Abstract: A furnace system for thermal processing of products and materials is disclosed which is particularly useful in processing touch screens for computer tablets and silicon wafers employed in fabricating solar cells. The system employs a hybrid of microwave and radiant heating of workpieces to provide controlled heating of the workpieces. A plurality of susceptors are disposed a furnace chamber. A plurality of microwave sources are arranged to provide microwave radiation in the chamber to uniformly heat workpieces in the chamber and to provide uniform heating of the susceptors. The susceptors are effective upon microwave heating by the microwave sources to provide uniform radiant heating of the workpieces in the chamber.

Abstract: The present invention comprises a thermal reactor and method for thermal processing of particles carried in a gas stream through the reactor. The reactor system can operate in a continuous manner for the thermal processing of particles flowing through the reactor. The system in one embodiment employs a hybrid of microwave and radiant heating of the particles. In other embodiments, only microwave heating is employed, or only radiant heating is employed.

Abstract: A furnace system for thermal processing of products and materials is disclosed which is particularly useful in processing touch screens for computer tablets and silicon wafers employed in fabricating solar cells. The system employs a hybrid of microwave and radiant heating of workpieces to provide controlled heating of the workpieces. A plurality of susceptors are disposed a furnace chamber. A plurality of microwave sources are arranged to provide microwave radiation in the chamber to uniformly heat workpieces in the chamber and to provide uniform heating of the susceptors. The susceptors are effective upon microwave heating by the microwave sources to provide uniform radiant heating of the workpieces in the chamber.