Abstract: A cutter assembly is configured to interchange a cutter bit and has a plurality of retaining features to secure the cutter bit to ensure positive retention and alignment along a rotational axis. A cutter bit is retained within a slot of the retainer component and the retainer component is coupled to a chuck component. The retainer component may be detachably attachable to the chuck component by external threads that are configured to thread into the internal threads of the chuck component. The cutter bit may be retained in the slot by a threaded retainer that extends through one side of the retainer component, through a cutter aperture in the cutter bit, through the slot and into a threaded retainer aperture in the opposing side of the retainer component. The threaded retainer is configured to extend orthogonally to the slot to pull the first side of the retainer component to the second side and pinch or compress against the cutter bit therein.

Abstract: A cutter assembly is configured to interchange a cutter bit and has a plurality of retaining features to secure the cutter bit to ensure positive retention and alignment along a rotational axis. A cutter bit is retained within a slot of the retainer component and the retainer component is coupled to a chuck component. The retainer component may be detachably attachable to the chuck component by external threads that are configured to thread into the internal threads of the chuck component. The cutter bit may be retained in the slot by a threaded retainer that extends through one side of the retainer component, through a cutter aperture in the cutter bit, through the slot and into a threaded retainer aperture in the opposing side of the retainer component. The threaded retainer is configured to extend orthogonally to the slot to pull the first side of the retainer component to the second side and pinch or compress against the cutter bit therein.

Abstract: A long range low frequency antenna having an elongated magnetic core; a coil surrounding the elongated magnetic core; a bobbin; where the elongated magnetic core is introduced in a cavity of the bobbin; and a housing overmolded on the bobbin in a waterproof manner. The antenna also comprises at least one damper located at one extreme of the elongated magnetic core. The at least one damper is made of an elastic and thermally-stable compound having a resin and a first filler including a natural mineral filler. Therefore, longitudinal dilatations, shrinkage, mechanical shocks, and vibrations of the elongated magnetic core are absorbed by the at least one damper, avoiding an impact over an inductance variation of the coil.

Abstract: Disclosed embodiments include methods and systems for symbolic correction in human-machine interfaces that comprise (a) implementing a language model; (b) implementing a hypothesis model; (c) implementing an error model; and (d) processing a symbolic input message based on weighted finite-state transducers to encode 1) a set of input hypothesis using the hypothesis model, 2) the language model, and 3) the error model to perform correction on the sequential pre-segmented symbolic input message in the human-machine interface. According to a particular embodiment, the processing step comprises a combination of the language model, the hypothesis model, and the error model performed without parsing by employing a composition operation between the transducers and a lowest cost path search, exact or approximate, on the composed transducer.

Abstract: Disclosed embodiments include methods and systems for symbolic correction in human-machine interfaces that comprise (a) implementing a language model; (b) implementing a hypothesis model; (c) implementing an error model; and (d) processing a symbolic input message based on weighted finite-state transducers to encode 1) a set of input hypothesis using the hypothesis model, 2) the language model, and 3) the error model to perform correction on the sequential pre-segmented symbolic input message in the human-machine interface. According to a particular embodiment, the processing step comprises a combination of the language model, the hypothesis model, and the error model performed without parsing by employing a composition operation between the transducers and a lowest cost path search, exact or approximate, on the composed transducer.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.

Abstract: A sanitary hose coupler attachable in a fluid pressure-tight, void-free connection to a resiliently deformable hose for conveying liquid food or drug products under pressure, which is releasably coupleable in a fluid pressure-tight connection to a compatible coupler, comprises an elongated tubular connector body having a rearwardly protruding frusto-conically tapered nose piece forcibly insertable into the bore of a hose, a hollow cylindrical compression member which has through its length a central frusto-conically shaped bore and a clamping member for exerting a compression force couple on the compression member and connector body, thereby pressing the tapered inner wall surface of the compression member into a fluid pressure-tight seal with the outer surface of an end portion of the hose which is expanded by insertion of the nose piece into the hose bore.

Abstract: An apparatus for filling containers with viscous food product includes a plurality of pressure/vacuum fill head positioned above a plurality of containers. Each fill head includes a housing enclosing a plenum through which is longitudinally disposed a valve stem having in an outer cylindrical surface thereof a plurality of longitudinally disposed grooves terminated near a lower end of the stem by a cylindrical boss. The boss is biased into fluid pressure-tight sealing contact with a lower transverse end face of lower tubular portion of the housing by a helical compression spring which fits coaxially over a portion of the valve stem which protrudes upwardly from the housing, the spring being disposed between an upper transverse end wall of the housing, and the lower surface of a neck which protrudes radially outwardly from the upper end of the valve stem.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An article for clamping a plurality of objects together, wherein the article includes a body portion formed in a generally c-shape. The body portion comprises a pair of side portions, an intermediate portion extending between and interconnecting the pair of side portions, and a pair of opposed free end portions extending from the pair of side portions and opposite the intermediate portion and forming a gap therebetween. The pair of opposed free end portions are resiliently biased toward a position proximate each other and spaced apart to the extent of the gap therebetween. They are expandable away from each other upon the exertion of expansion pressure, to extend about the plurality of objects to be clamped therebetween, and to return to the resiliently biased position to exert pressure on the plurality of objects therebetween upon the release of the expansion pressure.

Abstract: An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.