Patents by Inventor Ram W. Sabnis
Ram W. Sabnis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20170128595Abstract: Provided herein are medical devices capable of self-reporting microbial growth adjacent the site of the implanted device.Type: ApplicationFiled: June 22, 2015Publication date: May 11, 2017Applicant: Indicator Systems International, Inc.Inventors: Gerald F. Swiss, Robert M. Moriarty, Ram W. Sabnis
-
Patent number: 9115066Abstract: Provided herein are trisubstituted methyl alcohols, preferably pH indicators that are substituted with optionally substituted aryl and or optionally substituted heteroaryl groups, and optionally include one or more polymerizable substituents.Type: GrantFiled: December 14, 2012Date of Patent: August 25, 2015Assignee: Indicator Systems International, Inc.Inventors: Gerald F. Swiss, Photon Rao, Ram W. Sabnis
-
Publication number: 20150037258Abstract: Provided herein is an implantable medical device capable of self-reporting microbial growth adjacent the site of the implanted device.Type: ApplicationFiled: June 23, 2014Publication date: February 5, 2015Inventors: Gerald F. Swiss, Robert M. Moriarty, Ram W. Sabnis
-
Patent number: 8425996Abstract: Polymeric indicator films and pH indicating wraps are provided for visually monitoring, detecting, and/or determining the presence of metabolic byproducts from harmful or potentially harmful microorganisms. Also provided are methods of use and preparation of the polymeric indicator films.Type: GrantFiled: January 25, 2010Date of Patent: April 23, 2013Assignee: Indicator Systems International, Inc.Inventors: Joel R. Gorski, Jon Booher, Ram W. Sabnis
-
Publication number: 20120316408Abstract: pH indicator compositions, solutions and suspensions and pH indicating food storage devices, medical devices and components thereof are provided for visually monitoring, detecting, and/or determining the presence of metabolic by-products from harmful or potentially harmful microorganisms. Also provided are methods of use and preparation of the pH indicator compositions, solutions and suspensions.Type: ApplicationFiled: May 10, 2012Publication date: December 13, 2012Inventors: Joel R. Gorski, Ram W. Sabnis
-
Publication number: 20120244777Abstract: Compositions and methods for producing substantially uniformly colored bubbles are described. The composition comprises at least one surfactant mixed with at least one colorant, the colorant forming at least approximately 10% of the composition. The surfactant, or surface-active agent, forms the bubble while the colorant, or pigment, provides the color. Generally, the composition may comprise 10-99% colorant to produce varying degrees of opacity. In addition, glycerin, fragrance, propylene glycol, sodium lauryl sulfate, potassium hydroxide, or other additives may be included.Type: ApplicationFiled: March 22, 2011Publication date: September 27, 2012Inventors: Ram W. Sabnis, Timothy D. Kehoe
-
Patent number: 7910531Abstract: Compositions and methods for producing colored bubbles, having a single color uniformly dispersed in the film, are described. The composition comprises at least one surfactant mixed with at least one colorant, the colorant forming at least approximately 10% of the composition. The surfactant, or surface-active agent, forms the bubble while the colorant, or pigment, provides the color. Generally, the composition may comprise 10-99% colorant to produce varying degrees of opacity. In addition, glycerin, fragrance, propylene glycol, sodium lauryl sulfate, potassium hydroxide, or other additives may be included.Type: GrantFiled: June 13, 2005Date of Patent: March 22, 2011Assignee: C2C Technologies LLCInventors: Ram W. Sabnis, Timothy D. Kehoe
-
Publication number: 20100196636Abstract: Polymeric indicator films and pH indicating wraps are provided for visually monitoring, detecting, and/or determining the presence of metabolic byproducts from harmful or potentially harmful microorganisms. Also provided are methods of use and preparation of the polymeric indicator films.Type: ApplicationFiled: January 25, 2010Publication date: August 5, 2010Inventors: Joel R. Gorski, Jon Booher, Ram W. Sabnis
-
Patent number: 7449230Abstract: Novel processes of applying a thin, uniform, conformal organic polymeric film by a wide variety of deposition processes into lithography pattern substrates are provided. The inventive processes result in shrinking of the gaps in the lithography pattern equally, thus producing a smaller dimension. The amount of pattern shrinkage is selectively controlled by controlling the deposition rate to provide the desired final structure dimension. A wide variety of organic films is used as materials for these films. The inventive methods are applicable to any patterning technique used in lithography to provide a reduction in pattern sizes. Examples of the applicable device levels include the production of gate layers, ion implantation of active device layers and substantive metal layers, dielectric patterning, interconnect processes produced by damascene, dual damascene, backend packaging layers, and devices requiring multiple layers deposited by electrodeposition, CVD or sputtering.Type: GrantFiled: February 23, 2005Date of Patent: November 11, 2008Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, James E. Lamb, III
