Patents by Inventor Ralf Spitzl

Ralf Spitzl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210084743
    Abstract: A microwave plasma device includes a treatment space and a number of two or more microwave semiconductors. The microwave semiconductors are attached to the treatment space in such a way that the microwaves of a microwave semiconductor only interfere with the microwaves of other microwave semiconductors when in the treatment space.
    Type: Application
    Filed: December 21, 2018
    Publication date: March 18, 2021
    Inventor: Ralf SPITZL
  • Patent number: 10702847
    Abstract: Methods and devices are provided for the plasma-catalytic conversion of materials to produce chemical base materials. The methods and devices allow a plurality of chemical processes to be carried out in a plasma-catalytic manner to produce chemical base materials from simple raw materials (for example methane and biogas) with an improved selectivity and energy balance. A hydrocarbon-containing or other starting material is reacted under the action of a plasma to produce chemical base materials, or such a starting material is converted into an intermediate product in a first step under the action of a plasma, and the intermediate product is converted into the desired base material in a subsequent step. The devices for carrying out plasma-catalytic reactions are characterized by a jet pump arranged downstream of the plasma reactor, a tubular recipient (reaction chamber) having a diameter of at least 4 cm, or a catalyst-containing wall of the recipient.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: July 7, 2020
    Inventor: Ralf Spitzl
  • Patent number: 10207924
    Abstract: Methods and devices are provided for producing syngas with an adjustable molar CO/H2 ratio. Syngas can have different proportions of CO and H2 (molar CO/H2 ratio) depending on the type and composition of starting materials. To set the desired molar CO/H2 ratio, a first sub-process is combined with at least one additional sub-process selected from: a sub-process T2 by which a second syngas B is generated from the starting material, the syngas having a molar ratio (V2) of CO to H2, wherein V1?V2; a sub-process T3 by which the hydrocarbon(s) of the hydrocarbon-containing starting material is/are split substantially into solid carbon and hydrogen; and a sub-process T4 based on the reaction equation: CO+H2O?2CO2+H2. The methods and devices are suitable for producing syngas useful as a starting material in a plurality of chemical syntheses, for example oxo, Fischer-Tropsch, or Reppe syntheses.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: February 19, 2019
    Inventor: Ralf Spitzl
  • Patent number: 9758444
    Abstract: Method and device for the production of acetylene using plasma technology, wherein a gas containing at least one type of hydrocarbon is fed into a non-thermal plasma of a plasma source.
    Type: Grant
    Filed: April 3, 2013
    Date of Patent: September 12, 2017
    Inventor: Ralf Spitzl
  • Publication number: 20160311683
    Abstract: Methods and devices are provided for producing syngas with an adjustable molar CO/H2 ratio. Syngas can have different proportions of CO and H2 (molar CO/H2 ratio) depending on the type and composition of starting materials. To set the desired molar CO/H2 ratio, a first sub-process is combined with at least one additional sub-process selected from: a sub-process T2 by which a second syngas B is generated from the starting material, the syngas having a molar ratio (V2) of CO to H2, wherein V1?V2; a sub-process T3 by which the hydrocarbon(s) of the hydrocarbon-containing starting material is/are split substantially into solid carbon and hydrogen; and a sub-process T4 based on the reaction equation: CO+H2O?2CO2+H2. The methods and devices are suitable for producing syngas useful as a starting material in a plurality of chemical syntheses, for example oxo, Fischer-Tropsch, or Reppe syntheses.
    Type: Application
    Filed: December 16, 2014
    Publication date: October 27, 2016
    Inventor: Ralf Spitzl
  • Publication number: 20160243518
    Abstract: Methods and devices are provided for the plasma-catalytic conversion of materials to produce chemical base materials. The methods and devices allow a plurality of chemical processes to be carried out in a plasma-catalytic manner to produce chemical base materials from simple raw materials (for example methane and biogas) with an improved selectivity and energy balance. A hydrocarbon-containing or other starting material is reacted under the action of a plasma to produce chemical base materials, or such a starting material is converted into an intermediate product in a first step under the action of a plasma, and the intermediate product is converted into the desired base material in a subsequent step. The devices for carrying out plasma-catalytic reactions are characterized by a jet pump arranged downstream of the plasma reactor, a tubular recipient (reaction chamber) having a diameter of at least 4 cm, or a catalyst-containing wall of the recipient.
