Patents by Inventor Rajiv Bhushan
Rajiv Bhushan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6158446Abstract: A method for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: September 4, 1998Date of Patent: December 12, 2000Assignee: FSI InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 6047717Abstract: An improved mandrel device (100) and method. The mandrel device (100) has an elongated member (117) for supporting a plurality of hard disks, for example. The elongated member (117) includes an inner member (107) that is defined between a pair of outer members (105), where each of the members have ridges (103) defined thereon. The combination of these members and ridges are used to support a plurality of disks that do not touch each other during, for example transportation.Type: GrantFiled: April 29, 1998Date of Patent: April 11, 2000Assignee: SCD Mountain View, Inc.Inventors: Rajiv Bhushan, Ru Chang, Raj Mohindra, Vincent Chiu, Dong T. Tran
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Patent number: 6004399Abstract: A method is described for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance also is included. It is believed that the cleaning enhancement substance dopes any liquid adhered to the front and back faces of the wafer to cause a concentration gradient of the cleaning enhancement substance in the liquid and accelerate removal of the adhered liquid off of the water.Type: GrantFiled: January 15, 1997Date of Patent: December 21, 1999Assignee: Cypress Semiconductor CorporationInventors: Kaichiu Wong, Krishnaswamy Ramkumar, Hanna Bamnolker, Suraj Puri, Rajiv Bhushan, David Wong, Gary Elmore, Raj Mohindra
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Patent number: 5958146Abstract: A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a hot or heated liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: September 24, 1998Date of Patent: September 28, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, David Wong
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Patent number: 5932027Abstract: A method for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid having water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas having a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: January 12, 1998Date of Patent: August 3, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5891256Abstract: A method for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid including water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas including a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: December 29, 1997Date of Patent: April 6, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5878760Abstract: A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: May 22, 1997Date of Patent: March 9, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5873947Abstract: A technique for cleaning a hard disk using a novel support device 502. The technique includes immersing a disk in a liquid comprising water. The disk has a front face, a back face, an edge, and a center region. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the disk.Type: GrantFiled: August 6, 1997Date of Patent: February 23, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5868150Abstract: A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: May 22, 1997Date of Patent: February 9, 1999Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5772784Abstract: A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.Type: GrantFiled: November 8, 1995Date of Patent: June 30, 1998Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5685327Abstract: Apparatus for cleaning and drying a semiconductor wafer. The apparatus includes a vessel adapted to immerse a partially completed semiconductor wafer in a liquid comprising water. The apparatus also includes a control valve operably coupled to the vessel through a drain, and adapted to allow a gaseous mixture to displace the liquid in the vessel, where the liquid is displaced adjacent to the front face of the partially completed wafer. A controller is included. The controller is operably coupled to a plurality of nozzles. The controller can be used to pulse a drying fluid from the plurality of nozzles to the partially completed wafer to remove a possibility of liquid which may be attached to the partially completed wafer.Type: GrantFiled: August 8, 1996Date of Patent: November 11, 1997Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Jeffrey Nowell
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Patent number: 5651379Abstract: The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water filter bank, a local gas filtering system, an H.sub.2 O.sub.2 injection unit, an auxiliary chemical injection unit, and a controller for operating the other components. The water filter bank provides a multiple stage filtering system to eliminate particles without a substantial drop in water pressure. The H.sub.2 O.sub.2 injection unit provides a local source of H.sub.2 O.sub.2 to clean the filter and rinser and to provide a mechanism for controlling the formation of native oxide on the wafer during rinsing. The auxiliary chemical injection unit provides a chemical additive to the rinsing unit to enhance the wafer cleaning process.Type: GrantFiled: December 1, 1995Date of Patent: July 29, 1997Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay K. Bhushan, Rajiv Bhushan, Suraj Puri
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Patent number: 5634978Abstract: A method operates a system for wet processing of semiconductors. The system includes an inlet coupled to a fluid source, and a filter coupled to the inlet. The system also includes a sealed vessel coupled to the filter where the sealed vessel has a lower liquid portion and an upper vapor portion. The system further includes an outlet coupled to the sealed vessel. The outlet is attached to the lower liquid portion. A solvent injector coupled to the sealed vessel is also used. The solvent injector is coupled to the upper vapor portion, and supplies a gaseous mixture including a polar organic compound. The polar organic compound is a non-saturated polar organic vapor. The system also includes a gas source coupled to the sealed vessel. The gas source is coupled to the upper vapor portion, and supplies an inert gas into the upper vapor portion. A device for removing the liquid from the lower liquid portion at substantially a constant liquid level rate is also included.Type: GrantFiled: November 14, 1994Date of Patent: June 3, 1997Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Sr., Jeffrey Nowell
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Patent number: 5571337Abstract: A method for drying articles with flat surfaces such as a semiconductor wafer. The method includes steps of immersing a semiconductor wafer in a liquid such as water, and displacing the liquid with a gaseous mixture. The liquid is displaced adjacent to a face of the wafer as measured from the face. A step of pulsing drying fluid directed at wafer edges is also included. The method dries wafers without the use of any harmful organic solvents and the like, and also dries wafers without substantial movement.Type: GrantFiled: May 9, 1995Date of Patent: November 5, 1996Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay Bhushan, Rajiv Bhushan, Suraj Puri, John H. Anderson, Jeffrey Nowell
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Patent number: 5542441Abstract: The invention relates to a wafer rinsing system for rinsing chemicals and particles off of wafers without introducing contaminants. The system reduces the particle count on wafers by filtering the water and the gas used during rinsing at the wet bench. The system includes a rinsing unit, a local water filter bank, a local gas filtering system, an H.sub.2 O.sub.2 injection unit, an auxiliary chemical injection unit, and a controller for operating the other components. The water filter bank provides a multiple stage filtering system to eliminate particles without a substantial drop in water pressure. The H.sub.2 O.sub.2 injection unit provides a local source of H.sub.2 O.sub.2 to clean the filter and rinser and to provide a mechanism for controlling the formation of native oxide on the wafer during rinsing. The auxiliary chemical injection unit provides a chemical additive to the rinsing unit to enhance the wafer cleaning process.Type: GrantFiled: August 3, 1994Date of Patent: August 6, 1996Assignee: YieldUP InternationalInventors: Raj Mohindra, Abhay K. Bhushan, Rajiv Bhushan, Suraj Puri