Abstract: An integrated antenna structure includes a frame, a circuit board, at least one antenna radiator, a support plate, a battery, and at least one metal sheet. The frame surrounds and defines an accommodation space. The circuit board is disposed in the accommodation space. The antenna radiator includes a body and a plurality of platforms. The body is disposed on the frame by using nano molding technology (NMT) and at least partially surrounds the accommodation space. The platforms are connected to the body and protrude toward the accommodation space. The platforms are configured to electrically connect to the circuit board respectively. The support plate is disposed in the accommodation space. The metal sheet is at least partially disposed on a surface of the support plate and extends along an edge of the support plate. One end of the metal sheet is electrically connected to the circuit board.

Abstract: The present invention discloses a head-mounted display device and a communication device including a communication circuit, an antenna assembly, and a transfer module. The antenna assembly includes at least one first antenna and a second antenna. The first antenna is electrically connected to the communication circuit, and the second antenna is disposed at a top headband of the head-mounted display device. The transfer module includes a connecting wire assembly, a transfer element, and a transfer wire assembly. The transfer wire assembly is electrically connected to the transfer element and the second antenna. Two ends of the connecting wire assembly are connected to the communication circuit and the transfer element, respectively. The connecting wire assembly includes two radio frequency (RF) signal wires and a power signal wire. A power loss of the two RF signal wires is less than a power loss of the transfer wire assembly.

Abstract: Describe herein is a composition comprising: an acrylic polymer comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7) wherein these repeat units are present in said acrylic polymer in the mole % ranges as described herein; a Novolak resin having a dissolution rate in 0.26 N aqueous TMAH of at least 50 ?/sec; a diazonaphthoquinone (DNQ) photoactive compound (PAC); and an organic spin casting solvent, and a process of using said composition as a positive photoresist developable in aqueous base.

Abstract: A wearable device includes a conducting frame, a circuit board, and a grounding member. The conducting frame includes a first part and a second part that are separated. The circuit board has a system grounding surface and is disposed inside the conducting frame. The grounding member is disposed inside the conducting frame and connected to the first part. The first part and the grounding member are formed as a first antenna. The first part has a first feeding terminal. The grounding member has a first grounding terminal, and the first grounding terminal is connected to the system grounding surface of the circuit board. The second part is formed as a second antenna. The second antenna has a second feeding terminal, a second grounding terminal, and a third grounding terminal. The second and the third grounding terminals are connected to the system grounding surface of the circuit board.

Abstract: Provided is a wearable device including an annular metal shell and a circuit board. The circuit board is disposed in the annular metal shell, and includes a clearance zone and a tracing zone. The clearance zone includes an antenna feeding portion, and the tracing zone includes electronic elements, a metal circuit, and an antenna grounding portion. The antenna feeding portion is coupled to the electronic elements and the metal circuit, and the antenna feeding portion and the antenna grounding portion are coupled to the annular metal shell, such that the antenna feeding portion, the electronic elements, and the metal circuit jointly resonate at a frequency band.

Abstract: Describe herein is a composition comprising: an acrylic polymer comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7) wherein these repeat units are present in said acrylic polymer in the mole % ranges as described herein; a Novolak resin having a dissolution rate in 0.26 N aqueous TMAH of at least 50 ?/sec; a diazonaphthoquinone (DNQ) photoactive compound (PAC); and an organic spin casting solvent, and a process of using said composition as a positive photoresist developable in aqueous base.

Abstract: Disclosed herein is a photosensitive composition comprising a DNQ-PAC, a heterocyclic thiol compound or tautomeric form thereof, an acrylate polymer, a Novolak and a PAG and its method of use on a substrate which may include a chalcophile substrate.

Abstract: The present invention relates to electrical interconnect structures formed from a lithographically defined polymer coating in conjunction with a conductive paste, and methods for forming same.

Abstract: An integrated antenna structure includes a frame, a circuit board, at least one antenna radiator, a support plate, a battery, and at least one metal sheet. The frame surrounds and defines an accommodation space. The circuit board is disposed in the accommodation space. The antenna radiator includes a body and a plurality of platforms. The body is disposed on the frame by using nano molding technology (NMT) and at least partially surrounds the accommodation space. The platforms are connected to the body and protrude toward the accommodation space. The platforms are configured to electrically connect to the circuit board respectively. The support plate is disposed in the accommodation space. The metal sheet is at least partially disposed on a surface of the support plate and extends along an edge of the support plate. One end of the metal sheet is electrically connected to the circuit board.

Abstract: A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm. The present invention also encompasses a process comprising steps a), b) and c) a) coating the composition of claim 1 on a substrate; b) cross-linking the entire coating by irradiation with broadband UV exposure; c) forming a pattern in the cross-linked coating by cold laser ablating with a UV excimer laser emitting between 222 nm and 308 nm.

Abstract: A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm. The present invention also encompasses a process comprising steps a), b) and c) a) coating the composition of claim 1 on a substrate; b) cross-linking the entire coating by irradiation with broadband UV exposure; c) forming a pattern in the cross-linked coating by cold laser ablating with a UV excimer laser emitting between 222 nm and 308 nm.

Abstract: A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm. The present invention also encompasses a process comprising steps a), b) and c) a) coating the composition of claim 1 on a substrate; b) cross-linking the entire coating by irradiation with broadband UV exposure; c) forming a pattern in the cross-linked coating by cold laser ablating with a UV excimer laser emitting between 222 nm and 308 nm.

Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.

Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.

Abstract: The present invention relates to a positive photosensitive composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is less than 5 microns. The positive photoresist composition can be selected from (1) a composition comprising (i) a film-forming resin having acid labile groups, and (ii) a photoacid generator, or (2) a composition comprising (i) a film-forming novolak resin, and (ii) a photoactive compound, or (3) a composition comprising (i) a film-forming resin, (ii) a photoacid generator, and (iii) a dissolution inhibitor. The invention also relates to a process of forming an image using the novel photosensitive composition.

Abstract: The present invention relates to a negative photosensitive composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is less than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator.

Abstract: The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.

Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.

Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.

Abstract: A cross-laminated film comprising at least a two layers and including a thermoplastic component and an elastic component to provide special elastic characteristics for certain packaging and wrapping applications.