Patents by Inventor Rainer Leuschner

Rainer Leuschner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11774308
    Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: October 3, 2023
    Assignee: Infineon Technologies AG
    Inventors: Rainer Leuschner, Kerstin Kaemmer, Roland Meier, Marten Oldsen, Karolina Zogal
  • Publication number: 20230251154
    Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
    Type: Application
    Filed: April 21, 2023
    Publication date: August 10, 2023
    Inventors: Rainer Leuschner, Kerstin Kaemmer, Roland Meier, Marten Oldsen, Karolina Zogal
  • Patent number: 11192777
    Abstract: Embodiments relate to sensor and sensing devices, systems and methods. In an embodiment, a micro-electromechanical system (MEMS) device comprises at least one sensor element; a framing element disposed around the at least one sensor element; at least one port defined by the framing element, the at least one port configured to expose at least a portion of the at least one sensor element to an ambient environment; and a thin layer disposed in the at least one port.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: December 7, 2021
    Assignee: Infineon Technologies AG
    Inventors: Bernhard Winkler, Rainer Leuschner, Horst Theuss
  • Publication number: 20210003466
    Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Inventors: Rainer Leuschner, Kerstin Kaemmer, Roland Meier, Marten Oldsen, Karolina Zogal
  • Patent number: 10859457
    Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: December 8, 2020
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Rainer Leuschner, Kerstin Kaemmer, Roland Meier, Marten Oldsen, Karolina Zogal
  • Publication number: 20200043562
    Abstract: A method for programming a one-time programmable structure is disclosed. The method comprises producing an electrical circuit having the one-time programmable structure. The method furthermore comprises severing the one-time programmable structure by etching the one-time programmable structure in a separating region.
    Type: Application
    Filed: July 31, 2019
    Publication date: February 6, 2020
    Inventors: Wolfgang LIEBL, Stefan ALMSTAETTER, Jens ARKENAU, Josef BOECK, Rainer LEUSCHNER, Gunther MACKH
  • Patent number: 10157765
    Abstract: Methods for processing a semiconductor workpiece can include providing a semiconductor workpiece that includes one or more kerf regions; forming one or more trenches in the workpiece by removing material from the one or more kerf regions from a first side of the workpiece; mounting the workpiece with the first side to a carrier; thinning the workpiece from a second side of the workpiece; and forming a metallization layer over the second side of the workpiece.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: December 18, 2018
    Assignee: Infineon Technologies AG
    Inventors: Gudrun Stranzl, Martin Zgaga, Rainer Leuschner, Bernhard Goller, Bernhard Boche, Manfred Engelhardt, Hermann Wendt, Bernd Noehammer, Karl Mayer, Michael Roesner, Monika Cornelia Voerckel
  • Patent number: 10102967
    Abstract: A method for manufacturing an inductor core is developed, wherein the method comprises the following: Forming a first electrical conductor on a first surface of a plate-shaped magnetic core; forming a second electrical conductor on a second surface of the plate-shaped magnetic core, which is opposite the first surface; and forming the inductor core by dicing the plate-shaped magnetic core transverse to the first electrical conductor and second electrical conductor.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: October 16, 2018
    Assignee: Infineon Technologies AG
    Inventors: Gottfried Beer, Bernhard Knott, Rainer Leuschner
  • Publication number: 20180136064
    Abstract: A sensor device includes a sensor unit sensitive for a property of a gaseous medium. The sensor unit is formed on a first surface of a sensor substrate. A frame structure on the first surface includes a first loop portion laterally surrounding a first area that includes the sensor unit. A communicating channel accesses the first area through at least one of a lateral port in the first loop portion and a base port in the sensor substrate. A lid structure completely covers the frame structure and the first area.
    Type: Application
    Filed: November 9, 2017
    Publication date: May 17, 2018
    Inventors: Rainer Leuschner, Kerstin Kaemmer, Roland Meier, Marten Oldsen, Karolina Zogal
  • Publication number: 20180127267
    Abstract: Embodiments relate to sensor and sensing devices, systems and methods. In an embodiment, a micro-electromechanical system (MEMS) device comprises at least one sensor element; a framing element disposed around the at least one sensor element; at least one port defined by the framing element, the at least one port configured to expose at least a portion of the at least one sensor element to an ambient environment; and a thin layer disposed in the at least one port.
