Patents by Inventor Rajkumar Govindarajan

Rajkumar Govindarajan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8772170
    Abstract: A benign all-wet process for stripping photoresist after an implantation process performed to fabricate a device is provided. A method of stripping implanted resist includes a first step of disrupting a crust formed on the surface of the resist during the implantation process and then removing the underlying resist. In accordance with embodiments of the invention, a catalyzed hydrogen peroxide (CHP) chemical system is used to disrupt the crust and allow for low temperature (<180° C.) removal of the underlying resist.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: July 8, 2014
    Assignee: Arizona Board of Regents on Behalf of the University of Arizona
    Inventors: Srini Raghavan, Rajkumar Govindarajan, Manish Keswani
  • Publication number: 20120052687
    Abstract: A benign all-wet process for stripping photoresist after an implantation process performed to fabricate a device is provided. A method of stripping implanted resist includes a first step of disrupting a crust formed on the surface of the resist during the implantation process and then removing the underlying resist. In accordance with embodiments of the invention, a catalyzed hydrogen peroxide (CHP) chemical system is used to disrupt the crust and allow for low temperature (<180° C.) removal of the underlying resist.
    Type: Application
    Filed: December 29, 2010
    Publication date: March 1, 2012
    Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA
    Inventors: SRINI RAGHAVAN, Rajkumar Govindarajan, Manish Keswani