Patents by Inventor Rajesh Manepalli

Rajesh Manepalli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for generation of wafer inspection critical areas
    Patent number: 11410291
    Abstract: A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: August 9, 2022
    Assignee: KLA Corporation
    Inventors: Prasanti Uppaluri, Rajesh Manepalli, Ashok V. Kulkarni, Saibal Banerjee, John Kirkland
  • System and Method for Generation of Wafer Inspection Critical Areas
    Publication number: 20200334807
    Abstract: A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
    Type: Application
    Filed: July 6, 2020
    Publication date: October 22, 2020
    Inventors: Prasanti Uppaluri, Rajesh Manepalli, Ashok V. Kulkarni, Saibal Banerjee, John Kirkland
  • System and method for generation of wafer inspection critical areas
    Patent number: 10706522
    Abstract: A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: July 7, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Prasanti Uppaluri, Rajesh Manepalli, Ashok V. Kulkarni, Saibal Banerjee, John Kirkland
  • System and method for dynamic care area generation on an inspection tool
    Patent number: 10018571
    Abstract: A defect inspection system includes an inspection sub-system and a controller communicatively coupled to the detector. The inspection sub-system includes an illumination source configured to generate a beam of illumination, a set of illumination optics to direct the beam of illumination to a sample, and a detector configured to collect illumination emanating from the sample. The controller includes a memory device and one or more processors configured to execute program instructions. The controller is configured to determine one or more target patterns corresponding to one or more features on the sample, define one or more care areas on the sample based on the one or more target patterns and design data of the sample stored within the memory device of the controller, and identify one or more defects within the one or more care areas of the sample based on the illumination collected by the detector.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: July 10, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Vijayakumar Ramachandran, Ravikumar Sanapala, Vidyasagar Anantha, Philip Measor, Rajesh Manepalli, Jing Fang
  • System and Method for Generation of Wafer Inspection Critical Areas
    Publication number: 20180130195
    Abstract: A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
    Type: Application
    Filed: December 29, 2016
    Publication date: May 10, 2018
    Inventors: Prasanti Uppaluri, Rajesh Manepalli, Ashok V. Kulkarni, Saibal Banerjee, John Kirkland
  • System and Method for Dynamic Care Area Generation on an Inspection Tool
    Publication number: 20160377561
    Abstract: A defect inspection system includes an inspection sub-system and a controller communicatively coupled to the detector. The inspection sub-system includes an illumination source configured to generate a beam of illumination, a set of illumination optics to direct the beam of illumination to a sample, and a detector configured to collect illumination emanating from the sample. The controller includes a memory device and one or more processors configured to execute program instructions. The controller is configured to determine one or more target patterns corresponding to one or more features on the sample, define one or more care areas on the sample based on the one or more target patterns and design data of the sample stored within the memory device of the controller, and identify one or more defects within the one or more care areas of the sample based on the illumination collected by the detector.
    Type: Application
    Filed: May 27, 2016
    Publication date: December 29, 2016
    Inventors: Vijayakumar Ramachandran, Ravikumar Sanapala, Vidyasagar Anantha, Philip Measor, Rajesh Manepalli, Jing Fang