Patents by Inventor Qing Qian

Qing Qian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11954152
    Abstract: The present specification discloses video matching. In a computer-implemented method, a plurality of feature vectors of a target video is obtained. A candidate video similar to the target video is retrieved from a video database based on the plurality of feature vectors of the target video. A time domain similarity matrix feature map is constructed between the target video and the candidate video based on the target video and the candidate video. Using the time domain similarity matrix feature map as an input into a deep learning detection model, a video segment matching the target video in the candidate video and a corresponding similarity is output.
    Type: Grant
    Filed: January 3, 2023
    Date of Patent: April 9, 2024
    Assignee: Alipay (Hangzhou) Information Technology Co., Ltd.
    Inventors: Chen Jiang, Wei Zhang, Qing Wang, Yuan Cheng, Furong Xu, Kaiming Huang, Xiaobo Zhang, Feng Qian, Xudong Yang, Tan Pan
  • Patent number: 11430625
    Abstract: The present disclosure provides an electron source operating method, the electron source including at least one emission site fixed on a tip, the emission site being a reaction product formed by metal atoms of a surface of the tip and gas molecules under an electric field, and the operating method comprises emitting electrons by controlling operating parameters of the electron source.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: August 30, 2022
    Assignee: 38th Research Institute, China Electronics Technology Group Corporation
    Inventors: Huarong Liu, Xueming Jin, Yuxuan Qi, Xuehui Wang, Yijing Li, Junting Wang, Chunning Zheng, Qing Qian, Tingting Luo, Zhonglin Dong
  • Patent number: 11373836
    Abstract: The present disclosure provides a method of manufacturing an electron source. The method includes forming one or more fixed emission sites on at least one needle tip, the fixed emission sites including a reaction product formed by metal atoms on a surface of the needle tip and gas molecules.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: June 28, 2022
    Assignee: 38th Research Institute, China Electronics Technology Group Corporation
    Inventors: Xuehui Wang, Junting Wang, Xianbin Hu, Dizhi Chen, Guang Tang, Huarong Liu, Lei Zheng, Qing Qian, Chunning Zheng, Guochao Wang
  • Patent number: 11320611
    Abstract: The present disclosure generally relates to printed circuit boards or printed circuit board assemblies for fiber optic communications. In one non-limiting embodiment, a method of assembling an optoelectronic assembly includes providing a printed circuit board with a first metal coating and an optical component with a second metal coating. The method further includes positioning the optical component relative to the printed circuit board with at least some portion of the first metal coating aligned with or adjacent to at least some portion of the second metal coating, and applying solder between the first metal coating and the second metal coating to couple the optical component and the printed circuit board.
    Type: Grant
    Filed: April 27, 2020
    Date of Patent: May 3, 2022
    Assignee: II-VI DELAWARE, INC.
    Inventors: Qing Qian, Wei Li, Hui Juan Yan, Hui Yang, Wei Peng Nian, Ting Shi
  • Publication number: 20210173158
    Abstract: The present disclosure generally relates to printed circuit boards or printed circuit board assemblies for fiber optic communications. In one non-limiting embodiment, a method of assembling an optoelectronic assembly includes providing a printed circuit board with a first metal coating and an optical component with a second metal coating. The method further includes positioning the optical component relative to the printed circuit board with at least some portion of the first metal coating aligned with or adjacent to at least some portion of the second metal coating, and applying solder between the first metal coating and the second metal coating to couple the optical component and the printed circuit board.
    Type: Application
    Filed: April 27, 2020
    Publication date: June 10, 2021
    Inventors: Qing Qian, Wei Li, Hui Juan Yan, Hui Yang, Wei Peng Nian, Ting Shi
  • Publication number: 20210050176
    Abstract: The present disclosure provides a method of manufacturing an electron source. The method includes forming one or more fixed emission sites on at least one needle tip, the fixed emission sites including a reaction product formed by metal atoms on a surface of the needle tip and gas molecules.
    Type: Application
    Filed: December 27, 2018
    Publication date: February 18, 2021
    Inventors: Xuehui WANG, Junting WANG, Xianbin HU, Dizhi CHEN, Guang TANG, Huarong LIU, Lei ZHENG, Qing QIAN, Chunning ZHENG, Guochao WANG
  • Publication number: 20210050172
    Abstract: The present disclosure provides an electron source operating method, the electron source including at least one emission site fixed on a tip, the emission site being a reaction product formed by metal atoms of a surface of the tip and gas molecules under an electric field, and the operating method comprises emitting electrons by controlling operating parameters of the electron source.
