Abstract: A multi-mirror laser sustained plasma broadband light source is disclosed. The light source may include a gas containment structure for containing a gas. The light source includes a pump source configured to generate pump illumination and a first reflector element configured to direct a portion of the pump illumination into the gas to sustain a plasma. The first reflector is configured to collect a portion of broadband light emitted from the plasma. The light source also includes one or more additional reflector elements positioned opposite of the first reflector. The one or more additional reflector elements are configured to reflect unabsorbed pump illumination and broadband light uncollected by the first reflector element back to the plasma.

Abstract: Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.

Abstract: Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.

Abstract: The disclosure is directed to a system and method for inspecting a sample by illuminating the sample at a plurality of different angles and independently processing the resulting image streams. Illumination is directed through a plurality of pupil apertures to a plurality of respective field apertures so that the sample is imaged by portions of illumination directed at different angles. The corresponding portions of light reflected, scattered, or radiated from the surface of the sample are independently processed. Information associated with the independently processed portions of illumination is utilized to determine a location of at least one defect of the sample. Independently processing multiple image streams associated with different illumination angles allows for retention of frequency content that would otherwise be lost by averaging information from multiple imaging angles.

Abstract: The disclosure is directed to a system and method for inspecting a sample by illuminating the sample at a plurality of different angles and independently processing the resulting image streams. Illumination is directed through a plurality of pupil apertures to a plurality of respective field apertures so that the sample is imaged by portions of illumination directed at different angles. The corresponding portions of light reflected, scattered, or radiated from the surface of the sample are independently processed. Information associated with the independently processed portions of illumination is utilized to determine a location of at least one defect of the sample. Independently processing multiple image streams associated with different illumination angles allows for retention of frequency content that would otherwise be lost by averaging information from multiple imaging angles.

Abstract: Methods and systems for providing illumination of a specimen for a process performed on the specimen are provided. One system configured to provide illumination of a specimen for a process performed on the specimen includes a laser configured to generate excitation light. The system also includes focusing optics configured to focus the excitation light to a plasma in an electrodeless lamp such that the plasma generates light. The system is also configured such that the light illuminates the specimen during the process.

Abstract: A system for illuminating a specimen are disclosed herein. In general, the system may include an illumination source configured to generate light with an uneven distribution at a pupil plane and field stop of the system, a lightpipe coupled for redistributing the light across the pupil plane and field stop, and at least one optical element configured to direct the redistributed light onto a specimen. The lightpipe may generally include a cone-shaped portion and a rectangular-shaped portion. The cone-shaped portion is configured for modifying an angular distribution of the generated light, so that the redistributed light is uniformly distributed across the pupil plane of the system. The rectangular-shaped portion is formed contiguous with the cone-shaped portion and configured for modifying a spatial distribution of the generated light, so that the redistributed light is uniformly distributed across a field stop of the system.