Abstract: In one aspect, a microelectrode comprising an upper surface, two walls, and a polymer core is described, wherein each of the two walls forms an angle with a lower surface, and the upper surface and each of the two walls comprises a metal thin film in contact with the polymer core. The lower surface, however, lacks a continuous metal thin film. In another aspect, a microelectrode comprising a metal thin film is described in which the metal thin film has a thickness and a plane bisects the thickness. The plane forms an angle with a lower surface that lacks a contiuous metal thin film. The metal thin film is in contact with a supporting polymer having an upper surface that also lacks a continuous metal thin film.

Abstract: A process for fabricating a microelectrode is described that includes: a) providing a substrate comprising at least one polymer micro-ridge, where the polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; and c) etching a predetermined amount of the deposited metal thin film on the lower surface to form the microelectrode.

Abstract: A method including poling an optical waveguide device including an optical waveguide core, an electrode, and an organically modified sol-gel layer.

Abstract: An article, process, and method for surface plasmon resonance plates are described. A substrate is covered with a thin metal film onto which a second thin metal film is deposited. The surface of the second thin metal film is converted to the metal oxide which is used to covalently bond organosilanes to the surface. Reactive organosilanes containing terminal bonding groups are arranged in a plurality of spots that are surrounded by inert organosilanes. Biomolecule attachment to the binding group is detected or measured from surface plasmon signals from the first thin metal film.

Abstract: Electro-optic waveguide devices that comprise an electro-optic polymer core and a polymer buffer clad. The polymer buffer clad comprises an organically modified sol-gel and has a refractive index lower than the refractive index of the core.

Abstract: A device that comprises: a) a first optical waveguide; b) a second optical waveguide; c) an optical coupling region including the first and second optical waveguides, the optical coupling region characterized as having at least one coupling length and comprising a first bias section, a modulation section, and a second bias section arranged such that light propagates serially through the first bias section, the modulation section, and the second bias section; d) a first bias electrode for biasing the first bias section; e) a modulating electrode for applying a modulating voltage to the modulation section, the modulating electrode being positioned to control the refractive index of the first optical waveguide; and f) a second bias electrode for biasing the second bias section.

Abstract: A device that comprises: a) a first optical waveguide; b) a second optical waveguide; c) an optical coupling region including the first and second optical waveguides, the optical coupling region characterized as having at least one coupling length and comprising a first bias section, a modulation section, and a second bias section arranged such that light propagates serially through the first bias section, the modulation section, and the second bias section; d) a first bias electrode for biasing the first bias section; e) a modulating electrode for applying a modulating voltage to the modulation section, the modulating electrode being positioned to control the refractive index of the first optical waveguide; and f) a second bias electrode for biasing the second bias section.

Abstract: An electro-optic waveguide device that includes (a) an electro-optic polymer core having a refractive index and (b) an electro-optic first polymer clad in proximity to the electro-optic polymer core.

Abstract: In one aspect, a process for fabricating a microelectrode is described that includes: a) providing a substrate comprising at least one polymer micro-ridge, where the polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; and c) etching a predetermined amount of the deposited metal thin film on the lower surface to form the microelectrode.

Abstract: In one aspect, a microelectrode comprising an upper surface, two walls, and a polymer core is described, wherein each of the two walls forms an angle with a lower surface, and the upper surface and each of the two walls comprises a metal thin film in contact with the polymer core. The lower surface, however, lacks a continuous metal thin film. In another aspect, a microelectrode comprising a metal thin film is described in which the metal thin film has a thickness and a plane bisects the thickness. The plane forms an angle with a lower surface that lacks a contiuous metal thin film. The metal thin film is in contact with a supporting polymer having an upper surface that also lacks a continuous metal thin film.

Abstract: A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.

Abstract: An electro-optic waveguide device, comprising (a) a first polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 ?m to about 3.2 ?m; (b) a first polymer clad having a refractive index of about 1.53 to about 1.61 and a thickness of about 1.0 ?m to about 3.0 ?m; (c) an electro-optic polymer core having a refractive index of about 1.54 to about 1.62 and a thickness of about 1.0 ?m to about 3.0 ?m; and (d) a second polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 ?m to about 3.2 ?m.

Abstract: A process for fabricating an electro-optic device is decribed that includes: a) providing a substrate comprising at least two polymer micro-ridges, where each polymer micro-ridge comprises an upper surface and two walls, and the two walls form an angle with a lower surface; b) depositing a metal thin film on the upper surface, the two walls, and the lower surface; c) etching a predetermined amount of the deposited metal thin film on the lower surface, thereby forming two electrodes separated by a gap; d) depositing a nonlinear optical polymer in the gap between the two electrodes; and e) poling the nonlinear optical polymer to induce electro-optic activity.

Abstract: A method for removing etch veils from the surface of a microstructure using a liquid spray directed at the surface. The spray pressure is sufficiently high to substantially remove the etch veils.

Abstract: A method of fabricating a polymer waveguide, comprising (a) forming a first polymer film in proximity to a substrate, the first polymer film comprising a nonlinear optical chromophore; (b) poling and crosslinking the first polymer film to provide a crosslinked first electro-optic polymer film; (c) forming a second polymer film comprising a nonlinear optical chromophore in proximity to the first electro-optic polymer film; and (d) poling the second polymer film to provide a second electro-optic polymer film.

Abstract: An electro-optic waveguide device, comprising (a) a first polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &mgr;m to about 3.2 &mgr;m; (b) a first polymer clad having a refractive index of about 1.53 to about 1.61 and a thickness of about 1.0 &mgr;m to about 3.0 &mgr;m; (c) an electro-optic polymer core having a refractive index of about 1.54 to about 1.62 and a thickness of about 1.0 &mgr;m to about 3.0 &mgr;m; and (d) a second polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &mgr;m to about 3.2 &mgr;m.

Abstract: An electro-optic waveguide device that includes (a) an electro-optic polymer core having a refractive index and (b) an electro-optic first polymer clad in proximity to the electro-optic polymer core.

Abstract: Electro-optic waveguide devices that comprise an electro-optic polymer core and a polymer buffer clad. The polymer buffer clad comprises an organically modified sol-gel and has a refractive index lower than the refractive index of the core.

Abstract: A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.