Patents by Inventor Pratham Jain

Pratham Jain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods To Grow Low Resistivity Metal Containing Films
    Publication number: 20210123136
    Abstract: The use of a cyclic 1,4-diene reducing agent with a metal precursor and a reactant to form metal-containing films are described. Methods of forming the metal-containing film comprises exposing a substrate surface to a metal precursor, a reducing agent and a reactant either simultaneously, partially simultaneously or separately and sequentially to form the metal-containing film.
    Type: Application
    Filed: October 29, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Lakmal C. Kalutarage, Liqi Wu, Pratham Jain, Jeffrey W. Anthis, Mark Saly, Mei Chang, David Thompson
  • Selective deposition defects removal by chemical etch
    Patent number: 10643840
    Abstract: Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface.
    Type: Grant
    Filed: September 12, 2018
    Date of Patent: May 5, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian, Michael S. Jackson, Lei Zhou, Paul F. Ma, Liqi Wu
  • Selective Deposition Defects Removal By Chemical Etch
    Publication number: 20190080904
    Abstract: Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface.
    Type: Application
    Filed: September 12, 2018
    Publication date: March 14, 2019
    Inventors: Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian, Michael S. Jackson, Lei Zhou, Paul F. Ma, Liqi Wu