface (1) on which a layer of organic electroluminescent material (7) is subsequently deposited. A mask (10) with strips of mask material (11) is formed on a separate support (14), the strips being separated from each other by spaces (12) which correspond to a second pattern of electrodes (8). Subsequently, said mask is transferred to the layer of electroluminescent material in a dry manner by pressing the support onto the substrate. After transferring the mask (10), a second electrode material (13) is deposited, the electrodes of the second pattern being formed in the spaces in the mask. The layer of electroluminescent material (7) may be deposited by vapor deposition, spin-coating or screen-printing.
    Type: Grant
    Filed: February 10, 1999
    Date of Patent: November 28, 2000
    Assignee: U.S. Philips Corporation
    Inventors: Edward W. A. Young, Pieter Van Pelt
  • Patent number: 4405708
    Abstract: A method of applying a resist pattern on a substrate and resist material mixture.Resist materials which are applied in accordance with a specific resist pattern are employed in the production of integrated circuits. It has been found that the addition of a certain type of negative-working resist material, namely polystyrene and polystyrene derivatives, to positive-working resist materials results in a resist material mixture having an increased resistance to plasma etching.
    Type: Grant
    Filed: March 8, 1982
    Date of Patent: September 20, 1983
    Assignee: U.S. Philips Corporation
    Inventors: Pieter van Pelt, Jacob Wijdenes
  • Patent number: 4394438
    Abstract: A method of manufacturing an optically readable information carrier in which a substrate 1 which is provided on at least one surface with a material which is sensitive to deep ultraviolet light having a wavelength from 190-300 nm, is exposed to deep ultraviolet light via a contact mask 2 which on one side has a layer 4 of a material which is not permeable to deep ultraviolet light in which an information track 5, 6 has been provided, after which the exposed plate is developed and if desired is provided with a reflection layer.
    Type: Grant
    Filed: August 10, 1981
    Date of Patent: July 19, 1983
    Assignee: U.S. Philips Corporation
    Inventors: Pieter Van Pelt, Gerardus J. M. Lippits