Patents by Inventor Ramana Veerasingam

Ramana Veerasingam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduction of plasma edge effect on plasma enhanced CVD processes
    Patent number: 6553932
    Abstract: An appparatus for confining plasma within a process zone of a substrate processing chamber. In one aspect, an apparatus comprises an annular member having an upper mounting surface, an inner confinement wall, and an outer confinement wall. The apparatus is disposed on or otherwise connected to a gas distribution assembly of the processing chamber to prevent plasma edge effects on the surface of a substrate. The apparatus provides a plasma choke aperture that reduces the volume of the process zone around the periphery of the substrate thereby eliminating uneven deposition of material around the edge of the substrate.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: April 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Kuo-Shih Liu, Ramana Veerasingam, Zhi Xu, Ping Xu, Mario Dave Silvetti, Gang Chen
  • Reduction of plasma edge effect on plasma enhanced CVD processes
    Publication number: 20010042511
    Abstract: An apparatus for confining plasma within a process zone of a substrate processing chamber. In one aspect, an apparatus comprises an annular member having an upper mounting surface, an inner confinement wall, and an outer confinement wall. The apparatus is disposed on or otherwise connected to a gas distribution assembly of the processing chamber to prevent plasma edge effects on the surface of a substrate. The apparatus provides a plasma choke aperture that reduces the volume of the process zone around the periphery of the substrate thereby eliminating uneven deposition of material around the edge of the substrate.
    Type: Application
    Filed: May 11, 2001
    Publication date: November 22, 2001
    Applicant: Applied Materials, Inc.
    Inventors: Kuo-Shih Liu, Ramana Veerasingam, Zhi Xu, Ping Xu, Mario Dave Silvetti, Gang Chen