Patents by Inventor Pieter W. H. De Jager

Pieter W. H. De Jager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7390614
    Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: June 24, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes G. Gijsbertsen, Pieter W. H. De Jager, Michiel D. Nijkerk