Abstract: The present invention provides an optical film comprising a light-transmitting substrate and a buffer layer, and having the maximum restoration length of 40-100 mm, and a display device comprising such an optical film.

Abstract: The present invention relates to a coating resin composition comprising a siloxane resin chemically bonded by compounds including an alkoxy silane containing epoxy or acrylic in the chemical structure; a dialkoxysilane of a silane D structure; or a trialkoxy silane of a silane T structure, and to a coating film comprising a cured article of the resin composition as a coating layer.

Abstract: The present invention relates to a hard coating film having a multilayer-structure and, specifically, to a hard coating film having a multilayer-structure, which has a low Vickers hardness (Hv) value while having an excellent scratch resistance together with flexibility.

Abstract: The present invention relates to a resin composition for coating, and a coating film comprising a cured product thereof as a coating layer. Particularly, the present invention relates to a resin composition for coating, and a coating film comprising a cured product thereof as a coating layer, wherein the resin composition for coating comprises a siloxane resin that is chemically bonded by compounds comprising alkoxysilane and diol, which comprise epoxy or acryl within the chemical structures thereof.

Abstract: Disclosed are an anti-glare coating resin composition and an anti-glare coating film including the same. Specifically, provided are an anti-glare coating resin composition that includes a siloxane resin containing an epoxy group and an acrylic group, and further includes organic or inorganic particles, and thus ensures hardness, scratch resistance and processability, and provides anti-glare property by introduction of particles, and an anti-glare coating film produced using the same. Also, it is possible to realize hardness, abrasion resistance and anti-glare property of a film resin prepared using the resin composition and a film produced using the same.

Abstract: The present invention relates to a hard coating film having a multilayer-structure and, specifically, to a hard coating film having a multilayer-structure, which has a low Vickers hardness (Hv) value while having an excellent scratch resistance together with flexibility.

Abstract: The present invention relates to a hard coating film having a multilayer-structure and, specifically, to a hard coating film having a multilayer-structure, which has a low Vickers hardness (Hv) value while having an excellent scratch resistance together with flexibility.

Abstract: The present invention relates to a coating resin composition comprising a siloxane resin chemically bonded by compounds including an alkoxy silane containing epoxy or acrylic in the chemical structure; a dialkoxysilane of a silane D structure; or a trialkoxy silane of a silane T structure, and to a coating film comprising a cured article of the resin composition as a coating layer.

Abstract: The present invention relates to a hard coating film having a multilayer-structure and, specifically, to a hard coating film having a multilayer-structure, which has a low Vickers hardness (Hv) value while having an excellent scratch resistance together with flexibility.

Abstract: The present invention relates to a resin composition for coating, and a coating film comprising a cured product thereof as a coating layer. Particularly, the present invention relates to a resin composition for coating, and a coating film comprising a cured product thereof as a coating layer, wherein the resin composition for coating comprises a siloxane resin that is chemically bonded by compounds comprising alkoxysilane and diol, which comprise epoxy or acryl within the chemical structures thereof.

Abstract: Disclosed is a photosensitive resin composition for an organic insulating layer. More specifically, the photosensitive resin composition is suitable for forming a substrate of a transflective thin film transistor liquid crystal display (TFT-LCD) or a pattern of an interlayer insulating layer by improving remarkably a pattern property with a high taper angle besides improvement of flatness, sensitivity, heat resistance, and transparency. Particularly, the photosensitive resin composition can provide low power dissipation besides a wide viewing angle and high visibility when being applied to a transflective type display. In addition, the photosensitive resin composition can provide a clear screen under natural light without a backlight by maintaining the brightness of a screen and prominent field visibility.

Abstract: Disclosed is a photosensitive resin composition for an organic insulating layer. More specifically, the photosensitive resin composition is suitable for forming a substrate of a transflective thin film transistor liquid crystal display (TFT-LCD) or a pattern of an interlayer insulating layer by improving remarkably a pattern property with a high taper angle besides improvement of flatness, sensitivity, heat resistance, and transparency. Particularly, the photosensitive resin composition can provide low power dissipation besides a wide viewing angle and high visibility when being applied to a transflective type display. In addition, the photosensitive resin composition can provide a clear screen under natural light without a backlight by maintaining the brightness of a screen and prominent field visibility.