Patents by Inventor Ralph VAN MELLE

Ralph VAN MELLE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9457549
    Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: October 4, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido De Boer, Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks, Edwin Johannes Theodorus Smulders
  • Patent number: 9287081
    Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.
    Type: Grant
    Filed: October 26, 2011
    Date of Patent: March 15, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Ralph Van Melle, Teunis Van De Peut, Henk Derks
  • Publication number: 20150190994
    Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface.
    Type: Application
    Filed: March 19, 2015
    Publication date: July 9, 2015
    Inventors: Guido DE BOER, Ralph VAN MELLE, Teunis VAN DE PEUT, Henk DERKS, Frederik Matthias SPIEGELHALDER, Roy Josephus Stephanus DERKS, Edwin Johannes Theodorus SMULDERS
  • Patent number: 9036962
    Abstract: A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: May 19, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido De Boer, Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks, Edwin Johannes Theodorus Smulders
  • Patent number: 8921758
    Abstract: The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
    Type: Grant
    Filed: October 26, 2011
    Date of Patent: December 30, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Alexander Hendrik Vincent Van Veen, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle, Henk Derks
  • Publication number: 20130043413
    Abstract: A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.
    Type: Application
    Filed: April 20, 2012
    Publication date: February 21, 2013
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido DE BOER, Ralph VAN MELLE, Teunis VAN DE PEUT, Henk DERKS, Frederik Matthias SPIEGELHALDER
  • Publication number: 20120273658
    Abstract: The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
    Type: Application
    Filed: October 26, 2011
    Publication date: November 1, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Alexander Hendrik Vincent Van Veen, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle, Henk Derks
  • Publication number: 20120145931
    Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.
    Type: Application
    Filed: October 26, 2011
    Publication date: June 14, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Ralph VAN MELLE, Teunis VAN DE PEUT, Henk DERKS
  • Patent number: RE48287
    Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: October 27, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Guido De Boer, Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks, Edwin Johannes Theodorus Smulders