    Type: Application
    Filed: January 8, 2018
    Publication date: May 10, 2018
    Inventors: Bernhard Winkler, Rainer Leuschner, Horst Theuss
  • Patent number: 9929438
    Abstract: A method of manufacturing a lithium ion battery includes: attaching a lid to a first main surface of a first substrate, the lid including a conductive coves element; forming a cavity between the lid and the first substrate; forming an anode comprising a component made of a semiconductor material at the first substrate; forming a cathode at the lid; and filling an electrolyte into the cavity.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: March 27, 2018
    Assignee: Infineon Technologies AG
    Inventors: Kamil Karlovsky, Rafael Janski, Michael Sorger, Magdalena Forster, Katharina Schmut, Vijaye Kumar Rajaraman, Rainer Leuschner, Bernhard Goller
  • Patent number: 9917333
    Abstract: A lithium ion battery includes a first substrate having a first main surface, and a lid including an insulating material. The lid is attached to the first main surface of the first substrate, and a cavity is defined between the first substrate and the lid. The lithium ion battery further includes an electrical interconnection element in the lid, the electrical interconnection element providing an electrical connection between a first main surface and a second main surface of the lid. The lithium ion battery further includes an electrolyte in the cavity, an anode at the first substrate, the anode including a component made of a semiconductor material, and a cathode at the lid.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: March 13, 2018
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Vijaye Kumar Rajaraman, Kamil Karlovsky, Thomas Neidhart, Karl Mayer, Rainer Leuschner, Christine Moser, Ravi Keshav Joshi, Alexander Breymesser, Bernhard Goller, Francisco Javier Santos Rodriguez, Peter Zorn
  • Patent number: 9884757
    Abstract: Embodiments relate to sensor and sensing devices, systems and methods. In an embodiment, a micro-electromechanical system (MEMS) device comprises at least one sensor element; a framing element disposed around the at least one sensor element; at least one port defined by the framing element, the at least one port configured to expose at least a portion of the at least one sensor element to an ambient environment; and a thin layer disposed in the at least one port.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: February 6, 2018
    Assignee: Infineon Technologies AG
    Inventors: Bernhard Winkler, Rainer Leuschner, Horst Theuss
  • Publication number: 20170149085
    Abstract: A method of manufacturing a lithium ion battery includes: attaching a lid to a first main surface of a first substrate, the lid including a conductive coves element; forming a cavity between the lid and the first substrate; forming an anode comprising a component made of a semiconductor material at the first substrate; forming a cathode at the lid; and filling an electrolyte into the cavity.
    Type: Application
    Filed: February 8, 2017
    Publication date: May 25, 2017
    Inventors: Kamil Karlovsky, Rafael Janski, Michael Sorger, Magdalena Forster, Katharina Schmut, Vijaye Kumar Rajaraman, Rainer Leuschner, Bernhard Goller
  • Patent number: 9614256
    Abstract: A lithium ion battery includes a first substrate having a first main surface, and a lid including a conductive cover element, the lid being attached to the first main surface. A cavity is formed between the first substrate and the lid. The battery further includes an electrolyte disposed in the cavity. An anode of the battery includes a component made of a semiconductor material and is formed at the first substrate, and a cathode of the battery is formed at the lid.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: April 4, 2017
    Assignee: Infineon Technologies AG
    Inventors: Kamil Karlovsky, Rafael Janski, Michael Sorger, Magdalena Forster, Katharina Schmut, Vijaye Kumar Rajaraman, Rainer Leuschner, Bernhard Goller
  • Publication number: 20170076970
    Abstract: Methods for processing a semiconductor workpiece can include providing a semiconductor workpiece that includes one or more kerf regions; forming one or more trenches in the workpiece by removing material from the one or more kerf regions from a first side of the workpiece; mounting the workpiece with the first side to a carrier; thinning the workpiece from a second side of the workpiece; and forming a metallization layer over the second side of the workpiece.
    Type: Application
    Filed: November 23, 2016
    Publication date: March 16, 2017
    Inventors: Gudrun Stranzl, Martin Zgaga, Rainer Leuschner, Bernhard Goller, Bernhard Boche, Manfred Engelhardt, Hermann Wendt, Bernd Noehammer, Karl Mayer, Michael Roesner, Monika Cornelia Voerckel
  • Patent number: 9593009
    Abstract: A system and a method for forming a packaged MEMS device are disclosed. In one embodiment a packaged MEMS device includes a MEMS device having a first main surface with a first area along a first direction and a second direction, a membrane disposed on the first main surface of the MEMS device and a backplate adjacent to the membrane. The packaged MEMS device further includes an encapsulation material that encapsulates the MEMS device and that defines a back volume, the back volume having a second area along the first direction and the second direction, wherein the first area is smaller than the second area.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: March 14, 2017
    Assignee: Infineon Technologies AG
    Inventors: Edward Fuergut, Horst Theuss, Rainer Leuschner
  • Publication number: 20160155680
    Abstract: A semiconductor package includes a semiconductor chip having a first main face and side faces, an encapsulation covering at least the side faces of the semiconductor chip, and an electrical redistribution structure arranged over the first main face of the semiconductor chip. A first main surface of the semiconductor package includes a surface of the electrical redistribution structure and a surface of the encapsulation.
    Type: Application
    Filed: November 30, 2015
    Publication date: June 2, 2016
    Inventors: Andreas Stueckjuergen, Rainer Leuschner, Daniel Porwol
  • Patent number: 9196670
    Abstract: Through substrate features in semiconductor substrates are described. In one embodiment, the semiconductor device includes a through substrate via disposed in a first region of a semiconductor substrate. A through substrate conductor coil is disposed in a second region of the semiconductor substrate.
    Type: Grant
    Filed: February 13, 2014
    Date of Patent: November 24, 2015
    Assignee: Infineon Technologies AG
    Inventors: Gunther Mackh, Uwe Siedel, Rainer Leuschner
  • Patent number: 9159620
    Abstract: One or more embodiments relate to a method for making a semiconductor structure, comprising: providing a substrate; forming a dielectric layer over the substrate; forming a first opening and a second opening at least partially simultaneously through the dielectric layer over the substrate; and forming a third opening through the bottom surface of the first opening and into at least a portion of the substrate.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: October 13, 2015
    Assignee: Infineon Technologies AG
    Inventors: Gunther Mackh, Uwe Seidel, Rainer Leuschner