    Type: Application
    Filed: December 27, 2018
    Publication date: February 18, 2021
    Inventors: Huarong LIU, Xueming JIN, Yuxuan QI, Xuehui WANG, Yijing LI, Junting WANG, Chunning ZHENG, Qing QIAN, Tingting LUO, Zhonglin DONG
  • Patent number: 10187965
    Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: January 22, 2019
    Assignee: ADVANCED MICRO-FABRICATION EQUIPMENT, INC. CHINA
    Inventors: Tuqiang Ni, Jinyuan Chen, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou, Ye Wang
  • Patent number: 9761340
    Abstract: A method of preparing two dimension bent X-ray crystal analyzers in strips feature is provided. A crystal wafer in strips is bonded to a curved substrate which offers the desired focus length. A crystal wafer in strips is pressed against the surface of the substrate forming curved shape by anodic bonding or glue bonding. The bonding is permanently formed between crystal wafer and its substrate surface, which makes crystal wafer has same curvature as previously prepared substrate.
    Type: Grant
    Filed: September 25, 2016
    Date of Patent: September 12, 2017
    Inventor: Qing Qian
  • Publication number: 20170110621
    Abstract: A method of preparing two dimension bent X-ray crystal analyzers in strips feature is provided. A crystal wafer in strips is bonded to a curved substrate which offers the desired focus length. A crystal wafer in strips is pressed against the surface of the substrate forming curved shape by anodic bonding or glue bonding. The bonding is permanently formed between crystal wafer and its substrate surface, which makes crystal wafer has same curvature as previously prepared substrate.
    Type: Application
    Filed: September 25, 2016
    Publication date: April 20, 2017
    Inventor: QING QIAN
  • Publication number: 20140367250
    Abstract: A deposition system for depositing a thin film photovoltaic cell on a flexible substrate comprises an enclosure that is fluidically isolated from an environment external to the enclosure, and a plurality of deposition chambers in the enclosure. At least one deposition chamber of the plurality of deposition chambers comprises a magnetron sputtering apparatus that directs a material flux of one or more target materials towards a portion of the flexible substrate that is disposed in the at least one deposition chamber of the plurality of deposition chambers. A substrate payout roller in the enclosure provides a flexible substrate that is directed through each of the plurality of deposition chambers to a substrate take-up roller in the enclosure. At least one guide roller in the enclosure is configured to direct the flexible substrate to or from a given deposition chamber among the plurality of deposition chambers.
    Type: Application
    Filed: January 18, 2013
    Publication date: December 18, 2014
    Applicant: NUVOSUN, INC.
    Inventors: Bruce D. Hachtmann, Josef Bonigut, Qing Qian, Dennis R. Hollars, Xiaodong Liu
  • Publication number: 20140103805
    Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 17, 2014
    Applicant: ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA
    Inventors: Tom Ni, Jinyuan Chen, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou, Ye Wang
  • Patent number: 8608851
    Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: December 17, 2013
    Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
    Inventors: Tom Ni, Jinyuan Chen, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou, Ye Wang
  • Patent number: 8414702
    Abstract: A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: April 9, 2013
    Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
    Inventor: Qing Qian
  • Publication number: 20110180000
    Abstract: A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
    Type: Application
    Filed: April 7, 2011
    Publication date: July 28, 2011
    Inventor: Qing QIAN
  • Patent number: 7935186
    Abstract: A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
    Type: Grant
    Filed: May 24, 2006
    Date of Patent: May 3, 2011
    Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
    Inventor: Qing Qian
  • Publication number: 20090169593
    Abstract: A device implantable within a human body, and a method for producing the device, are provided. The device comprises a biocompatible coating on at least a portion of an outer surface of a substrate. The biocompatible coating comprises tropoelastin. A biocompatible coating is formed in situ on the outer surface of the substrate.
    Type: Application
    Filed: October 19, 2006
    Publication date: July 2, 2009
    Applicants: BIOMEDICAL RESEARCH SERVICES, INC., PROVIDENCE HEALTH SYSTEMS - Oregon, an Oregon Nonprofit Corporation
    Inventors: Kenton W. Gregory, Robert Glanville, Hooi-Sung Kim, Rui-Qing Qian, Carl Wamser
  • Publication number: 20070085483
    Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.
    Type: Application
    Filed: October 10, 2006
    Publication date: April 19, 2007
    Inventors: Tom Ni, Jinyuan Chen, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou, Ye Wang
  • Publication number: 20070028840
    Abstract: A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
    Type: Application
    Filed: May 24, 2006
    Publication date: February 8, 2007
    Inventor: Qing Qian
  • Patent number: 6946667
    Abstract: An ion implantation method is disclosed in this invention. The disclosed method is for implanting a target wafer with ions extracted from an ion source traveling along an original ion beam path. The method includes steps of a) employing a set of deceleration electrodes disposed along the original ion beam path before the target wafer for decelerating and deflecting the ion beam to the target wafer; and b) employing a charged particle deflecting means disposed between the ion source and the set of deceleration electrodes for deflecting the ion beam away from original ion beam path and projecting to the set of electrodes with an incident angle for the set of electrodes to deflect the ion beam back to the original ion beam path for implanting the target wafer.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: September 20, 2005
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Jiong Chen, Zhming Wan, Qing Qian