Patents by Inventor Pil-kwon Jun

Pil-kwon Jun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6337174
    Abstract: In the fabrication of semiconductor devices, a method of forming a fine pattern on a semiconductor substrate includes the steps of exposing and developing a photoresist deposited on a film of a semiconductor substrate in order to remove selected portions of the photoresist, etching portions of the film left exposed when the selected portions of the photoresist are removed, and subsequently removing any of the photoresist remaining on the semiconductor substrate with dimethylacetamide, or a combination of monoethanolamine and dimethylsulfoxide. Such stripping solutions are capable of removing photoresists in the Deep-UV group as well as the conventionally used photoresists in the I-line group.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: January 8, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mi-sook Jeon, Chun-deuk Lee, June-ing Gil, Pil-kwon Jun
  • Patent number: 6207358
    Abstract: In the fabrication of semiconductor devices, a method of forming a fine pattern on a semiconductor substrate includes the steps of exposing and developing a photoresist deposited on a film of a semiconductor substrate in order to remove selected portions of the photoresist, etching portions of the film left exposed when the selected portions of the photoresist are removed, and subsequently removing any of the photoresist remaining on the semiconductor substrate with dimethylacetamide, or a combination of monoethanolamine and dimethylsulfoxide. Such stripping solutions are capable of removing photoresists in the Deep-UV group as well as the conventionally used photoresists in the I-line group.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: March 27, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mi-sook Jeon, Chun-deuk Lee, June-ing Gil, Pil-kwon Jun
  • Patent number: 6100203
    Abstract: Aqueous cleaning compositions comprise from about 0.01 to about 10 weight percent of hydrogen fluoride; from about 1 to about 10 weight percent of hydrogen peroxide; and from about 0.01 to about 30 weight percent of isopropyl alcohol. Methods of manufacturing microelectronic devices comprise providing electrodes on insulation films on microelectronic substrates; etching the insulation films using the electrodes as etching masks to form an exposed surfaces on the electrodes; cleaning the exposed surfaces with aqueous cleaning compositions comprising from about 0.01 to about 10 weight percent of hydrogen fluoride; from about 1 to about 10 weight percent of hydrogen peroxide; and from about 0.01 to about 30 weight percent of isopropyl alcohol; and forming dielectric films on the exposed surfaces of the electrodes. The cleaning step and the etching step are carried out simultaneously.
    Type: Grant
    Filed: July 16, 1998
    Date of Patent: August 8, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-ing Kil, Pil-kwon Jun, Min-sang Yun, Young-hwan Yun, Gyu-hwan Kwack, Sang-moon Chon
  • Patent number: 5866305
    Abstract: A thinner composition used in a washing process for manufacturing semiconductor devices includes at least ethyl lactate (EL) and ethyl-3-ethoxy propionate (EEP), and preferably, additionally includes Gamma-butyrolactone. The thinner composition has high volatility and low viscosity as well as a sufficient solubility rate for rinsing photoresist on the wafer when spraying the thinner through nozzles. Photoresist at the edge or backside of a wafer can be effectively removed at a sufficiently rapid rate, so that the yield of the semiconductor devices is enhanced. In addition, any remaining photoresist attached to the surface can be completely removed to enable the reuse of the wafer, with resulting economic benefits.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: February 2, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-moon Chon, Boo-sup Lee, Sung-il Kim, Jun-ing Gil, Pil-kwon Jun, Me-suk Jun