Patents by Inventor Rainer K. Knippelmeyer

Rainer K. Knippelmeyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focusing a charged particle system
    Patent number: 9530613
    Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: December 27, 2016
    Assignees: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbH
    Inventors: Steven R. Rogers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
  • FOCUSING A CHARGED PARTICLE SYSTEM
    Publication number: 20150287568
    Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
    Type: Application
    Filed: February 17, 2012
    Publication date: October 8, 2015
    Inventors: Steven R. Rodgers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
  • Focusing a charged particle imaging system
    Patent number: 9099282
    Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: August 4, 2015
    Assignee: APPLIED MATERIALS ISRAEL, LTD.
    Inventors: Steven R. Rogers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
  • FOCUSING A CHARGED PARTICLE IMAGING SYSTEM
    Publication number: 20140224985
    Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
    Type: Application
    Filed: March 27, 2014
    Publication date: August 14, 2014
    Applicants: Applied Materials Israel, Ltd., Carl Zeiss SMT GMBH
    Inventors: Steven R. Rodgers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah