Abstract: A resistive random access memory including first and second electrodes, a resistance variable layer, first and second metal layers and a resistance stabilizing layer is provided. The second electrode is disposed on the first electrode. The resistance variable layer is disposed between the first and second electrodes. The first metal layer is disposed between the resistance variable layer and the second electrode. The second metal layer is disposed between the first metal layer and the second electrode. The resistance stabilizing layer is disposed between the first and second metal layers. The oxygen content of the resistance variable layer is higher than that of the first metal layer, the oxygen content of the first metal layer is higher than that of the resistance stabilizing layer, the oxygen content of the resistance stabilizing layer is higher than that of the second metal layer.

Abstract: A resistive random access memory (RRAM) device and a manufacturing method are provided. The RRAM device includes bottom electrodes, a resistance switching layer, insulating patterns, a channel layer and top electrodes. The resistance switching layer blanketly covers the bottom electrodes. The insulating patterns are disposed on the resistance layer and located in corresponding to locations of the bottom electrodes. The channel layer conformally covers the resistance switching layer and the insulating patterns. The channel layer has a plurality of channel regions. The channel regions are located on the resistance switching layer, and cover sidewalls of the insulating patterns. The top electrodes respectively cover at least two of the channel regions, and respectively located in corresponding to one of the insulating patterns, such that the at least two of the channel regions are located between one of the bottom electrodes and one of the top electrodes.

Abstract: A data write-in method and a non-volatile memory are provided. The data write-in method includes: providing a reset voltage to a plurality of selected memory cells according to a first flag, and recursively performing a reset process for the plurality of selected memory cells; setting a second flag according to a plurality of first verification currents of the plurality of selected memory cells; and under a condition that the second flag is set: providing a set voltage to the plurality of selected memory cells according to a resistance of the plurality of selected memory cells; and setting the first flag according to a plurality of second verification currents of the plurality of selected memory cells.

Abstract: A method of manufacturing a semiconductor device includes forming a first dielectric layer and a through hole passing through the first dielectric layer over a substrate; forming a plurality of dummy contacts in the through hole; forming a plurality of first dummy wires on the plurality of dummy contacts; filling a second dielectric layer between the plurality of first dummy wires, wherein the second dielectric layer has a first air gap; removing the dummy contacts and the first dummy wires to expose the through hole, thereby forming a first wiring trench over the through hole; and forming a contact and a first wire in the through hole and the first wiring trench.

Abstract: A data write-in method and a non-volatile memory are provided. The data write-in method includes: providing a reset voltage to a plurality of selected memory cells according to a first flag, and recursively performing a reset process for the plurality of selected memory cells; setting a second flag according to a plurality of first verification currents of the plurality of selected memory cells; and under a condition that the second flag is set: providing a set voltage to the plurality of selected memory cells according to a resistance of the plurality of selected memory cells; and setting the first flag according to a plurality of second verification currents of the plurality of selected memory cells.

Abstract: A resistive memory and a method for writing data thereof are provided. The method for writing data includes: receiving a write-in data and generating an inverted write-in data; reading a current data in a plurality of selected memory cells; comparing the current data with the write-in data and the inverted write-in data; selecting the write-in data or the inverted write-in data to generate a final data according to a comparison result; and writing the final data into the selected memory cells.

Abstract: A resistive memory apparatus and an operating method thereof are provided. In the method, a set operation having a first enhanced bias is performed on at least one memory cell in a resistive memory array of the resistive memory apparatus, in which the first enhanced bias is larger than a bias used in a normal execution of the set operation. A heat process is performed on the memory cell. A set operation having a second enhanced bias is performed on the memory cell, in which the second enhanced bias is larger than or equal to the first enhanced bias.

Abstract: Provided is a resistive random access memory (RRAM) including at least one memory cell. The at least one memory cell includes a top electrode, a bottom electrode, a data storage layer, an oxygen gettering layer, a first barrier layer, and an oxygen supplying layer. The data storage layer is disposed between the top electrode and the bottom electrode. The oxygen gettering layer is disposed between the data storage layer and the top electrode. The first barrier layer is disposed between the oxygen gettering layer and the data storage layer. The oxygen supplying layer is disposed between the oxygen gettering layer and the top electrode and/or between the oxygen gettering layer and the first barrier layer.

Abstract: A resistive memory and a method for writing data thereof are provided. The method for writing data includes: receiving a write-in data and generating an inverted write-in data; reading a current data in a plurality of selected memory cells; comparing the current data with the write-in data and the inverted write-in data; selecting the write-in data or the inverted write-in data to generate a final data according to a comparison result; and writing the final data into the selected memory cells.

