Abstract: This application relates to a method of forming nano-patterns on a substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric substrate with reference to a silicon substrate.

Abstract: Various embodiments may relate to an optical device. The optical device may include a radiation collimator configured to generate a directed light beam based on omni-directional light emission. The optical device may also include one or more optical elements configured to change a parameter of the directed light beam. The radiation collimator comprises a first reflector, a second reflector and a spacer between the first reflector and the second reflector. The first reflector, the second reflector and the spacer form a resonant cavity.

Abstract: This application relates to a method of forming nano-patterns on a substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric substrate with reference to a silicon substrate. There is also provided a method of forming a nano-patterned substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein said dielectric substrate comprises an anti-reflectance layer disposed on a base substrate.