Patents by Inventor Po-Han CHENG

Po-Han CHENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240151875
    Abstract: An optical device is provided. The optical device includes a substrate that has a top surface and a bottom surface. The optical device also includes a cover layer disposed on the substrate, and the cover layer has a top surface and a bottom surface. The top surface of the cover layer faces the bottom surface of the substrate. The optical device further includes a first meta structure disposed on the bottom surface of the substrate and a second meta structure disposed on the top surface of the cover layer. Moreover, the optical device includes a detector disposed on the bottom surface of the cover layer.
    Type: Application
    Filed: November 7, 2022
    Publication date: May 9, 2024
    Inventors: Wei-Hsun CHENG, Chen-Yi YU, Wei-Ko WANG, Po-Han FU
  • Patent number: 11955423
    Abstract: Methods for forming dummy under-bump metallurgy structures and semiconductor devices formed by the same are disclosed. In an embodiment, a semiconductor device includes a first redistribution line and a second redistribution line over a semiconductor substrate; a first passivation layer over the first redistribution line and the second redistribution line; a second passivation layer over the first passivation layer; a first under-bump metallurgy (UBM) structure over the first redistribution line, the first UBM structure extending through the first passivation layer and the second passivation layer and being electrically coupled to the first redistribution line; and a second UBM structure over the second redistribution line, the second UBM structure extending through the second passivation layer, the second UBM structure being electrically isolated from the second redistribution line by the first passivation layer.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ting-Li Yang, Po-Hao Tsai, Ming-Da Cheng, Yung-Han Chuang, Hsueh-Sheng Wang
  • Patent number: 11923409
    Abstract: A semiconductor device includes a source/drain feature over a semiconductor substrate, channel layers over the semiconductor substrate and connected to the source/drain feature, a gate portion between vertically adjacent channel layers, and an inner spacer between the source/drain feature and the gate portion and between adjacent channel layers. The semiconductor device further includes an air gap between the inner spacer and the source/drain feature.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: March 5, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Yu Lin, Wei-Yang Lee, Chia-Pin Lin, Tzu-Hua Chiu, Kuan-Hao Cheng, Wei-Han Fan, Li-Li Su, Wei-Min Liu
  • Publication number: 20230266813
    Abstract: An electronic device and a performance optimization method thereof are provided. The electronic device includes a battery module, a processor, and a controller. The battery module is configured to supply power to the electronic device. The processor has a power limit. The controller is configured to monitor a charging and discharging current of the battery module. In a power connection mode, the controller analyzes a status of the battery module and adjusts the power limit of the processor according to the charging and discharging current.
    Type: Application
    Filed: October 14, 2022
    Publication date: August 24, 2023
    Applicant: ASUSTeK COMPUTER INC.
    Inventors: Po-Han Cheng, Chin-Chang Chang, Po-Hsin Chang, Shih-Hao Chen, Kai-Peng Chung, Ci-Syuan Wu, Chun Tsao, Teng-Chih Wang, Sheng-Yi Chen, Guan-Heng Lai
  • Patent number: 10305027
    Abstract: According to one embodiment, a magnetoresistive element includes a first magnetic layer, a second magnetic layer, and a first nonmagnetic layer. The first nonmagnetic layer is provided between the first magnetic layer and the second magnetic layer. The first nonmagnetic layer includes an oxide including an inverse-spinel structure.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: May 28, 2019
    Assignees: Kabushiki Kaisha Toshiba, NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Yushi Kato, Tadaomi Daibou, Yuuzo Kamiguchi, Naoharu Shimomura, Junichi Ito, Hiroaki Sukegawa, Mohamed Belmoubarik, Po-Han Cheng, Seiji Mitani, Tadakatsu Ohkubo, Kazuhiro Hono
  • Publication number: 20180090671
    Abstract: According to one embodiment, a magnetoresistive element includes a first magnetic layer, a second magnetic layer, and a first nonmagnetic layer. The first nonmagnetic layer is provided between the first magnetic layer and the second magnetic layer. The first nonmagnetic layer includes an oxide including an inverse-spinel structure.
    Type: Application
    Filed: September 8, 2017
    Publication date: March 29, 2018
    Applicants: Kabushiki Kaisha Toshiba, NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Yushi KATO, Tadaomi DAIBOU, Yuuzo KAMIGUCHI, Naoharu SHIMOMURA, Junichi ITO, Hiroaki SUKEGAWA, Mohamed BELMOUBARIK, Po-Han CHENG, Seiji MITANI, Tadakatsu OHKUBO, Kazuhiro HONO