Abstract: A power on reset method for a resistive memory storage device is provided and includes performing a forming procedure on a memory cell of the resistive memory storage device. The forming procedure includes applying at least one forming voltage and at least one reset voltage to the memory cell. The forming procedure further includes a thermal step. The step of applying at least one reset voltage to the memory cell may be preformed before or after the thermal step. After one forming voltage is applied, if the memory cell passes verification, the next forming voltage is not applied to the memory cell. After the thermal step, if the memory cell passes verification, the next forming voltage is not applied to the memory cell. In addition, after one reset voltage is applied, if the memory cell passes verification, the next reset voltage is not applied to the memory cell.

Abstract: A resistive memory apparatus and an operating method thereof are provided. In the method, a set operation having a first enhanced bias is performed on at least one memory cell in a resistive memory array of the resistive memory apparatus, in which the first enhanced bias is larger than a bias used in a normal execution of the set operation. A heat process is performed on the memory cell. A set operation having a second enhanced bias is performed on the memory cell, in which the second enhanced bias is larger than or equal to the first enhanced bias.

Abstract: A memory storage apparatus and a forming method of a resistive memory device thereof are provided. A test forming voltage is applied to a redundant resistive memory device and a corresponding test current is read. A forming voltage applied to a main memory cell block is determined according to the test forming voltage, the test current, a forming current-voltage characteristic data and a target forming current.

Abstract: A memory storage apparatus and a forming method of a resistive memory device thereof are provided. A test forming voltage is applied to a redundant resistive memory device and a corresponding test current is read. A forming voltage applied to a main memory cell block is determined according to the test forming voltage, the test current, a forming current-voltage characteristic data and a target forming current.

Abstract: A method of manufacturing a semiconductor device includes forming a first dielectric layer and a through hole passing through the first dielectric layer over a substrate; forming a plurality of dummy contacts in the through hole; forming a plurality of first dummy wires on the plurality of dummy contacts; filling a second dielectric layer between the plurality of first dummy wires, wherein the second dielectric layer has a first air gap; removing the dummy contacts and the first dummy wires to expose the through hole, thereby forming a first wiring trench over the through hole; and forming a contact and a first wire in the through hole and the first wiring trench.

Abstract: A non-volatile memory and a reset method thereof are provided. The reset method includes: performing a first reset operation on a plurality of memory cells; recording a plurality of first verifying currents respectively corresponding to a plurality of first failure memory cells; performing a second reset operation on the first failure memory cells, and verifying second failure memory cells to obtain a plurality of second verifying currents; setting a first voltage modify flag according to a plurality of first ratios between the first verifying currents and the respectively corresponding second verifying currents; and adjusting a reset voltage for performing the first reset operation and the second reset operation according to the first voltage modify flag.

Abstract: A metal lath having an integral hem structure includes a main body. The main body is formed by enclosing the metal lath so that the main body has a ring-shaped side wall. The side wall defines an accommodating space therein. Two ends of the main body are formed with openings to communicate with the accommodating space, respectively. One of the openings is integrally formed with a hem around an end edge of the opening by bending. The hem is integrally formed with the metal lath, which can reduce production time and cost effectively and can prevent the user from being cut by the metal lath.

Abstract: A forming method of a resistive memory device is provided. The forming method includes: conducting a forming procedure to apply a forming voltage to the resistive memory device such that the resistive memory device changes from a high resistive state to a low resistive state and measuring a first current of the resistive memory device; performing a thermal step on the resistive memory device and measuring a second current of the resistive memory device; and comparing the second current to the first current and determining to apply a first voltage signal or a second voltage signal to the resistive memory device or to finish the forming procedure according to a comparison result of the first current and the second current. In addition, a memory storage apparatus including a resistive memory device is also provided.

Abstract: A resistive memory including a first storage circuit, a verification circuit, a second storage circuit and a control circuit is provided. The first storage circuit includes various cell groups. Each of the cell groups includes at least one memory cell. The verification circuit is coupled to the first storage circuit to verify whether a specific operation performed on at least one of the memory cells was successful. The second storage circuit includes various flag bits. Each of the flag bits corresponds to a cell group. In a reset period, the control circuit is configured to perform a first reset operation or a second reset operation on a first memory cell of a specific cell group among the cell groups according to a specific flag bit corresponding to the specific cell group.

Abstract: A memory device including a plurality of memory units; at least one geometric mean operator coupled to at least two of the plurality of memory units; and a memory state reader coupled to the at least one geometric mean operator to read a memory state of the plurality of memory units.