-
Patent number: 7132219Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 ?m or smaller) features.Type: GrantFiled: April 9, 2003Date of Patent: November 7, 2006Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, Wu-Sheng Shih, Douglas J. Guerrero
-
Patent number: 7122296Abstract: Novel processes of applying a thin, uniform, conformal organic polymeric film by a wide variety of deposition processes into lithography pattern substrates are provided. The inventive processes result in shrinking of the gaps in the lithography pattern equally, thus producing a smaller dimension. The amount of pattern shrinkage is selectively controlled by controlling the deposition rate to provide the desired final structure dimension. A wide variety of organic films is used as materials for these films. The inventive methods are applicable to any patterning technique used in lithography to provide a reduction in pattern sizes. Examples of the applicable device levels include the production of gate layers, ion implantation of active device layers and substantive metal layers, dielectric patterning, interconnect processes produced by damascene, dual damascene, backend packaging layers, and devices requiring multiple layers deposited by electrodeposition, CVD or sputtering.Type: GrantFiled: March 3, 2003Date of Patent: October 17, 2006Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, James E. Lamb, III
-
Patent number: 6936405Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.Type: GrantFiled: December 21, 2000Date of Patent: August 30, 2005Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, Douglas J. Guerrero, Terry Brewer, Mary J. Spencer
-
Patent number: 6900000Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.Type: GrantFiled: June 28, 2002Date of Patent: May 31, 2005Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, Douglas J. Guerrero, Terry Brewer, Mary J. Spencer
-
Patent number: 6869747Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.Type: GrantFiled: June 28, 2002Date of Patent: March 22, 2005Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, Douglas J. Guerrero, Terry Brewer, Mary J. Spencer
-
Patent number: 6852474Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 ?m or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.Type: GrantFiled: April 24, 2003Date of Patent: February 8, 2005Assignee: Brewer Science Inc.Inventor: Ram W. Sabnis
-
Publication number: 20040048197Abstract: A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of ≦1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.Type: ApplicationFiled: September 8, 2003Publication date: March 11, 2004Inventors: Ram W. Sabnis, Jonathan W. Mayo, Terry L. Brewer, Michael D. Stroder, Kiyomi Ema, Yasuhisa Sone, Takayasu Nihira, Kazuhiro Aoba, Akira Yanagimoto
-
Publication number: 20030224586Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 &mgr;m or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.Type: ApplicationFiled: April 24, 2003Publication date: December 4, 2003Applicant: Brewer Science, Inc.Inventor: Ram W. Sabnis
-
Publication number: 20030219541Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 &mgr;m or smaller) features.Type: ApplicationFiled: April 9, 2003Publication date: November 27, 2003Applicant: Brewer Science, Inc.Inventors: Ram W. Sabnis, Wu-Sheng Shih, Douglas J. Guerrero
-
Publication number: 20030203320Abstract: Novel processes of applying a thin, uniform, conformal organic polymeric film by a wide variety of deposition processes into lithography pattern substrates are provided. The inventive processes result in shrinking of the gaps in the lithography pattern equally, thus producing a smaller dimension. The amount of pattern shrinkage is selectively controlled by controlling the deposition rate to provide the desired final structure dimension. A wide variety of organic films is used as materials for these films. The inventive methods are applicable to any patterning technique used in lithography to provide a reduction in pattern sizes. Examples of the applicable device levels include the production of gate layers, ion implantation of active device layers and substantive metal layers, dielectric patterning, interconnect processes produced by damascene, dual damascene, backend packaging layers, and devices requiring multiple layers deposited by electrodeposition, CVD or sputtering.Type: ApplicationFiled: March 3, 2003Publication date: October 30, 2003Applicant: BREWER SCIENCE, INC.Inventors: Ram W. Sabnis, James E. Lamb
-
Publication number: 20030113640Abstract: A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of ≦1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.Type: ApplicationFiled: October 21, 2002Publication date: June 19, 2003Inventors: Ram W. Sabnis, Jonathan W. Mayo, Terry L. Brewer, Michael D. Stroder, Kiyomi Ema, Yasuhisa Sone, Takayasu Nihira, Kazuhiro Aoba, Akira Yanagimoto