Patents by Inventor Rajan Balesan

Rajan Balesan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Enhanced productivity for an etch system through polymer management
    Patent number: 10037883
    Abstract: Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: July 31, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Robert Chebi, Alfredo Granados, Zhao H. Ceng, Jianqi Wang, Rajan Balesan
  • Geometries and patterns for surface texturing to increase deposition retention
    Patent number: 9101954
    Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: August 11, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jianqi Wang, William Ming-ye Lu, Yukari Nishimura, Joseph F. Sommers, Sio On Lo, Rajan Balesan
  • Electrostatic chuck AlN dielectric repair
    Patent number: 9001489
    Abstract: The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: April 7, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Wendell G. Boyd, Jr., Joseph F. Sommers, William M. Lu, Rajan Balesan
  • GEOMETRIES AND PATTERNS FOR SURFACE TEXTURING TO INCREASE DEPOSITION RETENTION
    Publication number: 20150079336
    Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
    Type: Application
    Filed: September 17, 2013
    Publication date: March 19, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Jianqi WANG, William Ming-ye LU, Yukari NISHIMURA, Joseph F. SOMMERS, Sio On LO, Rajan BALESAN
  • ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT
    Publication number: 20140273520
    Abstract: Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.
    Type: Application
    Filed: February 18, 2014
    Publication date: September 18, 2014
    Inventors: Robert CHEBI, Alfredo GRANADOS, Zhao H. CENG, Jianqi WANG, Rajan BALESAN
  • ELECTROSTATIC CHUCK ALN DIELECTRIC REPAIR
    Publication number: 20120307412
    Abstract: The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.
    Type: Application
    Filed: April 23, 2012
    Publication date: December 6, 2012
    Applicant: Applied Materials, Inc.
    Inventors: Wendell G. Boyd, JR., Joseph F. Sommers, William M. Lu, Rajan Balesan