Patents by Inventor Ramnath Sivaraman

Ramnath Sivaraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9068834
    Abstract: A micromechanical rotation rate sensor, including a substrate whose base surface is aligned parallel to the x-y plane of a Cartesian coordinate system, with the rotation rate sensor having at least one first seismic mass and a second seismic mass which are coupled to at least one first drive device and are suspended such that the first and the second seismic masses are driven such that they are deflected in antiphase in one drive mode, with the rotation rate sensor being designed such that it can detect rotation rates about at least two mutually essentially orthogonal sensitive axes, wherein at least the second seismic mass is in the form of a frame which at least partially surrounds the first seismic mass with respect to the position on the x-y plane.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: June 30, 2015
    Assignee: Continental Teves AG & Co. oHG
    Inventors: Stefan Günthner, Ramnath Sivaraman, Bernhard Schmid, Jasmin Lohmann
  • Patent number: 8794067
    Abstract: A micromechanical rotation rate sensor, comprising at least one substrate, wherein the rotation rate sensor has at least a first and a second seismic mass which are coupled to one another by means of at least one coupling beam, and wherein the rotation rate sensor is embodied in such a way that it can detect rotation rates about at least a first and a second sensitive axis, wherein each seismic mass is assigned at least one actuator unit with which the deflection behavior of the seismic mass can be influenced.
    Type: Grant
    Filed: March 11, 2010
    Date of Patent: August 5, 2014
    Assignee: Continental Teves AG & Co. oHG
    Inventors: Bernhard Schmid, Stefan Günthner, Ramnath Sivaraman
  • Patent number: 8794047
    Abstract: A method and apparatus for the precise measuring operation of a micromechanical rotation rate sensor, including at least one deflectively suspended seismic mass, at least one drive device for driving the seismic mass, and at least one first and one second trimming electrode element, which are jointly assigned directly or indirectly to the seismic mass, a first electrical trimming voltage (UTO1, UTLO1, UTRO1) being set between the first trimming electrode element and the seismic mass, and a second electrical trimming voltage (UTO2, UTLO2, UTRO2) being set between the second trimming electrode element and the seismic mass, the first and the second electrical trimming voltages being set at least as a function of a quadrature parameter (UT) and a resonance parameter (Uf).
    Type: Grant
    Filed: April 28, 2010
    Date of Patent: August 5, 2014
    Assignees: Continental Teves AG & Co. oHG, VTI Technologies Oy
    Inventors: Stefan Günthner, Roland Hilser, Ramnath Sivaraman, Bernhard Schmid, Petri Klemetti
  • Publication number: 20120279301
    Abstract: A micromechanical rotation rate sensor, including a substrate whose base surface is aligned parallel to the x-y plane of a Cartesian coordinate system, with the rotation rate sensor having at least one first seismic mass and a second seismic mass which are coupled to at least one first drive device and are suspended such that the first and the second seismic masses are driven such that they are deflected in antiphase in one drive mode, with the rotation rate sensor being designed such that it can detect rotation rates about at least two mutually essentially orthogonal sensitive axes, wherein at least the second seismic mass is in the form of a frame which at least partially surrounds the first seismic mass with respect to the position on the x-y plane.
    Type: Application
    Filed: September 9, 2010
    Publication date: November 8, 2012
    Applicant: CONTINENTAL TEVES AG CO. OHG
    Inventors: Stefan Günthner, Ramnath Sivaraman, Bernhard Schmid, Jasmin Lohmann
  • Publication number: 20120118062
    Abstract: A method and apparatus for the precise measuring operation of a micromechanical rotation rate sensor, including at least one deflectively suspended seismic mass, at least one drive device for driving the seismic mass, and at least one first and one second trimming electrode element, which are jointly assigned directly or indirectly to the seismic mass, a first electrical trimming voltage (UTO1, UTLO1, UTRO1) being set between the first trimming electrode element and the seismic mass, and a second electrical trimming voltage (UTO2, UTLO2, UTRO2) being set between the second trimming electrode element and the seismic mass, the first and the second electrical trimming voltages being set at least as a function of a quadrature parameter (UT) and a resonance parameter (Uf).
    Type: Application
    Filed: April 28, 2010
    Publication date: May 17, 2012
    Applicants: VTI Technologies OY, Continental Teves AG & Co., OHG
    Inventors: Stefan Günthner, Roland Hilser, Ramnath Sivaraman, Bernhard Schmid, Petri Klemetti
  • Publication number: 20120048016
    Abstract: A micromechanical rotation rate sensor, comprising at least one substrate, wherein the rotation rate sensor has at least a first and a second seismic mass which are coupled to one another by means of at least one coupling beam, and wherein the rotation rate sensor is embodied in such a way that it can detect rotation rates about at least a first and a second sensitive axis, wherein each seismic mass is assigned at least one actuator unit with which the deflection behavior of the seismic mass can be influenced.
    Type: Application
    Filed: March 11, 2010
    Publication date: March 1, 2012
    Inventors: Bernhard Schmid, Stefan Günthner, Ramnath Sivaraman