Patents by Inventor Prashant D. Parmar

Prashant D. Parmar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Via architecture for increased density interface
    Patent number: 10475736
    Abstract: Aspects of the embodiments are directed to an IC chip that includes a substrate comprising a first metal layer, a second metal layer, and a ground plane residing on the first metal layer. The second metal layer can include a first signal trace, the first signal trace electrically coupled to a first signal pad residing in the first metal layer by a first signal via. The second metal layer can include a second signal trace, the second signal trace electrically coupled to a second signal pad residing in the first metal layer by a second signal via. The substrate can also include a ground trace residing in the second metal layer between the first signal trace and the second signal trace, the ground trace electrically coupled to the ground plane by a ground via. The vias coupled to the traces can include self-aligned or zero-misaligned vias.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: November 12, 2019
    Assignee: Intel Corporation
    Inventors: Aleksandar Aleksov, Arnab Sarkar, Arghya Sain, Kristof Darmawikarta, Henning Braunisch, Prashant D. Parmar, Sujit Sharan, Johanna M. Swan, Feras Eid
  • VIA ARCHITECTURE FOR INCREASED DENSITY INTERFACE
    Publication number: 20190096798
    Abstract: Aspects of the embodiments are directed to an IC chip that includes a substrate comprising a first metal layer, a second metal layer, and a ground plane residing on the first metal layer. The second metal layer can include a first signal trace, the first signal trace electrically coupled to a first signal pad residing in the first metal layer by a first signal via. The second metal layer can include a second signal trace, the second signal trace electrically coupled to a second signal pad residing in the first metal layer by a second signal via. The substrate can also include a ground trace residing in the second metal layer between the first signal trace and the second signal trace, the ground trace electrically coupled to the ground plane by a ground via. The vias coupled to the traces can include self-aligned or zero-misaligned vias.
    Type: Application
    Filed: September 28, 2017
    Publication date: March 28, 2019
    Applicant: Intel Corporation
    Inventors: Aleksandar Aleksov, Arnab Sarkar, Arghya Sain, Kristof Darmawikarta, Henning Braunisch, Prashant D. Parmar, Sujit Sharan, Johanna M. Swan, Feras Eid