    Type: Application
    Filed: October 2, 2014
    Publication date: August 25, 2016
    Inventor: Ralf SPITZL
  • Patent number: 9227169
    Abstract: A device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. A method for carrying out gas reactions is also provided.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: January 5, 2016
    Assignee: Iplas GmbH
    Inventors: Ralf Spitzl, Arno Behr, Christian Wolff, Thorsten Oberreuther
  • Publication number: 20150041309
    Abstract: Method and device for the production of acetylene using plasma technology, wherein a gas containing at least one type of hydrocarbon is fed into a non-thermal plasma of a plasma source.
    Type: Application
    Filed: April 3, 2013
    Publication date: February 12, 2015
    Inventor: Ralf SPITZL
  • Publication number: 20140183033
    Abstract: A device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. A method for carrying out gas reactions is also provided.
    Type: Application
    Filed: December 16, 2013
    Publication date: July 3, 2014
    Applicant: Iplas GmbH
    Inventors: Ralf Spitzl, Arno Behr, Christian Wolff, Thorsten Oberreuther
  • Patent number: 8636960
    Abstract: A device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. A method for carrying out gas reactions is also provided.
    Type: Grant
    Filed: July 22, 2003
    Date of Patent: January 28, 2014
    Assignee: Iplas GmbH
    Inventors: Ralf Spitzl, Arno Behr, Christian Wolff, Thorsten Oberreuther
  • Publication number: 20100301012
    Abstract: A device for producing microwave plasma with a high plasma density. The device comprises at least one microwave supply that is surrounded by an outer dielectric tube. The microwave supply is surrounded by, in addition to the outer dielectric tube, at least one inner dielectric tube that extends inside the outer dielectric tube. The outer dielectric tube and the at least one inner dielectric tube form at least one area that is suitable for receiving and conducting a fluid. The device can be cooled by a fluid. A process gas can be fed into the plasma region by the outer dielectric tube.
    Type: Application
    Filed: October 11, 2007
    Publication date: December 2, 2010
    Applicant: Iplas Innovative Plasma Systems GmbH
    Inventor: Ralf Spitzl
  • Publication number: 20100215541
    Abstract: A device for producing high power microwave plasmas. The device comprises at least one microwave feed that is surrounded by at least one dielectric tube. A dielectric fluid flows through the space between the microwave feed and the outer dielectric tube. The dielectric fluid has a small dielectric loss factor tan ? in the region of between 10?2 to 10?7. A fluid cools at least the outer dielectric tube.
    Type: Application
    Filed: October 11, 2007
    Publication date: August 26, 2010
    Inventor: Ralf Spitzl
  • Publication number: 20100116790
    Abstract: A device for locally producing microwave plasma. The device comprises at least one microwave feed that is surrounded by at least one dielectric tube. At least one of the dielectric tubes, such as an outer dielectric tube, is partially surrounded by a metal jacket. A locally delimited plasma is produced by the device by shielding microwaves.
    Type: Application
    Filed: October 11, 2007
    Publication date: May 13, 2010
    Applicant: iplas Innovative Plasma Systems GmbH
    Inventor: Ralf Spitzl
  • Publication number: 20060163054
    Abstract: The invention relates to a device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. The invention further relates to a method for carrying out gas reactions.
    Type: Application
    Filed: July 22, 2003
    Publication date: July 27, 2006
    Inventors: Ralf Spitzl, Arno Behr, Christian Wolff, Thorsten Oberreuther
  • Patent number: 6204603
    Abstract: In a device for the production of powerful microwave plasmas, the resonator is designed as a coaxial resonator with inner and outer conductors. The microwaves are coupled into the plasma chamber via the boundaries of the coaxial resonator.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: March 20, 2001
    Inventors: Ralf Spitzl, Benedikt Aschermann
  • Patent number: 6198224
    Abstract: A device for the production of microwave plasmas with a microwave generator 1 and its coupling system to a waveguide resonator 5 which encloses a plasma chamber 7 is proposed, the short side of the cross-section of the resonator 5 lying parallel, facing the z axis, in the common wall with the chamber 7, and the microwave power being coupled from the resonator 5 into the chamber 7 via coupling points 6 in this short cross-sectional side. The coupling points are preferably formed as azimuthal slot couplers in the common wall of 5 and 7. The reference numbers relate to FIG. 1.
    Type: Grant
    Filed: February 1, 1999
    Date of Patent: March 6, 2001
    Inventors: Ralf Spitzl, Benedikt Aschermann, Marko Walter