Abstract: Metamaterial optical modulators can include one or more optical inputs, one or more optical outputs, one or more control inputs and an arrangement of a plurality of elements. The plurality of elements can include one or more variable state elements. The plurality of elements as arranged can be configured to modulate one or more properties of light passing through the metamaterial optical modulator via a change in a state of the one or more variable state elements based on one or more control signals received at the one or more control inputs.

Abstract: An image capturing device (202) can include a sensor array (210), a lens (230) positioned at a first distance from an intermediate image (235), and apolychromat (220) positioned at a second distance from the lens (230). The polychromat (220) can diffract the intermediate image (235) according to a transform function (207) to produce a dispersed sensor image (215) onto the sensor array (210). The dispersed sensor image (215) can represent a spatial code of the intermediate image (235).

Abstract: A multi-spectral imaging (MSI) device can include an imaging plane and a diffractive optic. The imaging plane can include at least two groups of pixels an array of pixels for sensing at least two spectral bands. The at least two spectral bands can include a first spectral band and a second spectral band. The diffractive optic can be configured for diffracting an electromagnetic wave into the at least two spectral bands and focusing each spectral band component of the electromagnetic wave onto the group of pixels for the spectral band to generate an image.

Abstract: A multi-spectral imaging (MSI) device can include an imaging plane and a diffractive optic. The imaging plane can include at least two groups of pixels an array of pixels for sensing at least two spectral bands. The at least two spectral bands can include a first spectral band and a second spectral band. The diffractive optic can be configured for diffracting an electromagnetic wave into the at least two spectral bands and focusing each spectral band component of the electromagnetic wave onto the group of pixels for the spectral band to generate an image.

Abstract: A method for sub-diffraction-limited patterning using a photoswitchable layer is disclosed. A sample of the photoswitchable layer can be selectively exposed to a first wavelength of illumination that includes a super-oscillatory peak. The sample can be selectively exposed to a second wavelength of illumination that does not include the super-oscillatory peak. A region in the sample that corresponds to the super-oscillatory peak and is associated with the second transition state can optionally be converted into a third transition state. The region in the sample at the third transition state can constitute a pattern of an isolated feature with a size that is substantially smaller than a far-field diffraction limit.

Abstract: A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

Abstract: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.

Abstract: An imaging system can include an optical fiber and a light source for providing optical stimulation to a region of interest along the optical fiber. A camera can capture emission such as fluorescence resulting from the optical stimulation. A cannula configured for implantation into a subject can be configured to direct the emission from the subject. A mating sleeve coupling the cannula to the optical fiber, and configured to support the camera, can include a dichroic mirror to allow the optical stimulation to pass from the optical fiber to the cannula and to redirect the emission from the cannula to the camera.

Abstract: A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined pattern to form a nanoimprint lithography template in the mass transport layer.

Abstract: A method for sub-diffraction-limited patterning using a photoswitchable layer is disclosed. A sample of the photoswitchable layer can be selectively exposed to a first wavelength of illumination that includes a super-oscillatory peak. The sample can be selectively exposed to a second wavelength of illumination that does not include the super-oscillatory peak. A region in the sample that corresponds to the super-oscillatory peak and is associated with the second transition state can optionally be converted into a third transition state. The region in the sample at the third transition state can constitute a pattern of an isolated feature with a size that is substantially smaller than a far-field diffraction limit.

Abstract: A microscopy system which includes a light source for illuminating a sample; an objective lens for capturing light emitted from the illuminated sample to form a signal beam; and a dispersive optical element through which the signal beam is directed, wherein the dispersive optical element converts the signal beam to a spatially coherent signal beam.

Abstract: Methods and apparatus for combining or separating spectral components by means of a polychromat. A polychromat is employed to combine a plurality of beams, each derived from a separate source, into a single output beam, thereby providing for definition of one or more of the intensity, color, color uniformity, divergence angle, degree of collimation, polarization, focus, or beam waist of the output beam. The combination of sources and polychromat may serve as an enhanced-privacy display and to multiplex signals of multiple spectral components. In other embodiments of the invention, a polychromat serves to disperse spectral components for spectroscopic or de-multiplexing applications.

Abstract: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

Abstract: Methods and apparatus for combining or separating spectral components by means of a polychromat. A polychromat is employed to combine a plurality of beams, each derived from a separate source, into a single output beam, thereby providing for definition of one or more of the intensity, color, color uniformity, divergence angle, degree of collimation, polarization, focus, or beam waist of the output beam. The combination of sources and polychromat may serve as an enhanced-privacy display and to multiplex signals of multiple spectral components. In other embodiments of the invention, a polychromat serves to disperse spectral components for spectroscopic or de-multiplexing applications.

Abstract: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device can selectively expose the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. The optical device or a substrate carrier securing the substrate can modify the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern.

Abstract: A display backlight can include a light source and a parabolic waveguide. The parabolic waveguide can have a light inlet to receive the light from the light source, a parabolic reflective surface adapted to change a direction of the light emitted from the light source by a predetermined angle, and a light outlet configured to emit the light at the predetermined angle.

Abstract: A method of designing a nanophotonic scattering structure can include establishing an initial design having an array of discrete pixels variable between at least two pixel height levels. A performance metric for the structure can be a function of the heights of the pixels. The height of a pixel can be varied, and then the performance metric can be calculated. The steps of varying the pixel height and calculating the performance metric can be repeated to increase the performance metric. The above steps can be repeated for each pixel within the array and then the method can be iterated until the performance metric reaches an optimized value. Nanophotonic scattering structures can be produced from designs obtained through this process.

Abstract: A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined pattern to form a nanoimprint lithography template in the mass transport layer.

Abstract: A spectral distribution of incident light can be determined to increase collected spectral information. The spectral distribution of the incident light can be represented as a sum of spectral components after the incident light passes through a spectrum selective element. A signal at each color pixel of the spectrum selective element can be determined using, in part, the sum of the spectral components, where the spectral components are represented by a set of preliminary values. An error associated with the signal at each color pixel of the spectrum selective element is calculated. One or more perturbations are performed on each of the preliminary values and the error associated with the signal at each color pixel of the spectrum selective element is recalculated. The perturbations on each of the preliminary values is repeated until the error stabilizes within a predetermined range in order to assign the stabilized preliminary values as the spectral components in the incident light.

Abstract: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.