Abstract: An improved semiconductor device for use in microwave integrated circuits is disclosed. In particular, an improved monolithic integrated circuit (10) comprised of a semi-insulating substrate (12) and having an integrated circuit on a top surface (14) thereof. MMIC (10) is provided with free area (38) of a predetermined width extending along the entire periphery or at least two opposing sides and which is void of active circuitry. Free area (38) permits intimate mating contact with a die collet tool (58). Die collet tool (58) has a surface configured to matingly engage free areas (38) while avoiding contact with the active circuitry so as to avoid damage thereto. MMIC (10) permits application of high volume, automated manufacturing processes which previously could not be utilized.

Abstract: An improved semiconductor device adapted to be metallurgically bonded to a substrate is disclosed. In particular, monolithic microwave integrated circuit (MMIC) device (10) includes a semiconductor wafer (12) having first and second major surfaces and defining at least one via (34) extending therethrough. An electrical circuit is disposed on the first surface of semiconductor wafer (12). In accordance with this invention, MMIC device (10) includes a ground-plane metallization system (32) provided on the second surface of the semiconductor wafer (12). Backside metallization system (32) promotes preferential "de-wetting" of solder within vias (34) to reduce solder failures associated with die-attach processing. Backside metallization systems (32) includes a ground-plane layer (36) and a second layer (38) fabricated from a non-wettable material which is deposited within via (34). Third layer (42) is deposited on second layer (36) but terminates adjacent a peripheral edge of via (34).