Patents by Inventor Qingpo Xi
Qingpo Xi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11961698Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: GrantFiled: June 10, 2021Date of Patent: April 16, 2024Assignee: ASML Netherlands B.V.Inventors: Christiaan Otten, Peter-Paul Crans, Marc Smits, Laura Del Tin, Christan Teunissen, Yang-Shan Huang, Stijn Wilem Herman Karel Steenbrink, Xuerang Hu, Qingpo Xi, Xinan Luo, Xuedong Liu
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Publication number: 20230360877Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.Type: ApplicationFiled: May 8, 2023Publication date: November 9, 2023Applicant: ASML Netherlands B.V.Inventors: Xuedong LIU, Qingpo XI, Youfei JIANG, Weiming REN, Xuerang HU, Zhongwei CHEN
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Publication number: 20230317402Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.Type: ApplicationFiled: March 7, 2023Publication date: October 5, 2023Applicant: ASML Netherlands B.V.Inventors: Derk Ferdinand WALVOORT, Dmitry MUDRETSOV, Xuerang HU, Qingpo XI, Jurgen VAN SOEST, Marco Jan-Jaco WIELAND
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Publication number: 20230280293Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.Type: ApplicationFiled: February 17, 2023Publication date: September 7, 2023Applicant: ASML Netherlands B.V.Inventors: Xuerang HU, Xinan LUO, Qingpo XI, Xuedong LIU, Weiming REN
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Patent number: 11676792Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.Type: GrantFiled: September 25, 2018Date of Patent: June 13, 2023Assignee: ASML Netherlands, B.VInventors: Xuedong Liu, Qingpo Xi, Youfei Jiang, Weiming Ren, Xuerang Hu, Zhongwei Chen
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Publication number: 20230107989Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: ApplicationFiled: December 9, 2022Publication date: April 6, 2023Applicant: ASML Netherlands B.V.Inventors: Christiaan OTTEN, Peter-Paul CRANS, Marc SMITS, Laura DEL TIN, Christan TEUNISSEN, Yang-Shan HUANG, Stijn Wilem Herman Karel STEENBRINK, Xuerang HU, Qingpo XI, Xinan LUO, Xuedong LIU
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Patent number: 11614416Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.Type: GrantFiled: October 16, 2019Date of Patent: March 28, 2023Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Xinan Luo, Qingpo Xi, Xuedong Liu, Weiming Ren
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Publication number: 20230020194Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.Type: ApplicationFiled: September 13, 2022Publication date: January 19, 2023Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Xuerang HU, Qingpo XI, Xuedong LIU
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Patent number: 11469074Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.Type: GrantFiled: May 28, 2020Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuerang Hu, Qingpo Xi, Xuedong Liu
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Publication number: 20220319797Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.Type: ApplicationFiled: March 30, 2022Publication date: October 6, 2022Applicant: ASML Netherlands B.V.Inventors: Shichen GU, Weiming REN, Qingpo XI
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Publication number: 20220189726Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.Type: ApplicationFiled: March 6, 2020Publication date: June 16, 2022Applicant: ASML Netherlands B.V.Inventors: Qingpo XI, Xuerang HU, Xuedong LIU, Weiming REN, Zhong-wei CHEN
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Publication number: 20210391139Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.Type: ApplicationFiled: June 10, 2021Publication date: December 16, 2021Inventors: Christiaan OTTEN, Peter-Paul CRANS, Marc SMITS, Laura DEL TIN, Christan TEUNISSEN, Yang-Shan HUANG, Stijn Wilem, Herman, Karel STEENBRINK, Xuerang HU, Qingpo XI, Xinan LUO, Xuedong LIU
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Publication number: 20200381207Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.Type: ApplicationFiled: May 28, 2020Publication date: December 3, 2020Inventors: Weiming REN, Xuerang HU, Qingpo XI, Xuedong LIU
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Publication number: 20200266023Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.Type: ApplicationFiled: September 25, 2018Publication date: August 20, 2020Inventors: Xuedong LIU, Qingpo XI, Youfei JIANG, Weiming REN, Xuerang HU, Zhongwei CHEN
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Publication number: 20200124546Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.Type: ApplicationFiled: October 16, 2019Publication date: April 23, 2020Inventors: Xuerang HU, Xinan Luo, Qingpo Xi, Xuedong Liu, Weiming Ren
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Patent number: 9605759Abstract: A metal gasket has a cross-sectional shape that is a six sided shape that resembles an irregular quadrangle that is substantially isosceles trapezoidal in shape with two sharp angles between the longest side and the second- and third-longest sides, respectively. The longest side of the cross section is the inner wall of the metal gasket.Type: GrantFiled: December 11, 2014Date of Patent: March 28, 2017Assignee: HERMES MICROVISION INC.Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
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Patent number: 9581245Abstract: A metal seal flange assembly for a vacuum system is presented. Its metal gasket has a crossectional shape that is an irregular hexagon with two acute angles between the longest side and the second- and third-longest sides, respectively. The longest side of the irregular hexagon is the vertical inner wall of the metal gasket. This design can reduce the normal force required to seal the metal seal flange assembly and reduce the number of bolts needed, enabling use in a limited working space.Type: GrantFiled: April 2, 2012Date of Patent: February 28, 2017Assignee: HERMES MICROVISION, INC.Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
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Publication number: 20150091258Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. This design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.Type: ApplicationFiled: December 11, 2014Publication date: April 2, 2015Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
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Patent number: 8895935Abstract: An assembly for a charged particle detection unit is described. The assembly comprises a scintillator disc, a partially coated light guide a thin metal tube for allowing the primary charged particle beam to pass through and a photomultiplier tube (PMT). The shape of scintillator disc and light guide are redesigned to improved the light signal transmission thereafter enhance the light collection efficiency. A light guide with a conicoidal surface over an embedded scintillator improved the light collection efficiency of 34% over a conventional design.Type: GrantFiled: March 12, 2012Date of Patent: November 25, 2014Assignee: Hermes Microvision, Inc.Inventors: Zhibin Wang, Wei He, Qingpo Xi, Shuai Li, Fumin He
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Publication number: 20130257044Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. this design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.Type: ApplicationFiled: April 2, 2012Publication date: October 3, 2013Applicant: Hermes Microvision, Inc.Inventors: Qingpo XI, Tao LI, Feng CAO, Fumin HE, Zhongwei CHEN