Abstract: A zoned heat dissipation control system for a water cooling radiator and a water cooling heat dissipation system having the zoned heat dissipation control system includes a plurality of fans, a plurality of heat dissipation zones defined on the water cooling radiator, a thermal detector, and a control unit. At least one of the fans is disposed within each of the heat dissipation zones. The thermal detector is disposed within at least one of the heat dissipation zones and configured to detect the temperature of the water cooling radiator. The control unit is electrically connected to the fans and the thermal detector and configured to modulate the rotational speed of the fan within each of the heat dissipation zones based on the detected data from the thermal detector.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (A1) or formula (A2): Zr12O8(OH)14(RCO2)18 ??Formula (A1); or Hf6O4(OH)6(RCO2)10 ??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: A method of manufacturing a semiconductor device includes the following steps. A photoresist layer is formed over a material layer on a substrate. The photoresist layer has a composition including a solvent and a first photo-active compound dissolved in the solvent. The first photo-active compound is represented by the following formula (Al) or formula (A2): Zr12O8(OH)14(RCO2)18??Formula (A1); or Hf6O4(OH)6(RCO2)10??Formula (A2). R in the formula (A1) and R in the formula (A2) each include one of the following formulae (1) to (6): The photoresist layer is patterned. The material layer is etched using the photoresist layer as an etch mask.

Abstract: An LCD and a touch display panel that can be integrated in the LCD are provided. The touch display panel comprises an active device matrix substrate that includes multiple sensing lines disposed on multiple data lines correspondingly and arranged parallel thereto, and multiple sensing devices formed on multiple scan lines. When an external pressure is exerted, a current is generated in the sensing lines, and the X and Y coordinates of the touch point is determined from a slight leakage current generated in the scan lines. The conventional external touch screen LCD device is substantially improved in response accuracy of the touch coordinates, material costs, and mechanical thickness.

Abstract: An LCD and a touch display panel that can be integrated in the LCD are provided. The touch display panel comprises an active device matrix substrate that includes multiple sensing lines disposed on multiple data lines correspondingly and arranged parallel thereto, and multiple sensing devices formed on multiple scan lines. When an external pressure is exerted, a current is generated in the sensing lines, and the X and Y coordinates of the touch point is determined from a slight leakage current generated in the scan lines. The conventional external touch screen LCD device is substantially improved in response accuracy of the touch coordinates, material costs, and mechanical thickness.